Patent Application
20140020824
This application claims priority to Taiwan Application Serial Number 101126241, filed Jul. 20, 2012, which is herein incorporated by reference.
1. Technical Field
The present disclosure relates to a method for annealing liquid crystal, and more particularly, to a method for rapidly annealing a liquid crystal layer having various thicknesses simultaneously.
2. Description of Related Art
Liquid crystal (LC) is a distinct phase of matter. With special physicochemical and optical properties, the liquid crystal has been widely applied to thin and light-weight display techniques since the last century.
A process of annealing is normally adopted to rearrange molecules of the liquid crystal. During the process of annealing the liquid crystal, an alignment film is used to control an arrangement direction of the liquid crystal molecules, such that the liquid crystal molecules can be rearranged along the predetermined arrangement direction of the alignment film.
Conventionally, the liquid crystal is annealed by a hot air heater to heat the liquid crystal molecules. However, using the hot air heater for annealing requires a long period of processing time. For example, Taiwan patent application (publication No. 201100489) disclosed that the time of annealing the liquid crystal was up to 1 hour. Further, if an infrared heater is used to replace the hot air heater to anneal the liquid crystal, the annealing time can be shorten but with the shortcoming of non-uniformly heating of the liquid crystal, which would be more worse when a layer of the liquid crystal having non-uniform thicknesses. Therefore, the industry desires to develop an effective method of shortening the time required for annealing the liquid crystal and without the side effects of the non-uniformly heating.
In order to solve the aforementioned problems in the related art, the present disclosure provides a method for uniformly heating liquid crystal and effectively shortening the time required for annealing the liquid crystal.
According to the present disclosure, a method for annealing the liquid crystal includes the steps below. First, a substrate having a liquid crystal layer thereon is provided. A lens structure is disposed between the substrate and a contact surface of the liquid crystal layer. The liquid crystal layer fills and levels up the lens structure, and the liquid crystal layer has a thickness difference ranging from 10 to 150 μm between the thickest portion and the thinnest portion. An infrared light-absorbing layer having a transmittance of infrared light in a range of 5 to 70% covers the liquid crystal layer. An infrared heater irradiates infrared light through the infrared light-absorbing layer to the substrate to heat it so as to anneal the liquid crystal and shorten the time of annealing the liquid crystal.
The method for annealing liquid crystal of the present disclosure can shorten the time required for annealing the liquid crystal and uniformly heat the liquid crystal layer simultaneously. When processing a liquid crystal layer having various thicknesses, the method for annealing the liquid crystal of the present disclosure shows superiority compared to the conventional art.
The disclosure may be more fully understood by reading the following detailed description of the embodiment, with reference made to the accompanying drawings as follows:
The present disclosure is described by the following specific embodiments. Those with ordinary skill in the arts can readily understand the other advantages and functions of the present disclosure after reading the disclosure of this specification. The present disclosure can also be implemented with different embodiments. Various details described in this specification can be modified based on different viewpoints and applications without departing from the scope of the present disclosure.
As used herein, the singular forms “a,” “an” and “the” include plural referents unless the context clearly dictates otherwise. Therefore, reference to, for example, a data sequence includes aspects having two or more such sequences, unless the context clearly indicates otherwise.
Reference will now be made in detail to the embodiments of the present disclosure, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.
Please refer to
Next, an infrared light-absorbing layer 14 covers the liquid crystal layer 12 to physically contact to the liquid crystal layer 12. The infrared light-absorbing layer 14 of the present disclosure is used to absorb and convert a portion of infrared light 16 into heat and let another portion of infrared light 16 pass through, which directly irradiates and heats up the liquid crystal layer 12. Therefore, during irradiation of the infrared light 16, the liquid crystal layer 12 is not only heated by the absorption of the infrared light 16 from the infrared light-absorbing layer 14 (i.e., conductive heat), but also heated by the direct irradiation of the infrared light 16 (i.e., radiation heat).
For considerations of applications of optical films, the aforementioned substrate 10 is preferably a transparent and flexible substrate, better made of an isotropic material (i.e., it does not have birefringence). The material of the substrate which can be applied of the present disclosure includes but not limited to acrylate resin, cellulose triacetate, epoxy resin, polysiloxane, polyimide, polyetherimide, perfluorocyclobutane, benzocyclobutene (BCB), polycarbonate, polymethyl methacrylate, polyurethane or poly (dimethyl siloxane), and better is acrylate resin and cellulose triacetate. The thickness of the substrate 10 of the present disclosure is not limited, and users can select a suitable thickness according to their demands.
