Method for the manufacture of a coating

Abstract

Using this method, a coating (1) is manufactured on a substrate (2), which forms a surface of a base body. In this method a layer (3) with ceramic coating material is applied to the substrate in a process chamber (6) using a plasma beam (30) and using an LPPS or LPPS-TF process. The substrate contains at least one metal Me. At a set reaction temperature of the substrate and in the presence of oxygen an oxide, which results reactively with metal M diffused on the surface, is generated as a ceramic intermediate layer (4). The ceramic layer (3) is deposited on this intermediate layer.

Description

The invention will be explained in the following with the help of the drawings, which show:

FIG. 1 a section of a coating, which is manufactured using the method in accordance with the invention,

FIG. 2 a schematic illustration relating to the manufacture of a thin ceramic intermediate layer,

FIG. 3 the side view of a process beam, which is drawn in accordance with a photographic image, wherein individual regions are illustrated with broken lines, and

FIG. 4 a schematic perspective view of the process beam of FIG. 3.

A functional layer, namely a coating 1, as is illustrated in FIG. 1 in section, includes, on a substrate 2, a layer 3 made of ceramic coating material and a ceramic intermediate layer 4, which is manufactured in accordance with the invention using the method illustrated schematically in FIG. 2. The substrate 2 is located on the surface of a not illustrated base body.

The coating method in accordance with the invention was developed for a functional layer which included a columnar layer 3, wherein this columnar layer 3 was to be applied to a special substrate 2, which contains a metal Me which can be oxidised under suitable reaction conditions. The suitable reaction conditions include a reaction temperature, at which the metal Me diffuses to the surface of the substrate 2, where it can be oxidised. One finds, in retrospect, that this method can be applied more generally, namely also on ceramic functional layers whose layer 3 has no co-lumnar structure.

The substrate 2 is the surface of the base body; or it is a bond layer, which is applied on the base body. In the example illustrated in FIG. 1, a ceramic layer 3 which is columnar but which could also be non-columnar is applied onto the substrate 2. A LPPS-TF process is used in the manufacture of the coating 1, with a plurality of uniform and thin layers being applied to the base body in a process chamber 6 (see also FIG. 3) and using a plasma beam 30. The columnar layer 3 is applied using the hybrid method in which vaporous and condensed phases of a ceramic coating material are sprayed on. Prior to the application of the columnar layer 3, which comprises ceramic material, the ceramic intermediate layer 4 is manufactured as a TGO layer (thermal grown oxide) on the substrate 2, see FIG. 2. The use of a LPPS process instead of the LPPS TF process or in combination with this is also possible.

The substrate 2 contains at least the metal Me, to which the reference numeral 24 is assigned in FIG. 2. In the formation of the TGO layer, oxygen O₂—symbolised by particle 64—reacts with the metal Me or also with a plurality of metals. The oxygen 64 is present in the process chamber 6 with a predetermined partial pressure. This is in the range of 0.01 mbar to 20 mbar, depending on the working pressure in the process chamber 6, with the maintenance of a defined value being controlled by mass flow regulators for example. The O₂ partial pressure influences the growth speed and structure in the formation of the TGO layer in this arrangement. In order for this oxidation to arise, the substrate 2 has to be brought to the above-named reaction temperature by means of an energy input, for example by irradiation with infrared, which is symbolised by waves 60. Metal 24 diffuses at the reaction temperature of the substrate 2 to its surface and also to the surface of the intermediate layer 4 which is forming. This layer 4 represents a suitable foundation for the layer 3 which is subsequently to be deposited because it establishes a transition from a metallic material to a ceramic material. The ceramic intermediate layer 4 has a thickness the value of which is in the range of 0.001-2 μm, in particular 0.1-0.6 μm.

The reaction temperature of the substrate 2 necessary for the oxidation depends on its composition. It can be produced by means of an energy input by the plasma beam or by an additional source. The additional source can be arranged inside the process chamber 6 or outside this in a transfer chamber. This source is, in particular, an infrared heater, a laser or an electron beam generator.

