a) Field of the Invention
The invention relates to a method for synthesizing conjugated polymer and, more particularly, to a method for synthesizing conjugated polymer by plasma polymerization.
b) Description of the Related Art
Plasma polymerization refers to a polymerization reaction by way of free radicals generated from plasma activation, and hence it breaks the conventional reaction rules for chemical functional groups. Since no solvent is needed for the polymerization reaction, the probability of the contamination with respect to products during the polymerization process is greatly reduced. Moreover, because of the simpler process steps for the plasma polymerization than the conventional polymerization method, the production cost of the conventional polymer material is lowered effectively, and mass production thereof can be achieved easily with industrially economic benefits.
In conventional plasma polymerization process, monomers are vaporized outside of a chamber and then introduced by a carrier gas into plasma for the polymerization reaction. The polymer formed by polymerization can be deposited on a substrate and form a smooth polymer film. During the polymerization process, gaseous monomer molecules are subjected to the bombardment of high-speed charged particles in plasma and are shattered into molecular fragments with strong reactivity, before deposited on the substrate. However, the molecules are so heavily damaged due to the large amount of the high-speed charged particles that the polymer film deposited in this way would have great difference in the chemical structure between the film and the monomer. This would limit the applications of plasma polymerization.
In response to lowering the damage to chemical functional groups and structures in plasma polymerization, pulsed plasma was proposed for use in polymerization reaction. Although using pulsed plasma for polymerization does solve a small part of the problems on the damage of functional groups, it also slows the growth of the film, leading to a prolonged reaction period of plasma polymerization. That is a significant drawback for industrial production.
In conclusion, it is now a goal in effort to prevent monomer particles from being damaged during plasma polymerization while synthesizes polymer in a relatively shorter reaction period of time for depositing a polymer film.
In view of the aforementioned problems, an object of the invention is to provide a method for synthesizing conjugated polymer by plasma polymerization, which is capable of preventing monomer particles from being damaged in plasma polymerization process and at the same time, forming conjugated polymer by polymerization in a relatively shorter reaction period of time.
To achieve the object, a method for synthesizing conjugated polymer by plasma polymerization of the invention includes the steps of: introducing at least one monomer at a high concentration into a vacuum chamber; and igniting plasma, wherein the monomer is shattered into preferable-size fragments and is activated, and the activated monomers polymerize or copolymerize with one another to form the conjugated polymer. The monomer includes a conjugate structure and a functional group, and the functional group absorbs energy to break the bonding between the functional group and the monomer after the plasma is ignited.
According to the invention, the functional group of the monomer can effectively protect the conjugate structure of the monomer, which reduces the damage to the conjugate structure caused by plasma. Thus continuous wave plasma can be used to carry out plasma polymerization, which, in turn, shortens the reaction period of time and speeds up the deposition for conjugated polymer film.
The method for synthesizing conjugated polymer by plasma polymerization according to preferred embodiments of the invention will be described in detail with reference to the drawings, in which like reference numerals denote like elements.
Referring to
Next, the method for synthesizing conjugated polymer by plasma polymerization is described. Firstly, the at least one monomer 21 is introduced into the vacuum chamber 11 at a high concentration, wherein the monomers can be solid, liquid, or solid-liquid immiscible, and each of the monomers 21 includes a functional group. Secondly, plasma is ignited to carry out plasma polymerization or copolymerization. When the monomers 21 are subjected to the bombardment of high-speed particles in the plasma, their functional groups absorb the energy of the high-speed particles more easily, and the bonding between the functional group and the monomer 21 is broken, which in turn activates the monomers 21. The activated monomers 21 polymerize with one another at where the bonding is broken to form oligomers 22 and further to form conjugated polymer 23. The vacuum level in the chamber 11 is 0.1 to 1 torr and the power of the plasma is 1 to 400 W.
By controlling different process parameters, conjugated polymer powder can be synthesized or a thin film can be deposited or produced. Therefore, a substrate 31 may be placed in the chamber 11 and the conjugated polymer 23 formed by plasma polymerization can be deposited or produced on the surface of the substrate 31 to form a conjugated polymer thin film. The substrate 31 can be, for example, glass, conductive glass like indium tin oxide glass (ITO), a silicon chip, a polymer substrate, a polymer film, or a composite material.
