Claims
- 1. In a process for producing a gas sensor that comprises a pump element having a pair of electrodes formed on a solid electrolyte that conducts ions of a gaseous component of interest and a porous material that is capable of limiting gas diffusion and which is interposed between one of said electrodes of said pump element and a gas to be analyzed that contains said gaseous component of interest, an electric current being allowed to flow through said pump element so as to change a concentration of said gaseous component of interest, said gaseous component of interest being permitted to diffuse through said porous material, and said concentration of said gaseous component of interest in said gas to be analyzed being related to a value of said applied current that corresponds to an amount of said gas diffusion so as to measure said concentration of said gaseous component of interest, the improvement wherein said process comprises the steps of:
- providing an electrolytic liquid impregnant containing a predetermined concentration of a component that adheres to or binds with said porous material;
- applying an electric current to the pump element so as to determine dan ability of said porous material in said gas sensor to limit gas diffusion;
- impregnating or dripping said liquid impregnant in said porous material in an amount dependent upon said determination of said ability of said porous material to limit gas diffusion so as to adjust the porosity of the porous body to attain an optimum level of gas diffusion limitation; and
- heating or drying said treated porous material so that said component will be adhered or bound to said porous material.
- 2. A method as recited in claim 1, wherein said liquid impregnant is a solution of a metal salt.
- 3. A method as recited in claim 2, wherein said metal salt is composed of A1((NO.sub.3).sub.3.
- 4. A method as recited in claim 2, wherein said metal salt is composed of CaCl.sub.2.
- 5. A method as recited in claim 2, wherein said metal salt is composed of H.sub.2 PtCl.sub.6.
- 6. A process as recited in claim 1 wherein said gaseous component of interest is oxygen gas.
- 7. A process as recited in claim 1 wherein said liquid impregnant is a solution of an organometallic compound.
- 8. A process as recited in claim 1 wherein said liquid impregnant is a solution of silicon salt.
- 9. The process as recited in claim 1, wherein said liquid impregnant is A1(NO.sub.3).sub.3.
- 10. The process as recited in claim 1, wherein said liquid impregnant is H.sub.2 PtCl.sub.2.
- 11. In a process for producing a gas sensor that comprises a pump element having a pair of electrodes formed on a solid electrolyte that conducts ions of a gaseous component of interest and a porous material that is capable of limiting gas diffusion and which is interposed between one of said electrodes of said pump element and a gas to be analyzed that contains said gaseous component of interest, an electric current being allowed to flow through said pump element so as to change a concentration of said gaseous component of interest, said gaseous component of interest being permitted to diffuse through said porous material, and said concentration of said gaseous component of interest in said gas to be analyzed being related to a value of said applied current that corresponds to an amount of said gas diffusion so as to measure said concentration of said gaseous component of interest, the improvement wherein said process comprises the steps of:
- measuring a gas diffusion resistance using said pair of electrodes of said sensor and said electric current flowing through said pump element; and
- modifying the porosity of said porous material by impregnating an electrolytic liquid therein to adjust said porosity so as to achieve a predetermined gas diffusion resistance in accordance with an initial determination of said gas diffusion resistance.
- 12. The process as recited in claim 11 wherein said gaseous component of interest is oxygen gas.
- 13. The process as recited in claim 11 wherein said liquid impregnant is a solution of organometallic compound.
- 14. The process as recited in claim 11 wherein said liquid impregnant is a solution of silicate salt.
- 15. The process as recited in claim 11, wherein said liquid impregnant is A1(NO.sub.3).sub.3.
- 16. The process as recited in claim 11, wherein said liquid impregnant is H.sub.2 PtCl.sub.2.
- 17. In a process for producing a gas sensor that comprises a pump element for conducting ions of a gaseous component of interest, a porous body for limiting gas diffusion, and a sensor cell for determining the ability of said porous body to limit diffusion of said gaseous component of interest, the improvement wherein said process comprises the steps of:
- heating said gas sensor to a predetermined temperature;
- applying a constant current through said sensor cell;
- adjusting the current through said pump element to obtain a predetermined voltage across said sensor cell;
- measuring the current through said pump element required to obtain the predetermined voltage across said sensor cell; and
- impregnating said porous material with an electrolytic liquid impregnant, comprising a component which adheres to or binds with said porous material, in an amount determined in accordance with the measured current through said pump element to adjust a porosity of said porous material so as to obtain a desired gas diffusion resistance.
- 18. The process as recited in claim 17 wherein said gaseous component of interest is oxygen gas.
- 19. The process as recited in claim 17 wherein said liquid impregnant is a solution of organometallic compound.
- 20. The process as recited in claim 19, wherein said liquid impregnant is a solution of silicate salt.
- 21. The process as recited in claim 17, wherein said liquid impregnant is A1(NO.sub.3).sub.3.
- 22. The process as recited in claim 17, wherein said liquid impregnant is H.sub.2 PtCl.sub.2.
Priority Claims (1)
Number |
Date |
Country |
Kind |
60-294440 |
Dec 1985 |
JPX |
|
Parent Case Info
This is a continuation of application Ser. No. 07/235,716, filed Aug. 22, 1988 now abandoned which is a continuation of application Ser. No. 06/945,993, filed Dec. 24, 1986.
US Referenced Citations (8)
Foreign Referenced Citations (2)
Number |
Date |
Country |
1418280 |
Dec 1975 |
GBX |
1538841 |
Jan 1979 |
GBX |
Continuations (2)
|
Number |
Date |
Country |
Parent |
235716 |
Aug 1988 |
|
Parent |
945993 |
Dec 1986 |
|