Sellers, "Asymmetric Bipolar Pulsed DC--The Enabling Technology for Reactive PVD", ENI Tech Note, pp. 1-8, Feb. 1996. |
William D. Sproul, HIgh Rate Reactive Sputtering Process Control, Surface and Coatings Technology, 33 (1987) 73-81. |
William D. Sproul and Paul J. Rudnik, The Effect of Target Power on the Nitrogen Partial Pressure Level and Hardness of Reactively Sputtered Titanium Nitride Coatings, Thin Solid Films, 171 (1989) 171-181. |
W. D. Sproul and P. J. Rudnik, Advances in Partial-Pressure Control Applied to Reactive Sputtering, Surface and Coatings Technology, 39/40 (1989) 499-506. |
W. D. Sproul, P. J. Rudnik and M. E. Graham, The Effect of N.sub.2 Partial Pressure, Deposition Rate and Substrate Bias Potential on the Hardness and Texture of Reactively Sputtered TiN Coatings, Surface and Coatings Technology, 39/40 (1989) 355-363. |
X. Chu, M.S. Wong, W. D. Sproul, S. L. Rohde and S. A. Barnett, Deposition and Properties of Polycrystalline TiN/NbN Superlattice Coatings, J. Vac Sci. Technol. A 10(4), Jul./Aug. 1992. |
William D. Sproul, Control of A Reactive Sputtering Process For Large Systems, Presented at the Society of Vacuum Coaters 36th Annual Technical Conference, Dallas, Texas, Apr. 30, 1993. |
J. Affinito and R. R. Parsons, Mechanisms of Voltage Controlled, Reactive, Planar Magnetron Sputtering of Al in Ar/N.sub.2 and AR/O.sub.2 Atmospheres, J. Vac. Sci. Technol. A 2(3), Jul.-Sep. 1984. |
S. Schiller, K. Goedicke, J. Reschke, V. Kirchhoff, S. Schneider and F. Milde, Pulsed Magnetron Sputter Technology, Surface and Coatings Technology, 61 (1993) 331-337. |
P. Frach, U. Heisig, Chr. Gottfried and H. Walde, Aspects and Results of Long-Term Stable Deposition of Al.sub.2 O.sub.3 With High Rate Pulsed Reactive Magnetron Sputtering, Surface and Coatings Technology, 59 (1993) 177-182. |
W. D. Sproul, M. E. Graham, M. S. Wong, S. Lopez, and D. Li, Reactive Direct Current Magnetron Sputtering of Aluminum Oxide Coatings. J. Vac. Sci. Technol. A 13(3), May/Jun. 1995. |
William D. Sproul, Michael E. Graham, Ming-Show and Paul J. Rudnik, Reactive DC Magnetron Sputtering of the Oxides of Ti, Zr, and Hf, Presented at the International Conference on Metallurgical Coatings and Thin Films, Town and Country Hotel, San Diego, California, Apr. 24-28, 1994 and Submitted for publication in Surface and Coatings Technology. |