Claims
- 1. A method of cleaning a conditioning disk for a chemical mechanical polishing (CMP) pad comprising the sequential steps of:a) immersing the conditioning disk which has been used in a CMP process in a chemical in order to remove by-products existing between abrasive grains on a body surface of the conditioning disk; b) cleaning the conditioning disk using deionized water; and c) drying the conditioning disk.
- 2. The method of cleaning a conditioning disk for a CMP pad according to claim 1, wherein the by-products are mixed compounds of oxide film and slurry, or mixed compounds of metallic film and slurry.
- 3. The method of cleaning a conditioning disk for a CMP pad according to claim 1, wherein the chemical is one of HF (hydro fluoric) solution and BOE (buffered oxide etch) solution.
- 4. The method of cleaning a conditioning disk for a CMP pad according to claim 3, wherein the HF solution comprises deionized water and HF, with a mixed ratio of 90 to 100:1.
- 5. The method of cleaning a conditioning disk for a CMP pad according to claim 3, wherein the conditioning disk is immersed in the HF solution or the BOE solution for 20 to 60 min.
- 6. The method of cleaning a conditioning disk for a CMP pad according to claim 1, wherein the step of drying the conditioning disk is performed by first blowing nitrogen gas, and then using an oven to remove moisture.
- 7. The method of cleaning a conditioning disk for a CMP pad according to claim 6, wherein the conditioning disk is dried in the oven for 20 to 40 min.
Priority Claims (1)
Number |
Date |
Country |
Kind |
98-14858 |
Apr 1998 |
KR |
|
Parent Case Info
CROSS REFERENCE TO RELATED APPLICATIONS
This is a divisional application of application Ser. No. 09/293,946, filed Apr. 19, 1999, now U.S. Pat. No. 6,213,856 which is hereby incorporated by reference in its entirety for all purposes.
US Referenced Citations (14)
Non-Patent Literature Citations (1)
Entry |
W. Kern. Handbook of Semiconductor Wafer Cleaning Technology. Noyes Publications, 1993, p. 24, p.280. |