The shape of the lens structure 11 disposed on the substrate 10 of the present disclosure is not limited, and users can select a suitable shape according to their demands.
The thickness d2 of the thinnest portion of the liquid crystal layer 12 is not limited, and users can select a suitable thickness according to their demands. However, for considerations of applications of optical films, the thickness d2 of the thinnest portion of the liquid crystal layer 12 is preferably in a range of 1 to 10 μm, better in a range of 2 to 8 μm. Further, the liquid crystal which can be applied to the liquid crystal layer 12 of the present disclosure is not limited, and the conventional liquid crystals, which can be applied to optical films, can all be applied to the present disclosure. Specifically, the shape of the liquid crystal can be calamitic, discotic, smecdic or a combination thereof. More specifically, the aforementioned calamitic liquid crystal includes but not limited to nematic liquid crystal, cholesteric liquid crystal and smectic liquid crystal. The aforementioned discotic liquid crystal includes but not limited to columnar liquid crystal and nematic liquid crystal.
The method for forming the liquid crystal layer 12 is not limited, and includes but not limited to a spin coating method, a vacuum pressure method and a roll-to-roll lamination method.
In order to correspond to the substrate 10 and employ a roll-to-roll process, the infrared light-absorbing layer 14 is preferably flexible. The infrared light-absorbing layer 14 can be prepared by coating oil ink on a flexible transparent plastic substrate or mixing a pigment into a raw material of the flexible transparent plastic substrate and then extruding the flexible plastic substrate. The aforementioned oil ink or colorant refers to the material absorbing and converting infrared light to heat after irradiating infrared light. Further, in order to uniformly heat the liquid crystal layer 12, the infrared light-absorbing layer 14 preferably has transmittance of infrared light in a range of 5-70%, better in a range of 10 to 60%.
The coating thickness of the aforementioned oil ink on the plastic substrate is not limited, and users can understand the coating thickness of the oil ink can be adjusted according to the selected type of the oil ink so as to correspond to the transmittance of infrared light through the description of the present disclosure. Specifically, the coating thickness of the oil ink is preferably in a range of 0.1 to 2.0 μm, better in a range of 0.2 to 1.8 μm. The oil ink which can be applied to the present disclosure includes a two-liquid reaction type oil ink, a heat curable oil ink and an UV-curable ink, but not limited thereto. The two-liquid reaction type oil ink refers to a main agent and a curing agent, which are respectively prepared, and those agents are mixed during a printing process. The main agent is mostly composed of epoxy resin and urethane, and performs polycondensation reaction and thereby cured after adding the curing agent (e.g., amines). The aforementioned heat curable oil ink refers to a premixture composed of a resin and a curing agent, and those agents perform a reaction and thereby cured by heating after printing to form an oil ink film. The commonly used resin is a single-liquid epoxy resin. The aforementioned UV-curable ink refers to a resin without any solvent, and it does not evaporate solvent during printing and performs polymerization during irradiating UV to form an oil ink film.
The pigment which can be applied to the present disclosure is not limited, and the conventional pigments which can be mixed in a raw material of a flexible transparent plastic substrate can all be applied to the present disclosure. The specific examples of the pigment includes but not limited to natural inorganic pigments, artificial inorganic pigments and natural organic pigments, such as plant organic pigments or insect organic pigments.
The infrared light 16 of the present disclosure refers to the infrared light that any skilled in the art understands; more specifically, it refers to the light in a wavelength range of 750 to 1500 nm.
Please refer to
Please refer to
In the method for annealing the liquid crystal of the present disclosure, users can adjust the heating temperature of the infrared heater 22 according to the selected type of the liquid crystal. Specifically, the heating temperature is preferably in a range of 70 to 100° C., better in a range of 75 to 90° C. The total heating time of the laminate 20 through the infrared heater 22 is not limited, and users can adjust in accordance with the heating temperature, the thickness of the liquid crystal layer and the thickness difference, and the transmittance of infrared light of the infrared light-absorbing layer. But overall, the heating time of annealing the liquid crystal of the present disclosure can be shortened to less than 20 minutes, and it has significant superiority compared to prior art which using hot air to heat requires 1 hour or more.
