Claims
- 1. Method for the preparation of silicate glass of controlled index of refraction which comprises the steps of
- (a) curing an organo-silicon polymer containing a phosphorous or boron source at a temperature ranging from 200.degree.-250.degree. C.,
- (b) exposing said cured resin to an air or oxygen plasma in a barrel reactor at room temperature, so resulting in the formation of a fenestrated structure having an index of refraction ranging down to 1.38, and
- (c) sintering said structure at a temperature within the range of 500.degree.-1000.degree. C. to effect an increase in the refractive index to a desired value ranging up to and exceeding the refractive index of bulk fused silica.
- 2. Method for the preparation of a germanosilicate glass of controlled index of refraction which comprises the steps of
- (a) curing an organo-silicon polymer upon a suitable substrate at a temperature ranging from 200.degree.-250.degree. C. for 30 minutes,
- (b) depositing a layer of a germanium ethoxide solution in ethanol upon said cured film, heat treating the film at 200.degree.-250.degree. C. for 30 minutes and then exposing the resultant structure to an air or oxygen plasma in a barrel reactor at room temperature, so resulting in the formation of a fenestrated structure having an index of refraction ranging down to 1.38, and
- (c) sintering said structure at a temperature within the range of 500.degree.-1000.degree. C. to effect an increase in the refractive index to a desired value ranging up to a value which exceeds the refractive index of bulk fused silica.
- 3. Method for the preparation of a silicate glass of controlled index of refraction which comprises the steps of
- (a) curing an organo-silicon thermosetting resin in a reaction vessel at a temperature within the range of 200.degree.-400.degree. C. for a time period within the range of 1-30 minutes;
- (b) exposing said cured resin to an oxygen or air plasma in a barrel reactor at room temperature, so resulting in a structure having an index of refraction less than that of bulk fused silica; and
- (c) adjusting the refractive index of the structure by sintering at a temperature within the range of 600.degree.-1100.degree. C. for a time period within the range of 1-60 minutes to effect an increase in the refractive index to a desired value ranging up to the refractive index of bulk fused silica.
Parent Case Info
This is a division of application Ser. No. 050,045, filed May 15, 1987, which is a continuation of application Ser. No. 752,052, filed July 5, 1985, now abandoned.