Claims
- 1. A method for producing plano-convex convergence lenses, which comprises:
providing a semiconductor wafer with a main surface; producing a plurality of convex projections on the main surface of the semiconductor wafer; applying a metal layer to the entire main surface of the semiconductor wafer; providing a diaphragm on each one of the plurality of convex projections by structuring the metal layer; and forming a plurality of individual plano-convex convergence lenses with a diaphragm by slicing through the semiconductor wafer between each one of the plurality of convex projections.
- 2. The method according to claim 1, which comprises using a photographic technique and etching to perform the step of producing a plurality of convex projections and using a photographic technique and etching to perform the step of providing a diaphram.
Priority Claims (1)
| Number |
Date |
Country |
Kind |
| 197 41 702.7 |
Sep 1997 |
DE |
|
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This is a division of U.S. application Ser. No. 09/533,562, filed Mar. 22, 2000, which was a continuation of copending International application No. PCT/DE98/02767, filed Sep. 17, 1998, which designated the United States.
Divisions (1)
|
Number |
Date |
Country |
| Parent |
09533562 |
Mar 2000 |
US |
| Child |
09863954 |
May 2001 |
US |
Continuations (1)
|
Number |
Date |
Country |
| Parent |
PCT/DE98/02767 |
Sep 1998 |
US |
| Child |
09533562 |
Mar 2000 |
US |