Before aligning the liquid crystal layer 12, liquid crystal molecules usually arrange in non-uniform directions, and the situation is not conductive to applications of the field of optical films. In order to align the liquid crystal molecules of the liquid crystal layer 12 in a predetermined direction, an alignment layer 30 can be disposed on the lens structure 11 of the substrate 10, as shown in
Users can select a suitable method for forming the alignment layer and the materials of the alignment layer according to their needs, but not limited thereto. The method for forming the alignment layer includes rubbing alignment, photo-alignment, ion beam alignment and plasma beam alignment, but not limited thereto.
A polyethylene terephthalate substrate having a thickness of 100 μm and a size of 10 cm×10 cm (PET 4100, purchased from Toyobo Co, Ltd., Japan) is prepared, and an acrylic resin layer is coated thereon. An engraving copper wheel is used to imprint the acrylic resin layer to form lens structures (bowl structures are recessed inside the surface of the acrylic resin layer, and each of the bowl structures has a width of 250 μm and a depth of 40 μm).
A light alignment layer (ROP103, purchased from Rolic) having a thickness of 100 μm is spin-coated on the side having the lens structure of the substrate. Next, a light alignment apparatus (PUV DEEP, purchased from USHIO) is used to align the alignment layer in a predetermined direction (an angle of 45° to the traveling direction of the light alignment layer). Finally, liquid crystal (UV curable liquid crystal, LC242, purchased from BASF, Germany, in which a photo initiator (TPO, purchased from BASF, Germany) is mixed therein, and the adding amount thereof is 1 wt % based on the total weight) is coated on the light alignment layer to fully fill the lens structure and to form a flat opposite surface of the liquid crystal layer. Therefore, a liquid crystal layer having various thicknesses is prepared. The thickness of the thinnest portion of the liquid crystal layer is 1 μm, and that of the thickest portion is 41 μm. The thickness difference is 40 μm.
A polyethylene terephthalate substrate having a thickness of 100 μm (PET 4100, purchased from Toyobo Co, Ltd., Japan) is prepared, and a heat curable black oil ink layer (solid content 35%, and the main component is carbon black, A92, purchased from Taipolo Technology Co. Ltd., R.O.C) is uniformly coated on one side of the substrate by a R.D.S. Webster No. 8 bar. After uniformly coating, the solvent of the oil ink is removed (heated by a hot plate, 70° C. for 1 minute) to form an oil ink layer having a thickness of 0.3 μm. The transmittance of infrared light in a wavelength range of 750 to 1500 nm of the whole infrared absorbing layer is 57.4% measured by a spectrometer (U4100, purchased from Hitachi Co. Ltd., Japan).
The infrared absorbing layer is adhered on the aforementioned laminate to let the side free of the oil ink layer contact to the liquid crystal layer, and then fed to a roll-to-roll infrared heater (self-assembly, infrared lamp can irradiate infrared light in a wavelength range of 750 to 1500 nm, 110V/300 W). The heating temperature is set at 80° C., and the running speed is 0.2 m/min. The total heating time is 5 minutes. Finally, after heating, it is stood to cool to ambient temperature in an environment having ambient temperature to thereby complete the process of annealing the liquid crystal.
After annealing the liquid crystal layer, the alignment situation of the liquid crystal is detected by a polarizing microscope (XP201, purchased from Kingyoup Enterprise Co., Ltd.). The obtained results are represented in the manner hereinafter and summarized in Table 1:
In the test results, “o” or “Δ” indicates that the quality is in an acceptable range, and “o” indicates that the quality is the best.
Deformation of the whole surface may occur because the materials are non-uniformly heated with various heating rates, since the composite layers fed to the infrared heater are composed of various materials and those materials respectively have different thermal expansion coefficients. The deformation would cause abnormal alignment during aligning the liquid crystal. Also, disclination lines may be produced during abnormal alignment of the liquid crystal; that is, the liquid crystal molecules are arranged in irregular directions in the peripheral area of the disclination lines. Hence, light leakage may occur when light passes through the area, and thus impacts on the image display quality of a liquid crystal display device.
