This application claims priority from U.S. provisional patent application Serial No. 60/295,886 filed Jun. 4, 2001, the entire disclosure of which is incorporated herein by reference.
Number | Name | Date | Kind |
---|---|---|---|
4013502 | Staples | Mar 1977 | A |
4743493 | Sioshansi et al. | May 1988 | A |
5268207 | Kruger et al. | Dec 1993 | A |
5500296 | Inoue et al. | Mar 1996 | A |
5550696 | Nguyen | Aug 1996 | A |
5714207 | Kuo | Feb 1998 | A |
5851475 | Komvopoulos et al. | Dec 1998 | A |
5942279 | Wudu | Aug 1999 | A |
6117499 | Wong et al. | Sep 2000 | A |
6200441 | Gornicki et al. | Mar 2001 | B1 |
6368425 | Segar | Apr 2002 | B1 |
Entry |
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Terris, et al, “Ion-Beam Patterning Of Magnetic Films Using Stencil Masks” American Institute of Physics, Applied Physics Letters, vol. 75, No. 3, pp. 403-405, Jul. 19, 1999. |
Number | Date | Country | |
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60/295886 | Jun 2001 | US |