Claims
- 1. A treating apparatus for decomposing organohalogen compounds used for performing a decomposing method of the organohalogen compounds with catalyst comprising:
- a reactor filled with a catalyst,
- means for adding air to gas flow containing organohalogen compounds,
- means for conducting the gas flow containing said organohalogen compounds and air into said reactor,
- means for heating said reactor so that the gas flow contacts with the catalyst at a temperature in a range of 200.about.500.degree. C.,
- means for adding an effective amount of water vapor to the gas flow for decomposing said organohalogen compounds, and
- alkaline absorbers for washing organohalogen decomposition products, which are generated by contacting said gas flow with the catalyst filled into said reactors, with an alkaline aqueous solution in order to neutralize a part of carbon dioxide and halogenated hydrogen in said organohalogen decomposition products, wherein
- said catalyst comprises titania and tungsten oxide, the titania having a surface,
- said catalyst has an atomic ratio of Ti and W in a range from 20 mol % to 95 mol % Ti and from 5 mol % to 80 mol % W, and
- at least the surface of said titania is covered with a porous layer of tungsten oxide.
- 2. A treating apparatus for decomposing organohalogen compounds as claimed in claim 1, wherein a means for adsorbing carbon monoxide in said decomposition products which are not neutralized at the alkaline absorbers is provided downstream of said alkaline absorbers.
- 3. A treating apparatus for decomposing organohalogen compounds as claimed in claim 1, wherein the porous layer of tungsten oxide covers the surface of the titania so as to prevent poisoning of the titania by fluorine.
- 4. A treating apparatus for decomposing organohalogen compounds as claimed in claim 1, wherein said catalyst consists essentially of titania and tungsten oxide.
- 5. A treating apparatus for decomposing organohalogen compounds as claimed in claim 1, wherein said porous layer has a thickness of 1 .ANG. to 5 mm.
- 6. A treating apparatus for decomposing organohalogen compounds as claimed in claim 1, wherein said catalyst has an atomic ratio of Ti and W in a range 40 mol % to 90 mol % Ti and from 10 mol % to 60 mol % W.
- 7. A treating apparatus for decomposing organohalogen compounds as claimed in claim 1, wherein said catalyst has an atomic ratio of Ti and W in a range 20 mol % to 85 mol % Ti and from 15 mol % to 80 mol % W.
- 8. A treating apparatus for decomposing organohalogen compounds as claimed in claim 1, wherein said reactor is selected from the group consisting of a fixed bed reactor, a fluidized bed reactor and a mobile bed reactor.
- 9. A treating apparatus for decomposing organohalogen compounds as claimed in claim 1, further comprising a preheater upstream of the reactor.
- 10. A treating apparatus for decomposing organohalogen compounds as claimed in claim 1, wherein said catalyst is a catalyst prepared by a method including impregnating TiO.sub.2 with a solution containing W, and wherein said catalyst has an atomic ratio of Ti and W in a range from 20 mol % to 90 mol % Ti and 10 mol % to 80 mol % W.
- 11. A treating apparatus for decomposing organohalogen compounds as claimed in claim 10, wherein said catalyst is a catalyst prepared by a method including the further step of calcining the TiO.sub.2 impregnated with said solution, to convert the W to WO.sub.3.
Priority Claims (1)
Number |
Date |
Country |
Kind |
6-327177 |
Dec 1994 |
JPX |
|
Parent Case Info
This application is a divisional application of Ser. No. 08/572,878, filed on Dec. 18, 1995 now U.S. Pat. No. 5, 759, 504.
US Referenced Citations (7)
Foreign Referenced Citations (2)
Number |
Date |
Country |
3-47516 |
Feb 1991 |
JPX |
6-59388 |
Aug 1994 |
JPX |
Divisions (1)
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Number |
Date |
Country |
Parent |
572878 |
Dec 1995 |
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