The preparations of the testing materials and the related experimental operations are the same as those of Example 1, but the coating thickness of the oil ink is changed to 0.9 μm. The transmittance of infrared light in a wavelength range of 750 to 1500 nm of the whole infrared absorbing layer is 20.3% measured by the spectrometer, and the obtained result is listed in Table 1.
The preparations of the testing materials and the related experimental operations are the same as those of Example 1, but the coating thickness of the oil ink is changed to 1.6 μm. The transmittance of infrared light in a wavelength range of 750 to 1500 nm of the whole infrared absorbing layer is 10.6% measured by the spectrometer, and the obtained result is listed in Table 1.
The preparations of the testing materials and the related experimental operations are the same as those of Example 1, but the coating thickness of the oil ink is changed to 2.3 μm. The transmittance of infrared light in a wavelength range of 750 to 1500 nm of the whole infrared absorbing layer is 0.4% measured by the spectrometer, and the obtained result is listed in Table 1.
The preparations of the testing materials and the related experimental operations are the same as those of Example 1, but there is no oil ink layer formed on the polyethylene terephthalate substrate (the thickness of the oil ink layer is 0 μm). The transmittance of infrared light in a wavelength range of 750 to 1500 nm of the whole infrared absorbing layer is 89% measured by the spectrometer, and the obtained result is listed in Table 1.
The preparations of the testing materials and the related experimental operations are the same as those of Example 1, but the heating time is changed to 10 minutes. The obtained result is listed in Table 2.
The preparations of the testing materials and the related experimental operations are the same as those of Example 2, but the heating time is changed to 10 minutes. The obtained result is listed in Table 2.
The preparations of the testing materials and the related experimental operations are the same as those of Example 3, but the heating time is changed to 10 minutes. The obtained result is listed in Table 2.
The preparations of the testing materials and the related experimental operations are the same as those of Example 4, but the heating time is changed to 10 minutes. The obtained result is listed in Table 2.
The preparations of the testing materials and the related experimental operations are the same as those of Comparative Example 1, but the heating time is changed to 10 minutes. The obtained result is listed in Table 2.
The preparations of the testing materials and the related experimental operations are the same as those of Example 1, but the heating time is changed to 15 minutes. The obtained result is listed in Table 3.
The preparations of the testing materials and the related experimental operations are the same as those of Example 2, but the heating time is changed to 15 minutes. The obtained result is listed in Table 3.
The preparations of the testing materials and the related experimental operations are the same as those of Example 3, but the heating time is changed to 15 minutes. The obtained result is listed in Table 3.
The preparations of the testing materials and the related experimental operations are the same as those of Example 4, but the heating time is changed to 15 minutes. The obtained result is listed in Table 3.
The preparations of the testing materials and the related experimental operations are the same as those of Comparative Example 1, but the heating time is changed to 15 minutes. The obtained result is listed in Table 3.
The preparations of the testing materials and the related experimental operations are the same as those of Example 1, but the thickness difference is changed to 85 μm. The obtained result is listed in Table 4.
The preparations of the testing materials and the related experimental operations are the same as those of Example 2, but the thickness difference is changed to 85 μm. The obtained result is listed in Table 4.
The preparations of the testing materials and the related experimental operations are the same as those of Example 3, but the thickness difference is changed to 85 μm. The obtained result is listed in Table 4.
The preparations of the testing materials and the related experimental operations are the same as those of Example 4, but the thickness difference is changed to 85 μm. The obtained result is listed in Table 4.
The preparations of the testing materials and the related experimental operations are the same as those of Comparative Example 1, but the thickness difference is changed to 85 μm. The obtained result is listed in Table 4.
The preparations of the testing materials and the related experimental operations are the same as those of Example 13, but the heating time is changed to 10 minutes. The obtained result is listed in Table 5.
The preparations of the testing materials and the related experimental operations are the same as those of Example 14, but the heating time is changed to 10 minutes. The obtained result is listed in Table 5.
The preparations of the testing materials and the related experimental operations are the same as those of Example 15, but the heating time is changed to 10 minutes. The obtained result is listed in Table 5.
The preparations of the testing materials and the related experimental operations are the same as those of Example 16, but the heating time is changed to 10 minutes. The obtained result is listed in Table 5.
The preparations of the testing materials and the related experimental operations are the same as those of Comparative Example 4, but the heating time is changed to 10 minutes. The obtained result is listed in Table 5.
