Claims
- 1. A process for fabricating a magnetic head, comprising the steps of:
- setting a slider of a polycrystalline ceramic material in a sputtering apparatus;
- sputter-etching at least one portion of said slider surface to be opposed to a magnetic recording disk, by generating ionized gases in at least one portion of said opposed slider surface, so that lands and grooves may be formed to have a difference of 50 to 200 .ANG. on an average and a repetition pitch of 5 to 20 microns on an average; and bonding a magnetic core to said slider.
- 2. A magnetic head fabricating process according to claim 1, wherein said sputter-etching step removes a property-changed layer from the surface of said slider and cleans said slider surface.
- 3. A magnetic head fabricating process according to claim 1, further comprising the step of masking that portion of the slider surface opposed to said magnetic disk other than a portion thereof to be treated, so that only the portion exposed from the mask may be sputter-etched.
- 4. A magnetic head fabricating process according to claim 3, further comprising the step of removing said mask during said sputter-etching step to form steps between the masked and exposed portions.
- 5. A magnetic head fabricating process according to claim 1, wherein said sputter-etching step forms undulations of said lands and said grooves having an amplitude of 50 to 300 .ANG..
- 6. A magnetic head fabricating process according to claim 1, wherein the ceramic material composing said slider is spinel type ferrite.
- 7. A magnetic head fabricating process according to claim 1, wherein the ceramic material composing said slider is Ni-Zn ferrite or Mn-Zn ferrite.
- 8. A magnetic head fabricating process according to claim 1, wherein the ceramic material composing said slider is an Mn-Ni oxide.
- 9. A magnetic head fabricating process according to claim 1, wherein the ceramic material composing said slider is calcium titanate, barium titanate, alumina, or zinc ferrite.
- 10. A magnetic head fabricating process according to claim 1, wherein the lands and grooves are formed to have a difference ob 70 to 170 .ANG. on an average and a repetition pitch of 7 to 17 microns on an average.
- 11. A magnetic head fabricating process according to claim 1, wherein steep portions are formed between the lands and grooves extending along the boundaries of the ceramic material crystals.
- 12. A magnetic head fabricating process according to claim 1, further comprising, prior to said sputter-etching step, the step of polishing the slider surface to be opposed to the disk.
- 13. A magnetic head fabricating process according to claim 12, wherein in the polishing step the slider surface is polished to have a surface roughness of approximately 10 to 40 .ANG..
- 14. A magnetic head fabricating process according to claim 13, wherein the undulations extend along the boundaries of the ceramic material crystals.
Priority Claims (3)
Number |
Date |
Country |
Kind |
63-306651 |
Dec 1987 |
JPX |
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63-306654 |
Dec 1987 |
JPX |
|
63-295652 |
Nov 1988 |
JPX |
|
Parent Case Info
This is a divisional of copending application Ser. No. 07/360,124, filed on June 1, 1989, now U.S. Pat. No. 5,010429.
US Referenced Citations (7)
Foreign Referenced Citations (1)
Number |
Date |
Country |
1133274 |
May 1989 |
JPX |
Non-Patent Literature Citations (1)
Entry |
IBM Technical Disclosure Bulletin, vol. 20, No. 8, Jan., 1978, 2 pp. |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
360124 |
Jun 1989 |
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