Claims
- 1. A process which comprises:
- A. applying to the surface of a substrate a layer of a composition consisting essentially of:
- 1 A polyene of the formula: ##STR23## wherein A and B are polyvalent organic radical members free of reactive carbon to carbon unsaturation and are independtly selected from the group consisting of aryl, substituted aryl, aralkyl, substituted aralkyl, cycloalkyl, substituted cycloaklyl, alkyl and substituted alkyl containing 1 to 36 carbon atoms and mixtures thereof, said group members can be connected by a chemically compatible linkage selected from the group consisting of --0--, --S--, carboxylate, carbonate, carbonyl, urethane and substituted urethane, urea and substituted urea, amide and substituted amide, amine and substituted amine and hydrocarbon; Z is a divalent chemically compatible linkage selected from the group consisting of ##STR24## --O-- and --S--; X is a member selected from the group consisting of (a) --(CH.sub.2).sub.d --CR'=CHR, (b) --O--(CH.sub.2).sub.d --CR'=CHR, (c) --S--(CH.sub.2).sub.--CR'CR'=CHR, (d) --(CH.sub.2).sub.d --C.tbd.CR, (e) --0--(CH.sub.2).sub.d --C.tbd.CR, (f) --S--(CH.sub.2).sub.d --C.tbd.CR; and mixtures thereof; where R and R' each are independently selected radical; the group consisting of hydrogen and methyl radicals d, p and q are each integers from 0 0 to 1; m and n are each integers of at least 1; with m + n from 2 to 22 and r at least 1, and y from 1 to 10; and
- 2.
- 2. A polythiol of the formula: ##STR25## wherein m and n are each at least 1 and m + n is 2 to 22 and R.sub.3 is a polyvalent organic radical member free of reactive carbon-to-carbon unsaturation and is selected from the group consisting of aryl; substituted aryl, aralkyl, substituted aralkyl, cylcoalkyl, substituted cycloalkyl, alkyl and substituted alkyl groups containing 1 to 16 carbon atoms and mixtures thereof, the total combined functionality of (a) the reactive carbon to carbon bonds per molecule in the polyene and (b) the thiol groups per molecule in the polythiol being greater than 4 and
- 3.
- 3. a photocuring rate accelerator and, thereafter, exposing the layer to
- actinic radiation thereby curing said composition. 2. The process according to claim 1 wherein the actinic radiation is actinic laser
- radiation. 3. The process according to claim 1 wherein the actinic radiation is ultraviolet light having a wavelenght wavelength about 2000A and about 4000A.
Parent Case Info
This is a division of application Ser. No. 614,580 filed Sept. 18, 1975, now U.S. Pat. No. 3,984,297, which was a division of application Ser. No. 461,207 filed Apr. 15, 1974, now U.S. Pat. No. 3,945,982.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
3697395 |
Kehr et al. |
Oct 1972 |
|
3839354 |
Habermeier et al. |
Oct 1974 |
|
Divisions (2)
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Number |
Date |
Country |
Parent |
614580 |
Sep 1975 |
|
Parent |
461207 |
Apr 1974 |
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