Claims
- 1. A method of making a flocked material comprising the following steps.
- (1) providing a substrate having an adhesive of the type which may be cured by an electron beam on the substrate forming an electron beam curable adhesive layer;
- (2) depositing elongated particles of flock material to form a layer of flock sufficiently thick so that the elongated particles of flock block the direct path of electrons travelling toward the adhesive layer; and,
- (3) curing the adhesive by directing a beam of electrons through the layer of flock toward the adhesive layer with an electron energy less than would be required for a nonparticulate layer of the same flock material and of a thickness equal to the actual thickness of flock material in the electrons path, but at least equal to the energy level necessary to cure the adhesive in the adhesive layer without said particles of flock material.
- 2. The method as set forth in claim 1 in which the adhesive is cured in step (3) by directing a beam of electrons having energy in the order of 150 Kev.+-.30%.
- 3. The method as set forth in claim 1 in which the length of the elongated particles of flock deposited in step (2) are in the order of 2-50 times that of the adhesive layer thickness.
- 4. The method as set forth in claim 1 in which the length of the elongated particles of flock deposited in step (2) range from 0.002 inches to 0.25 inches and the denier thereof ranges from 0.1 to 100.
- 5. A method of making a flocked material comprising the following steps:
- (1) providing a substrate;
- (2) applying an adhesive of the type which may be cured by an electron beam on the substrate forming an electron beam curable adhesive layer;
- (3) depositing elongaged particles of flock material to form a layer of flock sufficiently thick so that the elongated particles of flock block the direct paths of electrons travelling toward the adhesive layer; and
- (4) curing the adhesive by directing a beam of electrons through the layer of flock toward the adhesive layer with an electron energy less than would be required for a nonparticulate layer of the same flock material and of a thickness equal to the actual thickness of flock material in the electrons path, but at least equal to the energy level necessary to cure the adhesive in the adhesive layer without said particles of flock material.
- 6. The method as set forth in claim 5 in which the adhesive is cured in step (4) by directing a beam of electrons having energy in the order of 150 Kev.+-.30%.
- 7. The method as set forth in claim 5 in which the length of the elongated particles of flock deposited in step (3) are in the order of 2-50 times that of the adhesive layer thickness.
- 8. The method as set forth in claim 5 in which the length of the elongated particles of flock deposited in step (3) range from 0.002 inches to 0.25 inches and the denier thereof ranges from 0.1 to 100.
Parent Case Info
This is a continuation of application Ser. No. 744,941, filed Nov. 24, 1976 which is a continuation of Ser. No. 479,754, filed June 17, 1974 and both now abandoned.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
3903331 |
Klein |
Sep 1975 |
|
4100311 |
Nablo et al. |
Jul 1978 |
|
Continuations (2)
|
Number |
Date |
Country |
Parent |
744941 |
Nov 1976 |
|
Parent |
479754 |
Jun 1974 |
|