Claims
- 1. A process for preparing fluorine-containing compounds, which comprises reacting a compound containing one or more halogen atoms which can be replaced by fluorine with a fluoride of the formula I or a mixture of fluorides of the formula I
- KAT.sup.+ F.sup.- (I)
- where KAT.sup.+ is an alkali metal ion, NH.sub.4.sup.+, an alkaline earth metal ion or a cation of the formula II
- A.sup.1 A.sup.2 A.sup.3 A.sup.4 N.sup.+ (II)
- where A.sup.1, A.sup.2, A.sup.3, A.sup.4 are, independently of one another, identical or different and are each straight-chain or branched alkyl or alkenyl having from 1 to 12 carbon atoms, cycloalkyl having from 4 to 8 carbon atoms, aryl having from 6 to 12 carbon atoms or aralkyl having from 7 to 12 carbon atoms, in the presence of a compound or a mixture of compounds of the formula III ##STR29## where A.sup.5, A.sup.6, A.sup.7, A.sup.8, A.sup.9, A.sup.10, A.sup.11, A.sup.12 are, independently of one another, identical or different and are each straight-chain or branched alkyl or alkenyl having from 1 to 12 carbon atoms, cycloalkyl having from 4 to 8 carbon atoms, aryl having from 6 to 12 carbon atoms, aralkyl having from 7 to 12 carbon atoms, or A.sup.5 A.sup.6, A.sup.7 A.sup.8, A.sup.9 A.sup.10, A.sup.11 A.sup.12 are, independently of one another, identical or different and are bound to one another either directly or via O or N--A.sup.13 to form a ring having from 3 to 7 ring atoms, A.sup.13 is alkyl having from 1 to 4 carbon atoms and B.sup.- is a monovalent acid anion or the equivalent of a polyvalent acid anion, and in the presence of one or more compounds of the formulae IV encompassing IVa and/or IVb
- X--NO.sub.2 (IVa),
- X--SO--X' (IVb),
- where X and X' are, independently of one another, identical or different and are each substituted or unsubstituted (C.sub.6 -C.sub.18)-aryl, substituted or unsubstituted (C.sub.5 -C.sub.18)-aryloxy, substituted or unsubstituted (C.sub.5 -C.sub.18)-arylthio, substituted or unsubstituted (C.sub.7 -C.sub.12)-aralkyl or a radical of the formula V ##STR30## where R.sup.1, R.sup.2, R.sup.3 are, independently of one another, identical or different and are each hydrogen, straight-chain or branched alkyl or alkenyl having from 1 to 12 carbon atoms or cycloalkyl having from 4 to 8 carbon atoms, in the presence or absence of a solvent at temperatures in the range from 40.degree. C. to 260.degree. C.
- 2. The process as claimed in claim 1, wherein the fluorination by halogen exchange is carried out in the presence of nitrobenzene, 2-fluoronitrobenzene, 3-fluoronitrobenzene, 4-fluoronitrobenzene, 2,4-difluoronitrobenzene, 3-chloronitrobenzene, 2-nitrotoluene, 3-nitrotoluene, 4-nitrotoluene, 2-nitroanisole, 3-nitroanisole, 4-nitroanisole, 2-nitrothiophene, 4-nitro-2-propylbenzene, 1-nitronaphthalene, 2-nitronaphthalene, 2,4-dinitrobiphenyl, 4,4'-dinitrobiphenyl, bis(4-nitrophenyl)ether, bis(nitrophenyl)disulfide, nitromethane, nitroethane, nitropropane, nitroanthracene, 1-nitropyrene, dimethyl sulfoxide, diphenyl sulfoxide, phenyl methyl sulfoxide, diethyl sulfoxide and/or methyl trifluoromethyl sulfoxide.
- 3. The process as claimed in claim 1, wherein the fluorination by halogen exchange is carded out in the presence of nitrobenzene and/or DMSO.
- 4. The process as claimed in claim 1 wherein the compound of the formulae IVa and/or IVb is used in an amount of from 0.1 to 20% by weight, based on the compound containing halogen to be replaced.
- 5. The process as claimed in claim 1 wherein the compound of the formulae IVa and/or IVb is used in an amount of from 0.5 to 10% by weight, based on the compound containing halogen to be replaced.
