BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a flowchart illustrating a method for high-level synthesis of a semiconductor integrated circuit according to a first embodiment.
FIG. 2 is a diagram illustrating a behavioral-level circuit description in the semiconductor integrated circuit high-level synthesis method of the first embodiment.
FIG. 3 is a diagram illustrating a DFG generated in an intermediate representation generating step of the semiconductor integrated circuit high-level synthesis method of the first embodiment.
FIG. 4 is a diagram illustrating a DFG scheduled in a scheduling step of the semiconductor integrated circuit high-level synthesis method of the first embodiment.
FIG. 5 is a diagram illustrating a DFG whose shape is changed in a circuit concealing step of the semiconductor integrated circuit high-level synthesis method of the first embodiment.
FIG. 6 is a diagram illustrating a DFG to which a hardware resource is allocated in an allocation step of the semiconductor integrated circuit high-level synthesis method of the first embodiment.
FIG. 7 is a diagram illustrating an RTL circuit description which has been subjected to a concealment process and output in a circuit description output step of the semiconductor integrated circuit high-level synthesis method of the first embodiment.
FIG. 8 is a diagram illustrating an RTL circuit description which has not been subjected to a concealment process.
FIG. 9 is a diagram illustrating an upper hierarchical layer circuit description output as concealed decryption information in a circuit description output step of the semiconductor integrated circuit high-level synthesis method of the first embodiment.
FIG. 10 is a diagram illustrating a behavioral-level circuit description which has been subjected to a concealment process and output in the circuit description output step of the semiconductor integrated circuit high-level synthesis method of the first embodiment.
FIG. 11 is a flowchart illustrating a method for high-level synthesis of a semiconductor integrated circuit according to a second embodiment.
FIG. 12 is a diagram illustrating a DFG whose shape is changed in a circuit concealing step of the semiconductor integrated circuit high-level synthesis method of the second embodiment.
FIG. 13 is a diagram illustrating another DFG whose shape is changed in a circuit concealing step of the semiconductor integrated circuit high-level synthesis method of the second embodiment.
FIG. 14 is a flowchart illustrating a method for high-level synthesis of a semiconductor integrated circuit according to a third embodiment.
FIG. 15 is a diagram illustrating a DFG to which hardware resources have been allocated.
FIG. 16 is a diagram illustrating an RTL circuit structure inferred from the DFG of FIG. 15.
FIG. 17 is a diagram illustrating a DFG to which hardware resources have been allocated and whose shape has been changed in a circuit concealing step of the semiconductor integrated circuit high-level synthesis method of the third embodiment.
FIG. 18 is a diagram illustrating an RTL circuit structure inferred from the DFG of FIG. 17.
FIG. 19 is a flowchart illustrating a detail of a circuit concealing step of a method for high-level synthesis method of a semiconductor integrated circuit according to a fourth embodiment.
FIG. 20 is a diagram illustrating a DFG in which an addition operation is added in the circuit concealing step of the semiconductor integrated circuit high-level synthesis method of the fourth embodiment.
FIG. 21 is a diagram illustrating a DFG in which a multiplication operation is further added in the circuit concealing step of the semiconductor integrated circuit high-level synthesis method of the fourth embodiment.