The monomers 21 used in the plasma polymerization each has a conjugate structure, and the damage to the conjugate structure of the monomer 21 by the high-speed particles in the plasma is reduced by the functional group of the monomer 21. In other words, the functional group of the monomer 21 serves to protect the conjugate structure of the monomer 21. The monomer 21 can be an aromatic organic compound, and preferably an organic compound with multiple benzene rings.
In one embodiment, the monomers 21 are vaporized, and the vaporized monomers 21 can be introduced into the chamber 11 directly with or without using a carrier gas. It is more preferable for the monomers 21 to be introduced into the chamber 11 solo because of the higher concentration of the monomers in the chamber 11, which, in turn, shortens the reaction period of time. If a carrier gas is used, a compound having a conjugate structure or benzene ring is preferred. Through plasma polymerization, the vaporized monomers 21 are activated and polymerize into polymers 23 before depositing on the surface of the substrate 31, forming a conjugated polymer thin film.
In another embodiment, liquid-phase monomers are placed directly into plasma environment for synthesizing polymers by condensed-phase plasma polymerization. For example, liquid-phase monomers 21 are introduced into the chamber 11 at a high concentration and shaped into a flat liquid film on the substrate 31, the surface of which is pretreated by quick plasma surface treatment. Plasma polymerization is then carried out to produce a conjugated polymer thin film on the substrate 31.
In yet another embodiment, after conjugated polymers are synthesized, plasma in the chamber 11 is removed from the chamber 11. This is so that post-polymerization processes can be carried out in the chamber 11 directly without relocating the conjugated polymers 23 or the substrate 31 to another processing chamber, reducing probability of contamination to the product.
Since plasma polymerization reaction occurs randomly, the conjugated polymers thus formed have cross-linked structure which can prevent the crystallization of the conjugated polymers and increase the glass transition temperature Tg thereof. Accordingly, such conjugated polymers have better chemical and thermal stability. Moreover, since polymerization of monomers with conjugate structure can effectively increase the length of conjugate structure, the conjugated polymer therefore can be utilized as an organic light-emitting material with a light-emitting wavelength of 400 to 800 nm.
An example is used to illustrate the method for synthesizing conjugated polymer by plasma polymerization of the invention. In the example, liquid 1-naphthaldehyde is used as monomers, wherein the conjugate structure of the monomer is protected by the fact that the aldehyde group therein is easily subject to damage first by plasma. Substituting the aldehyde with ethyl, the effect of protecting conjugate structure of the monomer remains. First, the 1-naphthaldehyde is heated at a temperature of 40° C. in an insulating container within the chamber 11. Next, in this example, vacuumize the chamber 11 to the extent of 0.2 torr. Last, plasma is started/ignited to carry out polymerization. The power and frequency of plasma have great influence on plasma polymerization. In this example, the plasma is radio frequency plasma with a frequency of 13.56 MHz and power of 30 W or 150 W. After a reaction period of 30 minutes, polymer particles formed by plasma polymerization can be obtained. A conjugated polymer thin film can be obtained on the surface of ITO glass or silicon substrate by adjusting process parameters like the plasma power to 15 W, 30 W, 100 W, 150 W, 200 W, and 250 W, and the reaction period of time to 3 minutes.
Referring to
The absorption spectrum of the plasma-polymerized conjugated polymer is illustrated in
The fluorescence spectrum of a plasma-polymerized conjugated polymer film is shown in
According to the method for synthesizing conjugated polymer by plasma polymerization of the invention, the functional group of the monomer can effectively protect the conjugate structure of the monomer from the damage of the plasma. It is not necessary to reduce the damage of the plasma to the conjugate structure by using the pulsed plasma. In fact, carrying out the plasma polymerization with the continuous wave plasma decreases the reaction period of time and increases the rate of the deposition of the conjugated polymer film. In addition, the small molecule functional group does not participate in the polymerization reaction, and therefore will not contaminate the plasma-polymerized conjugated polymer. Moreover, the monomers having functional groups have a lower melting point, which is beneficial for different types of treatments in the process.
While the invention has been described by way of example and in terms of the preferred embodiments, it is to be understood that the invention is not limited to the disclosed embodiments. To the contrary, it is intended to cover various modifications and similar arrangements as would be apparent to those skilled in the art. Therefore, the scope of the appended claims should be accorded the broadest interpretations so as to encompass all such modifications and similar arrangements.
Number | Date | Country | Kind |
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95142052 | Nov 2006 | TW | national |