Claims
- 1. A method for removing impurities from process gas stream comprising:
contacting the gas stream with an ultra-low emission carbon material, wherein said ultra-low emission carbon material reduces the concentration of the impurities to less than 1 part per billion by volume.
- 2. The method of claim 1, wherein the concentration of said impurities in said ultra-pure gas is less than 100 parts per trillion.
- 3. The method of claim 1, wherein said impurities comprise organic compounds.
- 4. The method of claim 3, wherein said organic compounds comprise straight chain or branched chain hydrocarbons.
- 5. The method of claim 3, wherein said organic compounds comprise aromatic hydrocarbons.
- 6. The method of claim 4, wherein said hydrocarbon is hexane.
- 7. The method of claim 5, wherein said aromatic hydrocarbon is benzene, or ethylbenzene.
- 8. The method of claim 1, wherein said impurities comprise carbon dioxide.
- 9. The method of claim 1, wherein said impurities comprise carbon monoxide.
- 10. The method of claim 1, wherein said impurities comprise water.
- 11. The method of claim 1, wherein said ultra-low emission carbon is maintained in a substantially non-contaminating environment prior to contact with said impure process gas stream.
RELATED APPLICATIONS
[0001] The present invention is a divisional of U.S. patent application Ser. No. 09/777,741, filed Feb. 6, 2001, which is a Continuation-in-Part application of U.S. patent application Ser. No. 09/748,734, filed Dec. 26, 2000, now issued as U.S. Pat. No. 6,425,946.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09777741 |
Feb 2001 |
US |
Child |
10263406 |
Oct 2002 |
US |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09748734 |
Dec 2000 |
US |
Child |
09777741 |
Feb 2001 |
US |