Claims
- 1. A process for modifying the composition of a solid metal product by incorporating at least one modifying substance to said metal product, said process comprisingmoving said solid metal product in the form of a continuous strip through a vacuum chamber, said metal product having a first composition, applying said at least one modifying substance to at least one side of the strip, while the strip is moved through the vacuum chamber, said applying step comprising at least one plasma discharge, plasma annealing said strip in the vacuum chamber, at a strip temperature high enough to allow incorporation by diffusion of the at least one applied modifying substance into the solid metal product, but below the melting point of said solid metal product, and holding said strip temperature so as to obtain said diffusion from said at least one side of the strip up to the core thereof, while so producing a metal product having a second composition.
- 2. A process according to claim 1 wherein the plasma annealing comprises creating at least one annealing plasma discharge between at least one side of the metal strip and at least one counter-electrode and dissipating electrical power from the at least one annealing plasma discharge into the metal strip, with rapid and uniform heating of said metal strip.
- 3. A process according to claim 2, wherein said applying comprises injecting a gas containing or generating said at least one modifying substance into said at least one annealing plasma discharge.
- 4. A process according to claims 2, wherein said applying comprises injecting a gas containing or generating said at least one modifying substance into said at least one plasma discharge located close to at least one side of said metal strip, after the plasma annealing and during the holding.
- 5. A process according to claim 2, wherein said applying takes place before said plasma annealing.
- 6. A process according to claim 5, wherein the said applying is carried out by sputtering, by plasma-enhanced chemical vapor deposition, or by a combination thereof or with another vacuum deposition operation.
- 7. A process according to claim 2, wherein the strip is made of mild steel, stainless steel or aluminum.
- 8. A process according to claim 1, wherein said applying comprises injecting a gas containing or generating said at least one modifying substance into said at least one plasma discharge located close to at least one side of said metal strip, after the plasma annealing and during the holding.
- 9. A process according to claim 1, wherein the step of applying takes place before the step of plasma annealing.
- 10. A process according to claim 9, wherein said applying is carried out by sputtering, by plasma-enhanced chemical vapor deposition, or by a combination thereof or with another vacuum deposition operation.
- 11. A process according to claim 1, wherein the strip is made of mild steel, stainless steel or aluminum.
Priority Claims (1)
Number |
Date |
Country |
Kind |
97203241 |
Oct 1997 |
EP |
|
CROSS REFERENCE TO RELATED APPLICATION
The present application is the national stage under 35 U.S.C. 371 of PCT/BE98/00154, filed Oct. 16, 1998.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
PCT/BE98/00154 |
|
WO |
00 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO99/20808 |
4/29/1999 |
WO |
A |
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