Claims
- 1. A process for producing an electro-thermal transducer comprising:
- (a) forming a layer of a resistive heater element including a metal boride on a substrate of an electrically insulative material by conducting a reactive sputtering reaction between a target of an elemental form of said metal and diborane gas in a gaseous atmosphere of argon and diborane, wherein the partial pressure of diborane is from 1-10% based on the total pressure of said argon and diborane; and
- (b) applying to said resistive heater element an electrically conductive member for supplying the resistive heater element with electric power.
- 2. A process according to claim 1 in which the sputtering is carried out in a gaseous mixture of argon, oxygen and diborane the partial pressure of diborane being 1-10% based on the total pressure of said gaseous mixture.
- 3. A process according to claim 2 in which the partial pressure of the oxygen is 0.1-10% based on the total pressure of the gaseous mixture.
- 4. A process according to claim 1 in which the substrate is heated to 100.degree. C.-600.degree. C. during the sputtering.
- 5. A process according to claim 1 in which a heat treatment of the substrate and layer is effected at 200.degree. C.-650.degree. C. after sputtering.
- 6. A process according to claim 1 in which the resistive heater element is covered by at least one protective layer, each said protective layer being selected from the group consisting essentially of silicon oxide, magnesium oxide, aluminum oxide, tantalum oxide, and zirconium oxide.
- 7. A process for producing an electro-thermal transducer comprising:
- (a) forming a layer of a resistive heater element including a metal boride as the principal constituent on a substrate of an electrically insulative material by conducting a sputtering reaction in a gaseous atmosphere;
- (b) forming an electrically conductive member which supplies the resistive heater element with electric power on said resistive heater element;
- (c) forming a layer of a protective film of SiO.sub.2 on the resistive heater element having the electrically conductive member thereon; and
- (d) forming a layer of a protective film containing Ta.sub.2 O.sub.5 on the layer of the protective film of SiO.sub.2.
- 8. A process for producing an electro-thermal transducer comprising:
- (a) forming a layer of a resistive heater element including a metal boride on a substrate of an electrically insulative material by conducting a reactive sputtering reaction between a target of an elemental form of said metal, oxygen and diborane gas in a gaseous atmosphere of argon, oxygen and diborane, wherein the partial pressure of the oxygen is 0.1-10% based on the total pressure of the argon, oxygen and diborane; and
- (b) applying to said resistive heater element an electrically conductive member for supplying the resistive heater element with electric power.
Priority Claims (33)
Number |
Date |
Country |
Kind |
52-57936 |
May 1977 |
JPX |
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52-103975 |
Aug 1977 |
JPX |
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52-107522 |
Sep 1977 |
JPX |
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52-111329 |
Sep 1977 |
JPX |
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52-122622 |
Oct 1977 |
JPX |
|
52-122623 |
Oct 1977 |
JPX |
|
52-122624 |
Oct 1977 |
JPX |
|
52-122625 |
Oct 1977 |
JPX |
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52-129482 |
Oct 1977 |
JPX |
|
52-129483 |
Oct 1977 |
JPX |
|
52-129484 |
Oct 1977 |
JPX |
|
52-129485 |
Oct 1977 |
JPX |
|
52-129486 |
Oct 1977 |
JPX |
|
52-131260 |
Oct 1977 |
JPX |
|
52-131261 |
Oct 1977 |
JPX |
|
52-131262 |
Oct 1977 |
JPX |
|
52-160137 |
Dec 1977 |
JPX |
|
52-160138 |
Dec 1977 |
JPX |
|
52-160139 |
Dec 1977 |
JPX |
|
52-160140 |
Dec 1977 |
JPX |
|
52-160143 |
Dec 1977 |
JPX |
|
52-160144 |
Dec 1977 |
JPX |
|
52-160145 |
Dec 1977 |
JPX |
|
52-160146 |
Dec 1977 |
JPX |
|
52-160147 |
Dec 1977 |
JPX |
|
52-160148 |
Dec 1977 |
JPX |
|
52-160149 |
Dec 1977 |
JPX |
|
53-1033 |
Jan 1978 |
JPX |
|
53-1034 |
Jan 1978 |
JPX |
|
53-1035 |
Jan 1978 |
JPX |
|
53-1806 |
Jan 1978 |
JPX |
|
53-14282 |
Feb 1978 |
JPX |
|
53-14283 |
Feb 1978 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 266,219, filed May 22, 1981, now abandoned, which in turn is a division of U.S. application Ser. No. 906,359, filed May 15, 1978, now U.S. Pat. No. 4,296,309.
US Referenced Citations (14)
Foreign Referenced Citations (2)
Number |
Date |
Country |
715691 |
Aug 1965 |
CAX |
830392 |
Mar 1960 |
GBX |
Non-Patent Literature Citations (3)
Entry |
Brady, Materials Handbook, Ninth Edition, McGraw-Hill Book Co., New York, 1956, pp. 630-631. |
Shibata et al., IEEE Transactions on Parts, Hybrids and Packaging, "New Type Thermal Printing Head Using Thin Film", vol. PHP-12, No. 3, pp. 223-230, Sep. 1976. |
Maissel, L. I., The Deposition of Thin Films by Cathode Sputtering In Physics of Thin Films, vol. 3, ed. by G. Hass et al., Academic Press, 1966, pp. 100, 101, 106. |
Divisions (1)
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Number |
Date |
Country |
Parent |
906359 |
May 1978 |
|
Continuations (1)
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Number |
Date |
Country |
Parent |
266219 |
May 1981 |
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