- 6. The process as claimed in claim 1 wherein the compound containing halogen which can be replaced by fluorine is an aromatic compound having from 0 to 3 nitrogen atoms in the ring and substituted on the ring by chlorine or bromine substituents, which can be replaced by fluorine and may be substituted on the ring by at least one further substituent which promotes nucleophilic substitution of aromatic compounds.
- 7. The process as claimed in claim 1 wherein the starting compound containing one or more halogen atoms which can be replaced by fluorine is a compound of the benzene, naphthalene, pyridine, anthracene, phenanthrene, pyrimidine, pyrazine, quinoline, isoquinoline, acridine, acridone, cinnoline, phthalazine, quinazoline, quinoxaline, phenazine and/or phenoxazine type.
- 8. The process as claimed in claim 1 wherein the compound containing one or more halogen atoms which can be replaced by fluorine is a substituted benzaldehyde or benzonitrile.
- 9. The process as claimed in claim 1 wherein the compound of the formula I which is used is potassium fluoride and/or cesium fluoride.
- 10. The process as claimed in claim 1 wherein the compound of the formula I which is used is tetramethylammonium fluoride and/or tetraphenylammonium fluoride.
- 11. The process as claimed in claim 1 wherein from 0.5 to 10 molar equivalents of compound of the formula I are used per molar equivalent of halogen atoms to be replaced.
- 12. The process as claimed in claim 1 wherein from 1 to 2 molar equivalents of compound of the formula I are used per molar equivalent of halogen atoms to be replaced.
- 13. The process as claimed in claim 1 wherein the fluorination by halogen exchange is carried out in the presence of a compound of the formula III in which A.sup.5, A.sup.6, A.sup.7, A.sup.8, A.sup.9, A.sup.10, A.sup.11, A.sup.12 are, independently of one another, identical or different and are each straight-chain or branched alkyl or alkenyl having from 1 to 12 carbon atoms or cycloalkyl having from 4 to 8 carbon atoms.
- 14. The process as claimed in claim 1 wherein the fluorination by halogen exchange is carried out in the presence of a compound of the formula III in which A.sup.5, A.sup.6, A.sup.7, A.sup.8, A.sup.9, A.sup.10, A.sup.11, A.sup.12 are, independently of one another, identical or different and are each straight-chain or branched alkyl or alkenyl having from 1 to 8 carbon atoms or cycloalkyl having 5 or 6 carbon atoms.
- 15. The process as claimed in claim 1 wherein the fluorination by halogen exchange is carried out in the presence of a compound of the formula III in which A.sup.5, A.sup.6, A.sup.7, A.sup.8, A.sup.9, A.sup.10, A.sup.11, A.sup.12 are, independently of one another, identical or different and are each straight-chain or branched alkyl having from 1 to 4 carbon atoms.
- 16. The process as claimed in claim 1 wherein in the compound of the formula III A.sup.5 A.sup.6 =A.sup.7 A.sup.8 or A.sup.5 A.sup.6 =A.sup.7 A.sup.8 =A.sup.9 A.sup.10 or A.sup.5 A.sup.6 =A.sup.7 A.sup.8 =A.sup.9 A.sup.10 =A.sup.11 A.sup.12.
- 17. The process as claimed in claim 1 wherein in the compound of the formula III A.sup.5 =A.sup.6 =A.sup.7 =A.sup.8 or A.sup.5 =A.sup.6 =A.sup.7 =A.sup.8 =A.sup.9 =A.sup.10 or A.sup.5 =A.sup.6 =A.sup.7 =A.sup.8 =A.sup.9 =A.sup.10 =A.sup.11 =A.sup.12.
- 18. The process as claimed in claim 1 wherein in the compound of the formula III A.sup.5 A.sup.6 or A.sup.5 A.sup.6 and A.sup.7 A.sup.8 or A.sup.5 A.sup.6 and A.sup.7 A.sup.8 and A.sup.9 A.sup.10 or A.sup.5 A.sup.6 and A.sup.7 A.sup.8 and A.sup.9 A.sup.10 and A.sup.11 A.sup.12 are joined to one another either directly or via O or N--A.sup.13 to form a saturated or unsaturated ring having 5 or 6 ring atoms.
