Method of fabricating an acoustic resonator comprising a filled recessed region

Information

  • Patent Grant
  • 8230562
  • Patent Number
    8,230,562
  • Date Filed
    Friday, November 9, 2007
    17 years ago
  • Date Issued
    Tuesday, July 31, 2012
    12 years ago
Abstract
A method for fabricating an acoustic resonator comprises providing a substrate; fabricating a first electrode adjacent the substrate; fabricating a piezoelectric layer adjacent the first electrode; depositing electrode material to form a second electrode up to a first thickness adjacent the piezoelectric layer; depositing a first photo mask over the second electrode; depositing additional electrode material to form the second electrode up to a second thickness; removing the photo mask thereby forming a recessed region in the second electrode; and filling the recessed region with a fill material.
Description
BACKGROUND

The need to reduce the cost and size of electronic equipment has created a need for smaller single filtering elements. Thin-Film Bulk Acoustic Resonators (FBARs) and Stacked Thin-Film Bulk Wave Acoustic Resonators (SBARs) represent one class of filter elements with potential for meeting these needs. These filters can collectively be referred to as FBARs. An FBAR is an acoustic resonator that uses bulk longitudinal acoustic waves in thin-film piezoelectric (PZ) material. Typically, an FBAR includes a layer of PZ material sandwiched between two metal electrodes. The combination PZ material and electrodes are suspended in air by supporting the combination around its perimeter or are placed over an acoustic mirror.


When an electrical field is created between the two electrodes, the PZ material converts some of the electrical energy into mechanical energy in the form of acoustic waves. The acoustic waves propagate generally in the same direction as the electric field and reflect off the electrode-air or electrode-acoustic mirror interface at some frequency, including at a resonance frequency. At the resonance frequency, the device can be used as an electronic resonator. Multiple EBARs can be combined such that each is an element in RF filters.


Ideally, the resonant energy in the filter elements is entirely “trapped” in the resonator. In practice, however, dispersive modes exist. These modes can result in a decreased quality factor (Q) for the filter.


For these and other reasons, a need exists for the present invention.


SUMMARY

One aspect of the present invention provides an acoustic resonator that includes a substrate, a first electrode, a layer of piezoelectric material, a second electrode, and a fill region. The first electrode is adjacent the substrate, and the first electrode has an outer perimeter. The piezoelectric layer is adjacent the first electrode. The second electrode is adjacent the piezoelectric layer and the second electrode has an outer perimeter. The fill region is in one of the first and second electrodes.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 illustrates a top plan view of an FBAR.



FIG. 2 illustrates a cross-sectional view of an FBAR.



FIG. 3 illustrates a cross-sectional view of an FBAR according to one embodiment of the present invention.



FIG. 4 illustrates a top plan view of one embodiment of the FBAR illustrated in FIG. 3.



FIG. 5 illustrates a top plan view of an alternative embodiment of the FBAR illustrated in FIG. 3.



FIG. 6 illustrates Q circles for two exemplary FBARs plotted on a Smith chart.



FIG. 7 illustrates a cross-sectional view of an FBAR according to one embodiment of the present invention.



FIG. 8 illustrates a cross-sectional view of an FBAR according to another embodiment of the present invention.



FIG. 9 illustrates a cross-sectional view of an FBAR according to another embodiment of the present invention.



FIGS. 10A-10F are cross-sectional views illustrating various stages of fabrication of an FBAR according to another embodiment of the present invention.





DETAILED DESCRIPTION

In the following Detailed Description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology, such as “top,” “bottom,” “front,” “back,” “leading,” “trailing,” etc., is used with reference to the orientation of the Figure(s) being described. Because components of embodiments of the present invention can be positioned in a number of different orientations, the directional terminology is used for purposes of illustration and is in no way limiting. It is to be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. The following detailed description, therefore, is not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.