The metal Me is advantageously aluminium Al; however, further metals can also be involved in the formation of the ceramic intermediate layer 4. The reaction temperature of the substrate 2 has, in particular, a value in the range of 900-1150° C. This range can also be greater and can, for example, lie between 800° C. and 1200° C.

The substrate 2 comprises a metallic alloy, in particular a material from the group of the MCrAlY alloys, with M=Ni, Co, CoNi or Fe. It can also comprise an aluminide, for example PtAl or PtNiAl or an intermetallic phase, for example an NiAl compound.

The reaction temperature of the substrate 2 is measured, using at least one sensor and set. In this arrangement the sensor can be an infrared pyrometer, a thermal camera or a thermal sensor.

If the substrate 2 is a bond layer, then after the manufacture of the bond layer, the base body to be coated can be introduced into the process chamber 6. The base body is however advantageously first coated with the bond layer in the process chamber 6 by means of the LPPS process, the LPPS-TF process or a PVD method. At the beginning of the coating method the surface of the base body can be cleaned with the plasma beam or a different energy inputting means, for example by a transferred arc from the plasma beam source (“transferred arc cleaning”).

FIG. 3 shows the side view of a process beam 30, which is drawn in accordance with a photographic image; it flows out of a nozzle 51 of a spray gun 5. Vapour of the coating material and particles, which scatter and/or emit light, make the process beam 30 visible. One recognises in particular—even if weaker than shown—an outer surface 30′, which forms a boundary with respect to the remaining space of the process chamber 6. Periodically occurring core regions 31, 34 and 35 can be recognised inside the beam 30, in which the density of the material to be sprayed is greater than in a contiguous region 33, which borders on the surface 30′. Between the core regions 31, 34 and 35 and the region 33 there are transition regions 32, 32′, 32″ with average densities. The process beam 30 spreads out ultrasonically with shock waves forming. At the outlet 53 of the nozzle 51 the pressure is greater than in the atmosphere of the process chamber 6 outside of the process beam 30. A wave-shaped surface 30′ results from an interaction between the surrounding atmosphere and the process beam 30. This interaction also has the result that in hybrid coating methods the vaporous proportion of the material to be coated remains trapped inside the surface 30′. This will be explained more closely with the help of FIG. 4. A ring 53′ marks the beginning of the process beam 30 at the nozzle output 53. Three cross-sections a, c and d of the process beam 30, which flows in the direction of the z-axis, are shown with chain dotted rings. The circular cross-section of the process beam 30 has a variable radius r. At a first point in time, a vapour particle (atom or molecule) is located at a position A marked by a small circle in cross-section a and moves further on a curve 14 through a position B at the beam surface 30′, through a position C at the cross-section c and through a position D at the cross-section d. This vapour particle has a longitudinal speed component v₂ in the flow direction (ultrasonic) and a transversal or radial component v_r, which is smaller than v₂. In the position A v_r=v_r (A)>0. Through the interaction with the gas from the environment 6, the v_r reduces until this speed component in the position B changes direction. In position C is v_r<0 and the vapour particle approaches the z-axis. After a transit through the middle of the process beam 30 v_r>0 is valid again at the position D. Through the interaction with the environment 6, the vapour particle thus makes a wave motion within the boundary surface 30′ of the process beam 30. This largely applies for all vapour particles. The vaporised coating material remains held behind in the process beam 30 with the surface 30′ appearing as a barrier. The vaporous phase can, make its contribution to the composition of the columnar layer, since it does not leave the process beam.

The formation of the columnar layer 3 likewise advantageously takes place by regulation of a defined O₂ partial pressure in order to guarantee an adequate saturation of the layer with O₂, since this not only influences the istoichiometric composition but also the growth and the structure of the columnar layer 3. In this connection the working pressure in the process chamber 6 is in the range of 0.01-20 mbar, preferably 0.05-5 mbar and the O₂ partial pressure is in the range of 0.01-2 mbar, preferably 0.05-1 mbar.

