Thermionic energy converters offer the prospect of converting high temperature heat in a relatively high temperature range directly to electricity. This high temperature heat could be generated by nuclear or concentrated solar sources. In addition, thermionic energy converters offer the prospect of performing a topping conversion cycle in conventional steam electrical power plants. In any of these electrical energy generation applications it is desirable to obtain high conversion efficiencies. Generally, system efficiencies on the order of 10-20% have been obtained by utilizing a high work function emitter in conjunction with a lower work function collector. Thus, thermionic energy converters are limited in efficiency by the work functions of the materials available. Also, some of the materials used in thermionic energy converters, such as diamond, are extraordinarily expensive. It is within this context that the embodiments arise.
In some embodiments, a method for tuning a work function in a thermionic emission device is provided. The method includes illuminating an N type semiconductor material of a first member of a thermionic emission device, wherein a work function of the N type semiconductor material is lowered by the illuminating. The method includes collecting, on one of the first member or a second member of the thermionic emission device, electrons emitted from one of the first member or the second member.
In some embodiments, a thermionic emission device is provided. The device includes a first member having an N type semiconductor material and a lighting member configured to illuminate the N type semiconductor material of the first member, wherein a work function of the N type semiconductor material is decreased as a result of such illumination. The device includes a second member arranged to collect electrons emitted by the first member or to emit electrons that are collected by the second member.
Other aspects and advantages of the embodiments will become apparent from the following detailed description taken in conjunction with the accompanying drawings which illustrate, by way of example, the principles of the described embodiments.
The described embodiments and the advantages thereof may best be understood by reference to the following description taken in conjunction with the accompanying drawings. These drawings in no way limit any changes in form and detail that may be made to the described embodiments by one skilled in the art without departing from the spirit and scope of the described embodiments.
The embodiments provide for tuning a material's work function and for producing a material surface with an ultra-low-work-function for a variety of applications in thermionic energy conversion devices and other vacuum electronics. This method may also be used to create an entirely new class of devices based on room temperature electron emission.
The work function is defined as the energy difference between a material's Fermi level and the vacuum level, i.e., the energy required to remove an electron from the surface of the material. The work function is one of the fundamental properties of a surface. For example, the thermionic electron current density, J, emitted by a surface is governed by the work function W as described by the Richardson-Dushman (RD) equation, J=A T{circumflex over ( )}2 exp(−W/kT), where A is the RD constant and T is the temperature. The RD equation shows that the thermionic current will increase when the work function is decreased. The work function also governs the electric potential difference between two contacting electrodes (contact potential) and the photoemission threshold. The ability to control a material's work function is therefore of critical technological importance, because these surface phenomena are exploited in areas including solar and thermal energy conversion, light detection, spectroscopy, microscopy, and e-beam lithography.
In the present method and devices, the surface photovoltage effect is used in combination with a work-function lowering coating on an n-type semiconductor to induce an ultra-low work-function surface. In an n-type semiconductor the Fermi level is near the conduction band. However, at the surface, defect-states often pin the Fermi level close to midgap. This results in an internal electric field or depletion region near the surface that drives electrons away from the surface and holes towards the surface. This effect is known as “upward band-bending”. When the surface is illuminated with light that has energy greater than the bandgap, holes are generated and swept towards the surface by the internal electric field. If enough charge builds up, the internal electric field is screened by the holes, and the bands flatten. This is referred to as the “surface photovoltage effect”. The surface photovoltage is essentially the change in the amount of surface band bending under illumination. The amount of band bending in the dark is usually approximately half of the bandgap, corresponding to the difference between Fermi levels at the surface (close to midgap) and in the bulk (close to conduction band). As a result, the magnitude of the obtainable surface photovoltage (SPV) is also usually limited to half the bandgap, with half the bandgap achieved if the bands flatten completely under illumination. Since vacuum level is fixed with respect to the conduction band edge immediately at the surface, the SPV causes the bulk conduction band to move closer to the vacuum level, and thus the Fermi level moves closer to the vacuum level. The work function reduction is equal to the SPV, because the band flattening reduces the difference between the Fermi level and the vacuum level as shown in
Experiments conducted at SSRL (Stanford Synchrotron Radiation Light Source) on beamline 8-1 demonstrate this effect and the results are illustrated in
Thermionic energy converters (TECs) are solid state heat engines which directly convert heat into electricity. A TEC consists of a metallic cathode which is heated to generate electric current that is collected by a cooler low work function anode. The voltage output of a TEC is approximately the difference of the work function of the cathode 400 and anode 402 of
TEC anodes have been made using materials with work functions of 1.5 eV, but the optimal work function of a room temperature anode is about 0.5 eV. While there is no known fundamental limit on how low the work function of a surface may be, the lowest previously reported values are ˜1 eV. However, these require pristine surfaces only achievable in ultra-high-vacuum rendering them unsuitable for TECs and PETE devices. The method described herein may be used to lower the work function of chemically stable, moderately low-work-function (1-2 eV) semiconductor surfaces to values that are optimal for TECs and PETE devices (0.5-1 eV). This will enable TECs to approach the thermodynamic limit of efficiency.