- 19. The process as claimed in claim 1 wherein in the compound of the formula III A.sup.5 A.sup.6 or A.sup.7 A.sup.8 and A.sup.9 A.sup.10 or A.sup.5 A.sup.6 and A.sup.7 A.sup.8 and A.sup.9 A.sup.10 or A.sup.5 A.sup.6 and A.sup.7 A.sup.8 and A.sup.9 A.sup.10 and A.sup.11 A.sup.12 are joined to form a ring including, as ring members, the N atom on which the respective radicals A.sup.5 to A.sup.12 are located and optionally O or N--A.sup.13 and CH.sub.2 groups.
- 20. The process as claimed in claim 1 wherein in the compound of the formula III B.sup.- is F.sup.-, Cl.sup.-, Br.sup.-, I.sup.-, HF.sub.2.sup.-, BF.sub.4.sup.-, C.sub.6 H.sub.5 SO.sub.3.sup.-, p-CH.sub.3 --C.sub.6 H.sub.5 SO.sub.3.sup.-, HSO.sub.4.sup.-, PF.sub.6.sup.- or CF.sub.3 SO.sub.3.sup.-.
- 21. The process as claimed in claim 1 wherein in the compound of the formula III B.sup.- is F.sup.-, Cl.sup.-, Br.sup.-, I.sup.-, HF.sub.2.sup.- or BF.sub.4.sup.-.
- 22. The process as claimed in claim 1 wherein the compound of the formula III is used in an amount of from 0.5 to 35% by weight, based on the compound containing halogen which can be replaced by fluorine.
- 23. The process as claimed in claim 1 wherein a dipolar aprotic, an aprotic or a protic solvent is used.
- 24. The process as claimed in claim 1 wherein dimethyl sulfoxide, dimethyl sulfone, sulfolane, dimethylformamide, dimethylacetamide, 1,3-dimethylimidazolin-2-one, N-methylpyrrolidone, hexamethylphosphoramide, acetonitrile, benzonitrile or a mixture of these is used as dipolar aprotic solvent.
- 25. The process as claimed in claim 1 wherein an aromatic hydrocarbon, a chlorinated aromatic hydrocarbon or a mixture of these is used as aprotic solvent.
- 26. The process as claimed in claim 25, wherein benzene, toluene, ortho-xylene, meta-xylene, para-xylene, an industrial mixture of isomeric xylenes, ethylbenzene, mesitylene, ortho-chlorotoluene, meta-chlorotoluene, para-chlorotoluene, ortho-dichlorobenzene, meta-dichlorobenzene, para-dichlorobenzene or a mixture of these is used as aprotic solvent.
- 27. The process as claimed in claim 1 wherein the reaction is carried out at from 60 to 250.degree. C.
- 28. The process as claimed in claim 1 wherein the reaction is carried out at from 90 to 220.degree. C.
- 29. The process as claimed in claim 1 wherein the reaction is carried out at from 120 to 200.degree. C.
- 30. The process as claimed in claim 1, wherein the compound of the formulae IVa and/or IVb is used in an amount of from 1 to 5% by weight, based on the compound containing halogen to be replaced.
Priority Claims (1)
Number |
Date |
Country |
Kind |
197 38 196 |
Sep 1997 |
DEX |
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Parent Case Info
This application is a 371 of PCT/EP98/05296 filed Aug. 20, 1998.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
102e Date |
371c Date |
PCT/EP98/05296 |
8/20/1998 |
|
|
2/28/2000 |
2/20/2000 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO99/11588 |
3/11/1999 |
|
|
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
5466859 |
Schach et al. |
Nov 1995 |
|
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EPX |
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FRX |
9805610 |
Feb 1998 |
WOX |
9822413 |
May 1998 |
WOX |
Non-Patent Literature Citations (3)
Entry |
Mochizuki Hiromitsu, Ihara Chem. Ind. Co. LTD, Pat. Abs. of Japan 96: No 8 of JP 08 092148 (1996). |
Ihara Chem. Ind. Co. LTD, Derwent Abstract of JP 5194303, XP-002085380 (1993). |
Shin-Akita Kasei KK, Derwent Abstract of JP63 039824, XP-002085381 (1998). |