Claims
- 1. A method of fabricating a fluid drop ejector on a substrate surface, comprising the steps of:
- (a) depositing a SiNi.sub.x layer;
- (b) depositing a polysilicon "0" layer;
- (c) depositing a first sacrificial oxide layer;
- (d) depositing a polysilicon "1" layer;
- (e) depositing a second sacrificial oxide layer;
- (f) depositing a polysilicon "2" layer;
- (g) depositing a third sacrificial oxide layer; and
- (h) depositing a polysilicon "3" layer,
- the SiNi.sub.x, polysilicon "0", first sacrificial oxide, polysilicon "1", second sacrificial oxide, polysilicon "2", and third sacrificial oxide layers comprising a containment wall;
- the polysilicon "3" layer comprising a nozzle plate layer disposed on the containment wall, the nozzle plate layer including a nozzle opening;
- the first sacrificial oxide and polysilicon "1" layers comprising a piston layer including a piston surface facing and substantially aligned with the nozzle opening,
- the containment wall, nozzle plate layer and piston surface defining a cavity that is arranged for containing fluid,
- the piston layer arranged for moving towards the nozzle opening when a fluid ejecting electric field is applied between the piston layer and the nozzle plate layer, thus causing fluid to be ejected through the nozzle opening.
- 2. The method of claim 1, the first sacrificial oxide layer comprising a plurality of piston springs radiating away from the piston surface and coupled to the substrate surface.
- 3. The method of claim 2, the plurality of piston springs comprising means for applying an ejecting signal to the piston layer.
- 4. The method of claim 1, the fluid comprising ink.
- 5. A method of fabricating a fluid drop ejector on a substrate surface, comprising the steps of:
- (a) depositing a SiO.sub.2 mask layer;
- (b) depositing a SiNi.sub.x layer;
- (c) depositing a polysilicon "0" layer;
- (d) depositing a first sacrificial oxide layer;
- (e) depositing a polysilicon "1" layer;
- (f) depositing a second sacrificial oxide layer;
- (g) depositing a polysilicon "2" layer;
- (h) depositing a third sacrificial oxide layer; and
- (i) depositing a polysilicon "3" layer,
- the SiO.sub.2 mask, SiNi.sub.x, polysilicon "0", first sacrificial oxide, polysilicon "1", second sacrificial oxide, polysilicon "2", and third sacrificial oxide layers comprising a containment wall;
- the polysilicon "3" layer comprising a nozzle plate layer disposed on the containment wall, the nozzle plate layer including a nozzle opening;
- the first sacrificial oxide and polysilicon "1" layers comprising a piston layer including a piston surface facing and substantially aligned with the nozzle opening,
- the containment wall, nozzle plate layer and piston surface defining a cavity that is arranged for containing fluid,
- the piston layer arranged for moving towards the nozzle opening when a fluid ejecting electric field is applied between the piston layer and the nozzle plate layer, thus causing fluid to be ejected through the nozzle opening.
- 6. The method of claim 5, the first sacrificial oxide layer comprising a plurality of piston springs radiating away from the piston surface and coupled to the substrate surface.
- 7. The method of claim 6, the plurality of piston springs comprising means for applying an ejecting signal to the piston layer.
- 8. The method of claim 5, the fluid comprising ink.
REFERENCE TO PRIOR PROVISIONAL APPLICATION
This patent application claims priority to U.S. Provisional Patent Application No. 60/104,363, entitled "Ejector Mechanism" filed Oct. 15, 1998.
US Referenced Citations (7)