FIGS. 1 and 2 illustrate top and cross-sectional views, respectively, of FBAR 10. FBAR 10 includes substrate 12, depression 14, first electrode 16, piezoelectric (PZ) layer 18, and second electrode 20. In FIG. 1, PZ layer 18 and depression 14 are hidden from view. Second electrode 20 has a perimeter that is illustrated in FIG. 1 as pentagon-shaped, having edges 20a, 20b, 20c, 20d and 20e. Two edges, 20b and 20e, are illustrated in the cross-sectional view of FIG. 2. Typically, contacts (not illustrated) are coupled to first electrode 16 and to second electrode 20 and a passivation layer (not illustrated) may cover top electrode 20. The contacts facilitate connecting the first and second electrodes 16 and 20 to a source of voltage.


First electrode 16, PZ layer 18, and second electrode 20 collectively form an FBAR membrane. The FBAR membrane is adjacent substrate 12 and suspended over depression 14 to provide an electrode-air interface. In one embodiment, depression 14 is created by etching away a portion of substrate 12. Depression 14 is deep enough so that sufficient electrode-air interface is created under the FBAR membrane.


In an alternative embodiment, the FBAR membrane may be placed adjacent an acoustic mirror (not illustrated in FIGS. 1 and 2) formed within substrate 12. In this way, an electrode-acoustic mirror interface is formed. The resonator thus formed is a Solid Mounted Resonator (SMR).


In one embodiment, substrate 12 is made of silicon (Si) and PZ layer 18 is made from aluminum nitride (AlN). Alternatively, other piezoelectric materials may be used for PZ layer 18. In one embodiment, first and second electrode 16 and 20 may be made of molybdenum (Mo). Alternatively, other materials may be used for the electrodes. In one embodiment, the contacts may be made of gold (Au). Alternatively, other materials may be used for the contacts.


FBAR 10 illustrated in FIGS. 1 and 2 is configured to use longitudinal or shear acoustic waves propagating in PZ layer 18. When an electric field is created between first and second electrodes 16 and 20 via an impressed voltage, the piezoelectric material of PZ layer 18 converts some of the electrical energy into mechanical energy in the form of acoustic waves. So configured, FBAR 10 exhibits dispersive modes resulting in a quality factor (Q) loss for FBAR 10.



FIG. 3 illustrates a cross-sectional view of FBAR 40 in accordance with one embodiment of the present invention. FBAR 40 includes substrate 42, depression 44, first electrode 46, piezoelectric (PZ) layer 48, second electrode 50 and filled region 60. Typically, contacts (not illustrated in FIG. 3) are coupled to first and second electrodes 46 and electrode 50, and a passivation layer covers the second electrode (also not illustrated in FIG. 3). The contacts facilitate connecting first and second electrodes 46 and 50 to a voltage source. First electrode 46, PZ layer 48, and second electrode 50 collectively form an FBAR membrane, which may be placed over a depression 44 or over an acoustic mirror as discussed above. The FBAR membrane is illustrated adjacent substrate 42 and suspended over depression 44 to provide an electrode-air interface. As with previous embodiments, an electrode-acoustic mirror interface is also obtainable using an SMR design in accordance with the present invention.


Second electrode 50 and the other layers of the FBAR membrane have a perimeter that can be of various configurations. For example, the perimeters of each can be pentagon-shaped, similar to FBAR 10 above. They could also be any of various polygonal shapes, circular, or various irregular shapes. The cross-sectional view illustrated in FIG. 3 illustrates two locations along the perimeter of second electrode 50, edges 50b and 50e. In one embodiment, an edge of PZ layer 48 is generally aligned with edge 50b of second electrode 50 in the vertical direction in FBAR 40 as illustrated in FIG. 3.


In FBAR 40 illustrated in FIG. 3, a filled region 60 has been added into second electrode 50 adjacent the edge 50b and near edge 50e of second electrode 50. In one embodiment, fill region 60 is located just outside the perimeter of depression 44. In this way, when the perimeter or outside diameter of depression 44 is extended in the vertical direction (as oriented in the illustration of FIG. 3), fill region 60 is just “outside” the perimeter of depression 44.


In other embodiments, fill region 60 overlaps the perimeter of depression 44 such that part of fill region 60 is “inside” and part is “outside” the perimeter of depression 44. In still other embodiments, fill region 60 lies entirely “inside” the perimeter of depression 44.


