Claims
- 1. A method for forming a diffusion coating by depositing chromium and silicon on an iron-based substrate comprising the steps of:
- (a) placing a cementation pack in surrounding relationship to a surface of the substrate, the cementation pack including a mixture of essentially pure chromium powder and essentially pure silicon powder, at least one halide salt activator, and an alumina filler;
- (b) heating the substrate and cementation pack in an inert or reducing atmosphere to a first temperature sufficient to cause vaporization of the halide salt and for a time sufficient to cause the preferential deposition of essentially silicon on the surface of the substrate; and then
- (c) heating the substrate and cementation pack to a second, higher temperature for a time sufficient to cause the deposition of predominantly chromium on the surface of the substrate.
- 2. A method in accordance with claim 1, wherein the first temperature is held substantially constant for about 8 hours and the second temperature is held substantially constant for about 4 hours.
- 3. A method in accordance with claim 1, wherein the halide salt activator includes sodium fluoride and magnesium chloride.
- 4. A method in accordance with claim 1, wherein the cementation pack includes up to about 2 weight percent of a compound selected from the group consisting of cerium oxide and vanadium pentoxide.
- 5. A method for forming a diffusion coating by depositing chromium and silicon on an iron-based substrate comprising the steps of:
- (a) placing a cementation pack in surrounding relationship to a surface of the substrate, the cementation pack including a mixture of essentially pure chromium powder and essentially pure silicon powder, at least one halide salt activator and an alumina filler; and
- (b) heating the substrate and cementation pack in an inert atmosphere through a temperature range between about 925.degree. C. and 1150.degree. C. at a rate sufficient to cause the deposition of an initial compound consisting essentially of silicon on the surface of the substrate in a lower region of the temperature range, and the subsequent deposition of a predominantly chromium compound on the surface of the substrate in a higher region of the temperature range.
- 6. A method in accordance with claim 5, wherein the rate of heating is sufficient to cause the deposition of silicon on the substrate to initiate the formation of a ferrite layer at the substrate surface prior to the subsequent deposition of a substantial amount of chromium on the substrate.
- 7. A method in accordance with claim 5, wherein the total heating time is about 12 hours.
- 8. A method in accordance with claim 5, wherein the halide salt activator includes sodium fluoride and magnesium chloride.
- 9. A method in accordance with claim 5, wherein the cementation pack includes up to about 2 weight percent of a compound selected from the group consisting of cerium oxide and vanadium pentoxide.
Parent Case Info
This application is a continuation of application Ser. No. 08/240,350 filed May 10, 1994, now U.S. Pat. No. 5,492,727, issued Feb. 20, 1996, presently commonly assigned to the assignee of the present application.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
5364659 |
Rapp et al. |
Nov 1994 |
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5492727 |
Rapp et al. |
Feb 1996 |
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Non-Patent Literature Citations (1)
Entry |
Wan, X., Wang, G., and Rapp, R., "Resistance To Aqueous Corrosion Of Steels Protected By A Cr-Si Diffusion Coating," Proceedings of the Seventh Annual Conference on Fossil Energy Materials, May 11-13, 1993 Oak Ridge, Tennessee, pp. 259-268. |
Continuations (1)
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Number |
Date |
Country |
Parent |
240350 |
May 1994 |
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