Method for removing layers of organic material

Abstract

organic materials, such as organic polymer resist layers, are removed from substrates by contacting the materials with a mixture consisting essentially of an alkali metal persulfate and concentrated (96%) sulfuric acid wherein the mixture contains from above about 13 to about 50 grams of alkali metal persulfate per 100 milliliters of sulfuric acid.

Description

Continuations (1)

	Number	Date	Country
Parent	743190	Nov 1976