The preparations of the testing materials and the related experimental operations are the same as those of Example 13, but the heating time is changed to 15 minutes. The obtained result is listed in Table 6.
The preparations of the testing materials and the related experimental operations are the same as those of Example 14, but the heating time is changed to 15 minutes. The obtained result is listed in Table 6.
The preparations of the testing materials and the related experimental operations are the same as those of Example 15, but the heating time is changed to 15 minutes. The obtained result is listed in Table 6.
The preparations of the testing materials and the related experimental operations are the same as those of Example 16, but the heating time is changed to 15 minutes. The obtained result is listed in Table 6.
The preparations of the testing materials and the related experimental operations are the same as those of Comparative Example 4, but the heating time is changed to 15 minutes. The obtained result is listed in Table 6.
The preparations of the testing materials and the related experimental operations are the same as those of Example 1, but the thickness difference is changed to 113 μm. The obtained result is listed in Table 7.
The preparations of the testing materials and the related experimental operations are the same as those of Example 2, but the thickness difference is changed to 113 μm. The obtained result is listed in Table 7.
The preparations of the testing materials and the related experimental operations are the same as those of Example 3, but the thickness difference is changed to 113 μm. The obtained result is listed in Table 7.
The preparations of the testing materials and the related experimental operations are the same as those of Example 4, but the thickness difference is changed to 113 μm. The obtained result is listed in Table 7.
The preparations of the testing materials and the related experimental operations are the same as those of Comparative Example 1, but the thickness difference is changed to 113 μm. The obtained result is listed in Table 7.
The preparations of the testing materials and the related experimental operations are the same as those of Example 25, but the heating time is changed to 10 minutes. The obtained result is listed in Table 8.
The preparations of the testing materials and the related experimental operations are the same as those of Example 26, but the heating time is changed to 10 minutes. The obtained result is listed in Table 8.
The preparations of the testing materials and the related experimental operations are the same as those of Example 27, but the heating time is changed to 10 minutes. The obtained result is listed in Table 8.
The preparations of the testing materials and the related experimental operations are the same as those of Example 28, but the heating time is changed to 10 minutes. The obtained result is listed in Table 8.
The preparations of the testing materials and the related experimental operations are the same as those of Comparative Example 7, but the heating time is changed to 10 minutes. The obtained result is listed in Table 8.
The preparations of the testing materials and the related experimental operations are the same as those of Example 25, but the heating time is changed to 15 minutes. The obtained result is listed in Table 9.
The preparations of the testing materials and the related experimental operations are the same as those of Example 26, but the heating time is changed to 15 minutes. The obtained result is listed in Table 9.
The preparations of the testing materials and the related experimental operations are the same as those of Example 27, but the heating time is changed to 15 minutes. The obtained result is listed in Table 9.
The preparations of the testing materials and the related experimental operations are the same as those of Example 28, but the heating time is changed to 15 minutes. The obtained result is listed in Table 9.
The preparations of the testing materials and the related experimental operations are the same as those of Comparative Example 7, but the heating time is changed to 15 minutes. The obtained result is listed in Table 9.
The preparations of the testing materials and the related experimental operations are the same as those of Comparative Example 1, but a hot air oven is utilized to heat, and the heating time and the thickness difference of the liquid crystal layer are changed. The obtained results are listed in Table 10.
The results indicates that the method for annealing the liquid crystal of the present disclosure can shorten the heating time compared to a hot-air method; further, the liquid crystal layer is uniformly heated compared to a heating method by using only an infrared heater (i.e., there is no infrared absorbing layer of the present disclosure covering the liquid crystal layer). Directly heating the liquid crystal by using the infrared heater is fast, but deformation of the liquid crystal layer occurs due to non-uniform heating. Although the method of the present disclosure requires more heating time (but still less than the heating time of the hot-air method) than the heating method using the infrared heater, the liquid crystal layer is uniformly heated to effectively and rapidly anneal the liquid crystal.
Although the present disclosure has been described in considerable detail with reference to certain embodiments thereof, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.
It will be apparent to those ordinarily skilled in the art that various modifications and variations may be made to the structure of the present disclosure without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the present disclosure cover modifications and variations thereof provided they fall within the scope of the following claims.
| Number | Date | Country | Kind |
|---|---|---|---|
| 101126241 | Jul 2012 | TW | national |
