Claims
- 1. A method for producing nano-particles from a precursor material, comprising:
vaporizing the precursor material to produce a vapor; directing said vapor into an isolation chamber; contacting said vapor contained in said isolation chamber with a quench fluid stream, said quench fluid stream cooling said vapor to produce the nano-particles; and removing said nano-particles from said isolation chamber.
- 2. The method of claim 1, wherein said quench fluid stream comprises a cryogenic fluid.
- 3. The method of claim 1, wherein said quench fluid is selected from cryogenic fluids consisting of hydrogen, helium, nitrogen, oxygen, argon, air, and methane.
- 4. The method of claim 1, wherein said quench fluid stream comprises nitrogen.
- 5. The method of claim 1, wherein said contacting step is carried out on a continuous basis.
- 6. The method of claim 1, further comprising separating said nano-particles from a carrier stream in said isolation chamber.
- 7. The method of claim 5, wherein said separating said nano-particles from said carrier stream comprises:
filtering said nano-particles from said carrier stream using a filter; and removing said nano-particles from the filter.
- 8. The method of claim 5, wherein said separating said nano-particles from said carrier stream comprises bubbling said carrier stream and said nanoparticles through a liquid, the liquid capturing said nano-particles.
- 9. The method of claim 1, wherein said contacting said vapor contained in said isolation chamber with a quench fluid stream, comprises:
providing a quench fluid tube having an inlet end and an outlet end, the outlet end of the quench fluid tube being contained in the isolation chamber; and injecting a cryogenic fluid into the inlet end of said quench fluid tube.
- 10. The method of claim 9, wherein said injecting cryogenic fluid into the inlet end of the quench fluid tube is conducted at a pressure in the range of about 1.3-8.3 bar.
- 11. The method of claim 1, wherein said vaporizing the precursor material to produce a vapor occurs at a temperature in the range of about 1093-1260° C.
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This is a continuation of co-pending U.S. patent application Ser. No. 09/709,838, filed on Nov. 9, 2000, which is hereby incorporated herein by reference for all that it discloses.
Continuations (1)
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Number |
Date |
Country |
Parent |
09709838 |
Nov 2000 |
US |
Child |
10223998 |
Aug 2002 |
US |