Claims
- 1. A method for producing second-order nonlinear glass material comprising treating a porous glass material containing Ge with hydrogen, sintering it and subjecting it to a ultraviolet poling treatment.
- 2. The method for producing second-order nonlinear glass material according to claim 1 wherein the hydrogen treatment is conducted at a temperature of 800° C. or less.
- 3. The method for producing second-order nonlinear glass material according to claim 1, wherein the porous glass material comprises SiO2 as a main component.
- 4. The method for producing second-order nonlinear glass material according to claim 2, wherein the porous glass material comprises SiO2 as a main component.
Priority Claims (1)
Number |
Date |
Country |
Kind |
11-60519 |
Mar 1999 |
JP |
|
Parent Case Info
This is a Division of application Ser. No. 09/511,716 filed Feb. 23, 2000 now U.S. Pat. No. 6,380,109. The entire disclosure of the prior application(s) is hereby incorporated by reference herein in its entirety.
US Referenced Citations (11)
Number |
Name |
Date |
Kind |
4203744 |
Schultz et al. |
May 1980 |
A |
4670033 |
Miura |
Jun 1987 |
A |
5325230 |
Yamagata et al. |
Jun 1994 |
A |
5617499 |
Brueck et al. |
Apr 1997 |
A |
5679125 |
Hiraiwa et al. |
Oct 1997 |
A |
5966233 |
Fujiwara et al. |
Oct 1999 |
A |
6097867 |
Brueck et al. |
Aug 2000 |
A |
6215576 |
Minemoto et al. |
Apr 2001 |
B1 |
6221565 |
Jain et al. |
Apr 2001 |
B1 |
6289699 |
Kewitsch et al. |
Sep 2001 |
B1 |
6311542 |
Brennan et al. |
Nov 2001 |
B1 |
Foreign Referenced Citations (2)
Number |
Date |
Country |
9616344 |
May 1996 |
WO |
9814827 |
Apr 1998 |
WO |
Non-Patent Literature Citations (1)
Entry |
Myers, et al, “Effect of hydrogen loading on temperature/electric-field poling of SiO2-based thin films on Si”, Electronics Letters, vol. 31, No. 18, pp. 1604-1606, Aug. 1995. |