Fill region 60 improves the performance of FBAR 40, resulting in improved insertion loss and improved resonator quality factor Q of FBAR 40. The overall quality factor Q of FBAR 40 depends proportionally on a parameter of resistance called Rp. In FBAR 40, the Rp may be improved by fill region 60.


An electric field is created between first and second electrodes 46 and 50 via an impressed voltage. The piezoelectric material of PZ layer 48 converts some of the electrical energy into mechanical energy in the form of acoustic waves. Some of the acoustic waves in FBAR 40 are longitudinal acoustic waves of any mode type, while others are transverse acoustic waves of the compression, shear, or drum mode type. FBAR 40 is designed to use longitudinal acoustic waves propagating in the thickness extensional direction in the PZ layer 48 as the desired resonator mode. However, FBAR 40, which provides fill region 60, reduces or suppresses energy loss, thereby improving the Q of the filter. In one embodiment, fill region 60 helps trap energy from lateral modes in FBAR 40.


In one embodiment, fill region 60 is filled with a material that is different than that used for second electrode 50. In that case, the material in fill region 60 will have different dispersion characteristics than will the remaining material of second electrode 50, which in one case is Mo. Adding this material with differing dispersion characteristics can improve insertion loss and improve the resonator quality factor Q of FBAR 40. In one embodiment, the material in fill region 60 increases the FBAR membrane's stiffness at its edge. In one case, the material in fill region 60 is such that it increases the acoustic impedance of the fill region 60 relative to that at the center of the FBAR membrane. Such material may be denser than the electrode material. For example, the material in fill region 60 can be W, while second electrode 50 is made of Mo. In other embodiments first and second electrodes 46 and 50 may be metal such as Pt, W, Cu, Al, Au, or Ag. In alternative embodiments, material in fill region 60 could also be made of materials such as polyimide, BCB, SiO2, Si3N4, or other dielectrics, AlN, ZnO, LiNbO3, PZT, LiTaO3, Al2O3, or other piezoelectric materials, Pt, W, Cu, Al, Au, Ag, or other metals or alloys of metals.


In one embodiment, fill region 60 has a depth in second electrode 50 that is on the order of hundreds to thousands of angstroms, and a width on the order of fractions of a micron to microns or even larger, up to that portion of the width of second electrode 50 that extends beyond or outside the perimeter of depression 44. In one embodiment, second electrode 50 is selectively etched to form a recessed feature that is then filled in with material to form fill region 60. In one embodiment, second electrode 50 is constructed using a lift-off technique to form a recessed feature that is filled in with material to form fill region 60.



FIGS. 4 and 5 illustrate plan views of FBAR 40 of FIG. 3 in accordance with alternative embodiments of the present invention. As illustrated in FIGS. 4 and 5, FBAR 40 includes substrate 42, first electrode 46, and second electrode 50. In FIGS. 4 and 5, piezoelectric (PZ) layer 48 and depression 44 are hidden from view. Typically, contacts (not illustrated in the Figures) are coupled to first and second electrodes 46 and 50, and a passivation layer (also not illustrated in the Figures) covers second electrode 50.


In FIGS. 4 and 5, fill region 60 is illustrated extending adjacent the perimeter of second electrode 50. In the Figures, the perimeter of second electrode 50 is generally pentagon-shaped having five relatively straight edges (50a, 50b, 50c, 50d, and 50e), but may also be essentially any polygonal shape, circular in shape, or have any other smooth or irregular shape.


In FIG. 5, fill region 60 is illustrated extending adjacent the perimeter of second electrode 50 along all of the five edges of the pentagon-shaped electrode, that is, adjacent edges 50a, 50b, 50c, 50d, and 50e. FIG. 4 illustrates an alternative embodiment of FBAR 40 where fill region 60 extends adjacent the perimeter of second electrode 50 along four of the five edges of the pentagon-shaped electrode, that is, adjacent edges 50b, 50c, 50d, and 50e. In one embodiment, a contact is attached to the fifth edge 50a of second electrode 50, so fill region 60 does not extend along that edge in that embodiment.