System-level calculations show that operating temperatures below about 1000 degrees K are achievable and the efficiency of TECs can approach and exceed 40% if an anode with a work function of less than 1 eV is used as illustrated by the graph of
The present method may also be used in electron emitter applications. Many electron emitters operate by heating a filament to extremely high temperatures to cause thermionic emission. According to the Richardson-Dushman equation thermionic emission may occur at room temperature from surfaces with a work function of ˜0.5 eV or lower, which may be achievable with the present method. Emission from such surfaces may also be optically switched on and off quickly with a time scale on the order of the minority carrier recombination time. Room temperature electron emitters, an entirely new class of devices, could be useful in numerous applications, including scanning electron microscopes, electron guns, klystrons, magnetrons, THz sources, and traveling wave tubes.
The method described herein, and variations thereof may be used to create lower work functions than ever achieved before. A work function of 0.7 eV has already been achieved with the present method. The most common method for creating ˜1 eV work function surfaces (Cs+O coating on a metal or semiconductor) requires ultra-high vacuum and has poor chemical stability. More chemically stable coatings such as Ba+O do not have such a low function. The method described herein allows the use of coatings that are simpler to create and are more robust.
Most electron emitters operate by heating to cause thermionic emission. Extremely high temperatures are required, because work functions are generally rather high, which limits the types of materials that may be used. The present method will enable electron emission at relatively low temperatures, including room temperature, opening up a variety of new applications and material options. This method may be used to create low-work-function electron collector or electron emitter, or both, as stated in the device applications section.
The semiconducting material may be varied. The effect is very general, and should be usable with virtually any semiconductor. Some examples include gallium arsenide, silicon, gallium nitride, silicon carbide, and zinc oxide. The doping of the semiconductor may also be varied in concentration or it may also be p-type instead of n-type. In a p-type material, the SPV effect will increase the work function. If a p-type material is being used as an electron emitter, then illuminating the surface may increase the work function enough to shut off the emission current. Therefore the SPV effect may also be used in a p-type material for tuning the work function and fast switching of electron emission.
The work function lowering coating may be varied for various properties such as thermal or chemical stability. Some possibilities include Cs, Cs+O, Ba, Ba+O, Sr, Sr+O, Ca, or Ca+O. Illumination of the semiconductor surface may be achieved through passive or active methods. An example of a passive method may be in a TEC that is heated by concentrated sunlight. The semiconductor anode may passively absorb a small fraction of the total sunlight to induce the SPV effect. An example of an active method would be to illuminate the anode surface using a dedicated light emitting diode or laser.
The embodiments described herein use surface photovoltage in n-type semiconductor, which is a simpler device structure than a surface with incorporated p-n junction. The surface with the incorporated p-n junction also suffers from many additional mechanisms for electron recombination. For example, the downward surface band bending region of the surface p-type layer may trap electrons, leading to their recombination. Electrons may also recombine deeper (in the “bulk”) of the p-type layer as the electrons would be minority carriers in this case. In contrast, in our approach, electrons are always in n-type material and therefore remain majority carriers throughout. Also, surface band bending is typically upward, which prevents trapping and recombination at the surface.