A typical embodiment will be described in the following:

A metallic bond layer of PtAl (with an EB-PVD method) or of MCrAlY (with an LPPS method) is applied on to a component (base body), wherein the roughness of this coating should have a value less than 1 to 2 μm.

In the process chamber 6 the component is heated up to the start temperature (in the range of 900° C. to 1150° C.) by means of the plasma beam of the LPPS method (process gas Ar with an addition of H₂ or He) at a pressure of the surrounding atmosphere of approximately 100 mbar.

A TGO layer of approximately 0.1-0.5 μm thickness forms with the addition of O₂ to the environmental gas with a partial pressure in the range of 0.05-5 mbar during approximately 10-15 minutes. In this arrangement, the component is held at the working temperature by means of a process plasma beam. The temperature and the O₂ partial pressure are kept at constant values in a controlled manner in this arrangement.

A columnar layer (TBC, “thermal barrier coating”)—layer 3—with a thickness of approximately 100 to 200 μm is then applied onto the component by means of the LPPS-TF process at approximately 0.5-5 bar (in accordance with EP-A-1 034 843), wherein the O₂ partial pressure of approximately 0.05-0.5 mbar is maintained and monitored during the entire coating process.

The coated component is finally cooled in a separate lock chamber and protected by an Ar atmosphere.

A body which is manufactured from a metallic material can be coated using the method in accordance with the invention. The coating 1 of such a body has a thickness of the ceramic intermediate layer 4 which is between 0.001-2 μm. This thickness is advantageously between 0.1-0.6 μm. The ceramic intermediate layer 4 can be homogeneously formed over a height of greater than 0.05 μm.

The ceramic layer 3 applied onto the ceramic intermediate layer 4 is, for example, formed in accordance with one of the following alternatives:

• • a) The layer 3 has a non-columnar structure thermally sprayed on by means of the LPPS-TF process.
  • b) A thin columnar part layer becomes a non-columnar part layer in the layer 3.
  • c) The layer 3 consists of a multiple layer structure which includes a combination of columnar and non-columnar part layers and which includes in particular alternately a thin columnar part layer, a non-columnar part layer and at least one further layer with a columnar structure.

In a further embodiment the ceramic layer 3 includes a combination of two metal oxides, which form two columnar part layers. The first metal oxide is in particular a part stabilised zirconium oxide and the second metal oxide is, for example, zirconium oxide which is fully stabilised with dysprosium. The second metal oxide can also be a lanthanum zirconate or an A₂E₂O₇ pyrochlorine, wherein A is preferably an element of the lanthanum series, in particular gadolinium and E is zirconium. The metal oxides can have a perovskite phase or a spinel phase. The ceramic layer 3 can also be formed from a multiple application of the combination of the two metal oxides.

Claims

1. A method for the manufacture of a coating (1) on a substrate (2), which is located on the surface of a base body, in said method a layer (3) with ceramic coating material is applied to the substrate in a process chamber (6) using a plasma beam (30) and using an LPPS or LPPS-TF process, characterised in that the substrate contains at least one metal Me, in that at an adjusted reaction temperature of the substrate and in the presence of reactive oxygen, an oxide which results reactively with metal Me diffused on the surface, is produced as a ceramic intermediate layer (4) and in that the ceramic layer (3) i.e. the layer with the ceramic coating material is deposited on this intermediate layer.

2. A method in accordance with claim 1, characterised in that the substrate (2) is the surface of the base body or a bond layer applied to the base body and in that the reaction temperature of the substrate, which depends on its composition, is produced by means of an energy input (60) by the plasma beam or by an additional source.

3. A method in accordance with claim 2, characterised in that the additional source is arranged inside the process chamber (6) or outside this in a transfer chamber and in that this source is in particular an infra red heater, a laser or an electron beam generator.

