Claims
- 1. A method of controlling the domain of a nonlinear ferroelectric optics substrate, comprising:
- forming a first electrode and a second electrode opposite to each other respectively on the opposite major surfaces of a single-domain nonlinear ferroelectric optics substrate, at least either the first electrode or the second electrode being formed in a given electrode pattern; and
- applying a given dc voltage across the first and second electrodes to form local continuously alternating inverted domains in a pattern corresponding to the electrode pattern where the local inverted domains alternately have a constant, opposite, polarization direction.
- 2. A method of controlling the domain of a nonlinear ferroelectric optics substrate, comprising:
- forming a first electrode and a second electrode opposite to each other respectively on the opposite major surfaces of a single-domain nonlinear ferroelectric optics substrate, at least either the first electrode or the second electrode being formed in a given electrode pattern; and
- applying a given pulse voltage across the first and second electrodes to form local continuously alternating inverted domains in a pattern corresponding to the electrode pattern where the local inverted domains alternately have a constant, opposite, polarization direction.
- 3. A method of controlling the domain of a nonlinear ferroelectric optics substrate, comprising:
- forming a first electrode and a second electrode opposite to each other respectively on the opposite major surfaces of a single-domain nonlinear ferroelectric optics substrate, at least either the first electrode or the second electrode being formed in a given electrode pattern on an insulating layer formed on the corresponding major surface of the nonlinear ferroelectric optics substrate; and
- applying a given dc voltage across the first and and second electrodes to form local, inverted domains in a pattern corresponding to the electrode pattern.
- 4. A method of controlling the domain of a nonlinear ferroelectric optics substrate, comprising:
- forming a first electrode and a second electrode opposite to each other respectively on the opposite major surfaces of a single-domain nonlinear ferroelectric optics substrate, at least either the first electrode or the second electrode being formed in a give electrode pattern on an insulating layer formed on the corresponding major surface of the nonlinear ferroelectric optics substrate; and
- applying a given pulse voltage across the first and second electrodes to form local, inverted domains in a pattern corresponding to the electrode pattern.
- 5. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 1, wherein the dc voltage is applied across the first and second electrodes while the nonlinear ferroelectric optics substrate is heated at a temperature in the range of 150.degree. to 200.degree. C.
- 6. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 2, wherein the pulse voltage is applied across the first and second electrodes while the nonlinear ferroelectric optics substrate is heated at a temperature in the range of 150.degree. to/200.degree. C.
- 7. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 3, wherein the dc voltage is applied across the first and second electrodes while the nonlinear ferroelectric optics substrate is heated at a temperature in the range of 150.degree. to/200.degree. C.
- 8. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 4, wherein the pulse voltage is applied across the first and second electrodes while the nonlinear ferroelectric optics substrate is heated at a temperature in the range of 150.degree. to 200.degree. C.
- 9. A method of controlling the domain of a nonlinear ferroelectric optics substrate, comprising: forming a first electrode and a second electrode opposite to each other respectively on the opposite major surfaces of a single-domain nonlinear ferroelectric optics substrate, at least either the first electrode or the second electrode being formed in a given electrode pattern: applying a given dc voltage across the first and second electrodes to form local inverted domains in a pattern corresponding to the electrode pattern, and, wherein the dc voltage is in the range of several tens volts per centimeter to several hundreds volts per centimeter.
- 10. A method of controlling the domain of a nonlinear ferroelectric substrate according to claim 3, wherein the dc voltage is in the range of several tens volts per centimeter to several hundreds volts per centimeter.
- 11. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 2, wherein the pulse voltage is in the range of several volts per centimeter to several kilovolts per centimeter.
- 12. A method of controlling the domain of a nonlinear ferroelectric optics body according to claim 4, wherein the pulse voltage is in the range of several hundreds volts per centimeter to several hundreds kilovolts per centimeter.
- 13. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 3, wherein said insulating layer is formed of such as Al.sub.2 O.sub.3, Si.sub.x N.sub.y or SiO.sub.2.
- 14. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 4, wherein said insulating layer is formed of such as of Al.sub.2 0.sub.3, Si.sub.x N.sub.y or SiO.sub.2.
- 15. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 2, wherein the pulse width of said pulse voltage is in the range of several microseconds to several minutes.
- 16. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 4, wherein the pulse width of said pulse voltage is in the range of several microseconds to several minutes.
- 17. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 2, wherein said pulse voltage is applied one to several thousands times.
- 18. A method of controlling the domain of a nonlinear ferroelectric optics body according to claim 4, wherein said pulse voltage is applied once to several thousands times.
- 19. A method of controlling the domain of a nonlinear ferroelectric optics substrate, comprising: forming a first electrode and a second electrode opposite to each other respectively on the opposite major surfaces of a single-domain nonlinear ferroelectric optics substrate, at least either the first electrode or the second electrode being formed in a given electrode pattern; applying a given dc voltage across the first and second electrode to form local inverted domains in a pattern corresponding to the electrode pattern, and, wherein said given electrode pattern comprises a plurality of parallel strips and the pitch of the strips forming the electrode pattern is in the range of 0.1 to 500 .mu.m.
- 20. A method of controlling the domain of a nonlinear ferroelectric optics substrate, comprising: forming a first electrode and a second electrode opposite to each other respectively on the opposite major surfaces of a single-domain nonlinear ferroelectric optics substrate, at least either the first electrode of the second electrode being formed in a given electrode pattern; applying a given pulse voltage across the first and second electrodes to form local inverted domains in a pattern corresponding to the electrode pattern, and, wherein said given electrode pattern comprises a plurality of parallel strips and the pitch of the strips forming the electrode pattern is in the range of 0.1 to 500 .mu.m.
- 21. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 3, wherein said given electrode pattern comprises a plurality of parallel strips and the pitch of the strips forming the electrode pattern is in the range of 0.1 to 500 .mu.m.
- 22. A method of controlling the domain of a nonlinear ferroelectric optics substrate according to claim 4, wherein said given electrode pattern comprises a plurality of parallel strips and the pitch of the strips forming the electrode pattern is in the range of 0.1 to 500 .mu.m.
Priority Claims (4)
Number |
Date |
Country |
Kind |
1-184362 |
Jul 1989 |
JPX |
|
1-184364 |
Jul 1989 |
JPX |
|
1-344270 |
Dec 1989 |
JPX |
|
2-124786 |
May 1990 |
JPX |
|
Parent Case Info
This is a continuation-in-part of application Ser. No. 553,395, filed Jul. 17, 1990 now abandoned.
US Referenced Citations (8)
Foreign Referenced Citations (4)
Number |
Date |
Country |
1234319 |
Feb 1967 |
DEX |
2812955 |
Oct 1978 |
DEX |
7708628 |
Oct 1978 |
FRX |
0246545 |
Jun 1990 |
JPX |
Non-Patent Literature Citations (2)
Entry |
"Thermal Capacitive-Ferroelectric Storage Device"; IBM Tech. Disclosure Bulletin, vol. 15, No. 4 (Sep. 1972) p. 1294. |
PCT WO/09094 Application Aug. 20, 1990 "Controlling regions of ferroelectric domains". |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
553395 |
Jul 1990 |
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