Low work function surfaces are used in numerous applications, and there is no known fundamental limit on how low the work function can be. By using a method to create a surface which has a work function low enough for low temperature thermionic emission, numerous known and unknown commercial opportunities may be enabled. If the work function can be lowered to about 0.5 eV, room temperature thermionic emitters will be realized leading to new applications. In addition, the efficiency of PETE or thermionic energy converters can be dramatically increased to over 50%, approaching the thermodynamic limits.
Example applications include:
Here, the collector anode 402 is a semiconductor material, particularly an N doped semiconductor material, N doped gallium arsenide in this example. The collector or anode 402 is illuminated, with laser light in this example, and thus has a reduced work function as a result of the surface photovoltage effect. The electrons drop down from the vacuum energy level 404 through the reduced work function and therefore have more energy available for performing electrical work, which is expressed as a voltage Vout across a load resistor (RL) 406. The collected electrons thus perform work equal to the current through the load resistor 406 times the voltage Vout across the load resistor, as the electrons are returned to the emitter or cathode 400 in a closed circuit. This amount of work, i.e., the efficiency of the apparatus, is increased by the decreasing of the work function at the collector or anode 402, which results in an increased voltage Vout across the load resistor 406. It should be appreciated that the electrical work available from the apparatus could be applied to various loads in practical applications.
Reversing the bias of the thermionic energy converter of
In the lower part of
It should be appreciated that the thermionic energy converter devices disclosed herein can be used for heat harvesting applications. In one embodiment, a thermionic energy converter is attached to a catalytic converter in an automobile or other transportation vehicle with an internal combustion engine. In one embodiment, a thermionic energy converter is used in a cogeneration system in a home or industrial application. In other embodiments, a thermionic energy converter is attached to a jet engine to generate electricity from the waste heat.
Detailed illustrative embodiments are disclosed herein. However, specific functional details disclosed herein are merely representative for purposes of describing embodiments. Embodiments may, however, be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein.
It should be understood that although the terms first, second, etc. may be used herein to describe various steps or calculations, these steps or calculations should not be limited by these terms. These terms are only used to distinguish one step or calculation from another. For example, a first calculation could be termed a second calculation, and, similarly, a second step could be termed a first step, without departing from the scope of this disclosure. As used herein, the term “and/or” and the “/” symbol includes any and all combinations of one or more of the associated listed items.
As used herein, the singular forms “a”, “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises”, “comprising”, “includes”, and/or “including”, when used herein, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. Therefore, the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting.
It should also be noted that in some alternative implementations, the functions/acts noted may occur out of the order noted in the figures. For example, two figures shown in succession may in fact be executed substantially concurrently or may sometimes be executed in the reverse order, depending upon the functionality/acts involved.
With the above embodiments in mind, it should be understood that the embodiments might employ various computer-implemented operations involving data stored in computer systems. These operations are those requiring physical manipulation of physical quantities. Usually, though not necessarily, these quantities take the form of electrical or magnetic signals capable of being stored, transferred, combined, compared, and otherwise manipulated. Further, the manipulations performed are often referred to in terms, such as producing, identifying, determining, or comparing. Any of the operations described herein that form part of the embodiments are useful machine operations. The embodiments also relate to a device or an apparatus for performing these operations. The apparatus can be specially constructed for the required purpose, or the apparatus can be a general-purpose computer selectively activated or configured by a computer program stored in the computer. In particular, various general-purpose machines can be used with computer programs written in accordance with the teachings herein, or it may be more convenient to construct a more specialized apparatus to perform the required operations.
A module, an application, a layer, an agent or other method-operable entity could be implemented as hardware, firmware, or a processor executing software, or combinations thereof. It should be appreciated that, where a software-based embodiment is disclosed herein, the software can be embodied in a physical machine such as a controller. For example, a controller could include a first module and a second module. A controller could be configured to perform various actions, e.g., of a method, an application, a layer or an agent.
