"Isolation Merged Stacked Dynamic Random Access Memory Cell", IBM Technical Disclosure Bulletin, vol. 31, No. 7, Dec. 1988, pp. 39-42. |
"Methods of Preventing Excessive Oxidation of Polysilicon Trench Fill in Semiconductor Devices", IBM Technical Disclosure Bulletin, vol. 30, No. 10, Mar. 1988, pp. 156-158. |
"An Experimental 16Mbit CMOS DRAM Chip with a 100 MHZ Serial Read/Write Mode", by Shigeyoshi Watanabe et al., IEEE Journal of Solid-State Circuits, vol. 24, No. 3, Jun. 1982, pp. 763-768. |
"A Double Epitaxial Process for High Density DRAM Trench Capacitor Isolation", by Chen et al., IEEE Electron Device Letters, vol. Edl. 8, No. 11, Nov. 1987. |
"Technologie Hochintegrierter Schaltungen", by D. Widmann et al., Springer-Verlag, pp. 270-271. |