4. A method in accordance with claim 1, characterised in that the reaction temperature of the substrate (2) has a value in the range from 800° C.-1200° C., in particular 900° C.-1150° C., with the metal Me being at least partly aluminium Al and thus the substrate comprising an aluminium-containing compound and in that a ceramic intermediate layer (4) is, in particular, formed which comprises α-Al2O3 up to more than 90%.

5. A method in accordance with claim 1, characterised in that the ceramic layer (3) is or includes a columnar part layer, which is sprayed on with the LPPS-TF process by means of the application of a plurality of uniform and thin layers onto the substrate (2), wherein a hybrid method is used in particular, in which the vaporous and condensed phases of the ceramic coating materials are applied.

6. A method in accordance with claim 1, characterised in that the substrate (2) is made of a metallic alloy, in particular of a material from the group of the MCrAlY alloys, with M=Ni, Co, CoNi or Fe, or in that the substrate comprises an aluminide, for example PtAl or PtNiAl, or of an intermetallic phase, for example of an NiAl compound.

7. A method in accordance with claim 1, characterised in that the reaction temperature of the substrate (2) is measured and adjusted using at least one sensor and, wherein the sensor is an infrared pyrometer, a thermal camera or a thermal sensor.

8. A method in accordance with claim 2, characterised in that the substrate (2) is a bond layer and in that the base body is introduced into the process chamber (6) after manufacture of the bond layer or in that the bond layer is only deposited on the base body after the introduction by means of the LPPS or LPPS-TF process.

9. A method in accordance with claim 1, characterised in that at the beginning the surface of the base body is cleaned with the plasma beam (30) or with a another energy inputting means.

10. A method in accordance with claim 1, characterised in that for the formation of the ceramic intermediate layer (4) a value in the range of 0.01-20 mbar, preferably in the range of 0.05-5 mbar is set for the required oxygen partial pressure in the process chamber (6) and is, in particular, checked during the entire process.

11. A method in accordance with claim 1, characterised in that for the defined formation of the layer structure a suitable oxygen part pressure in the range of 0.01-2 mbar, preferably in the range of 0.05-1 mbar is set in the process chamber during application of the columnar part layer and is, in particular, checked during the entire process.

12. A coated body, which is manufactured from a metallic material and the coating of which (1) is applied using the method in accordance with claim 1, characterised in that the thickness of the ceramic intermediate layer (4) is between 0.001-2 μm, wherein this thickness is advantageously between 0.1-0.6 μm and/or the ceramic intermediate layer is homogeneously formed over a height greater than 0.05 μm.

13. A coated body in accordance with claim 12, characterised in that a ceramic layer (3) is applied on the ceramic intermediate layer (4), which is formed in accordance with one of the following alternatives: a) the ceramic layer has a non-columnar structure, thermally sprayed on by means of the LPPS-TF process;b) a thin columnar part layer (3) goes into a non-columnar part layer in the ceramic layer;c) the ceramic layer comprises a multiple layer, which includes a combination of columnar and non-columnar part layers and which alternatingly includes in particular a thin columnar part layer, a non-columnar part layer and at least one further layer with a columnar structure.

14. A coated body in accordance with claim 12, characterised in that the ceramic layer (3) includes a combination of two metal oxides, which form two columnar part layers and in that in particular the first metal oxide is a partly stabilised zirconium oxide and the second metal oxide is a zirconium oxide fully stabilised with dysprosium or a lanthanum zirconate or an A2E2O7 pyrochlorine, wherein A is preferably an element of the lanthanum series, in particular gadolinium and E is zirconium.

15. A coated body in accordance with claim 14, characterised in that the metal oxides have a perovskite phase or a spinel phase.

16. A coated body in accordance with claim 14, characterised in that the ceramic layer (3) is formed by a multiple application of the combination of the two metal oxides.