The embodiments can also be embodied as computer readable code on a non-transitory computer readable medium. The computer readable medium is any data storage device that can store data, which can be thereafter read by a computer system. Examples of the computer readable medium include hard drives, network attached storage (NAS), read-only memory, random-access memory, CD-ROMs, CD-Rs, CD-RWs, magnetic tapes, and other optical and non-optical data storage devices. The computer readable medium can also be distributed over a network coupled computer system so that the computer readable code is stored and executed in a distributed fashion. Embodiments described herein may be practiced with various computer system configurations including hand-held devices, tablets, microprocessor systems, microprocessor-based or programmable consumer electronics, minicomputers, mainframe computers and the like. The embodiments can also be practiced in distributed computing environments where tasks are performed by remote processing devices that are linked through a wire-based or wireless network.
Although the method operations were described in a specific order, it should be understood that other operations may be performed in between described operations, described operations may be adjusted so that they occur at slightly different times or the described operations may be distributed in a system which allows the occurrence of the processing operations at various intervals associated with the processing.
In various embodiments, one or more portions of the methods and mechanisms described herein may form part of a cloud-computing environment. In such embodiments, resources may be provided over the Internet as services according to one or more various models. Such models may include Infrastructure as a Service (IaaS), Platform as a Service (PaaS), and Software as a Service (SaaS). In IaaS, computer infrastructure is delivered as a service. In such a case, the computing equipment is generally owned and operated by the service provider. In the PaaS model, software tools and underlying equipment used by developers to develop software solutions may be provided as a service and hosted by the service provider. SaaS typically includes a service provider licensing software as a service on demand. The service provider may host the software, or may deploy the software to a customer for a given period of time. Numerous combinations of the above models are possible and are contemplated.
Various units, circuits, or other components may be described or claimed as “configured to” perform a task or tasks. In such contexts, the phrase “configured to” is used to connote structure by indicating that the units/circuits/components include structure (e.g., circuitry) that performs the task or tasks during operation. As such, the unit/circuit/component can be said to be configured to perform the task even when the specified unit/circuit/component is not currently operational (e.g., is not on). The units/circuits/components used with the “configured to” language include hardware—for example, circuits, memory storing program instructions executable to implement the operation, etc. Reciting that a unit/circuit/component is “configured to” perform one or more tasks is expressly intended not to invoke 35 U.S.C. 112, sixth paragraph, for that unit/circuit/component. Additionally, “configured to” can include generic structure (e.g., generic circuitry) that is manipulated by software and/or firmware (e.g., an FPGA or a general-purpose processor executing software) to operate in manner that is capable of performing the task(s) at issue. “Configured to” may also include adapting a manufacturing process (e.g., a semiconductor fabrication facility) to fabricate devices (e.g., integrated circuits) that are adapted to implement or perform one or more tasks.
The foregoing description, for the purpose of explanation, has been described with reference to specific embodiments. However, the illustrative discussions above are not intended to be exhaustive or to limit the invention to the precise forms disclosed. Many modifications and variations are possible in view of the above teachings. The embodiments were chosen and described in order to best explain the principles of the embodiments and its practical applications, to thereby enable others skilled in the art to best utilize the embodiments and various modifications as may be suited to the particular use contemplated. Accordingly, the present embodiments are to be considered as illustrative and not restrictive, and the invention is not to be limited to the details given herein, but may be modified within the scope and equivalents of the appended claims.
This application is a divisional of U.S. patent application Ser. No. 14/333,431, filed Jul. 16, 2014 and hereby incorporated by reference in its entirety. Application Ser. No. 14/333,431 claims the benefit of U.S. Provisional Application No. 61/846,728 filed Jul. 16, 2013, which is hereby incorporated by reference.
Number | Date | Country | |
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61846728 | Jul 2013 | US |
Number | Date | Country | |
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Parent | 14333431 | Jul 2014 | US |
Child | 17538280 | US |