As one skilled in the art will understand, any number of alternative fill regions 60 may be provided adjacent the edges of second electrode 50 consistent with the present invention. Fill region 60 may be continuously extending along some or all of the edges of second electrode 50 as illustrated, fill regions 60 may have smaller segments that are not continuous along the edge, and other shapes and configurations of fill regions 60 can be used, especially where second electrode 50 is a shape other than a pentagon.



FIG. 6 illustrates Q circles for two exemplary FBARs plotted on a Smith chart, and illustrates improvement in Rp and therefore Q in one of the FBARs. As is known in the art, a Smith Chart is a polar plot of a complex impedance (used in FIG. 6 to illustrate measures of s11 and s22 scattering parameters). These s11 and s22 scattering parameters represent a ratio of complex amplitudes of backward and forward waves. The Smith Chart aids in translating the reflection coefficients into impedance and it maps part of the impedance placed into a unit circle. The improved performance of FBAR 40 is demonstrated by the Q circles illustrated in FIG. 6. FIG. 6 illustrates the S-parameter measurements of an exemplary filled device, such as FBAR 40 with fill region 60. As illustrated, the filled device of FBAR 40 with fill region 60 (solid line labeled S11) has a much improved Rp versus that of a control device, such as that illustrated in FIG. 2 (dashed line labeled S22) in the upper half of the chart.


Generally, the horizontal axis passing through the unit circle represents real impedance, the area above the axis represents inductive reactance and the area below represents capacitive reactance. The left-hand portion of the chart at zero reactance represents series resonance frequency (fs) and occurs where the Q circle crosses the real axes on the left side of the Smith Chart. The left-hand portion of the chart also demonstrates the parameter of resistance Rs. The right-hand portion of the chart at zero reactance represents parallel resonant frequency (fp) and occurs where the Q circle crosses the real axes on the right side of the Smith Chart. The right-hand portion of the chart also demonstrates the parameter of resistance Rp. The closer that a plot of FBAR filter characteristics on a Smith Chart is to the perimeter of the Smith Chart, the higher the Q will be for that FBAR. Also, the more smooth that the curve is, the lower the noise is in the FBAR.


In FIG. 6, the performance of FBAR 40 as a filter is illustrated by the solid line Q circle s I and the performance of a prior art FBAR without a filled region in the electrode is illustrated by the dashed line Q circle s22. As evident, FBAR 40 improves the quality of the filter near the frequency fp. FBAR 40, illustrated by Q circle s11, more closely approximates a unit circle in the upper half of the unit circle and is representative of a less lossy device in that area, which improves the performance of FBAR 40 when used in a filter.



FIG. 6 also illustrates that FBAR 40 used as a filter actually enhances spurious modes below the series resonant frequency fs, as indicated in the lower-left side or “southwest” quadrant of the unit circle. When FBAR 40 is used in applications where the increase in noise in this frequency regime does not impair the device performance, the improvements illustrated in the other areas of the unit circle can be exploited. For example, in some embodiments FBAR 40 is used as a resonator in a filter application that employs a half-ladder topology. The performance of the filter benefits from the improved Rp, and any noise introduced by the increased spurious modes lies outside the filter passband.



FIG. 7 illustrates a cross-sectional view of FBAR 40 in accordance with an alternative embodiment of the present invention. FBAR 40 is essentially the same as that illustrated in FIG. 3, and includes substrate 42, depression 44, first electrode 46, piezoelectric (PZ) layer 48, second electrode 50 and fill region 60. Two edges, 50b and 50e, of the perimeter of second electrode 50 are also illustrated. In addition, however, FBAR 40 illustrated in FIG. 7, has fill region 60 formed in a surface of second electrode 50 that is opposite the surface in which fill region 60 was formed in FIG. 3. As FBAR 40 is depicted in FIG. 3, fill region 60 is on the “top” surface of second electrode 50, whereas as FBAR 40 is depicted in FIG. 7, fill region 60 is on the “bottom” surface of second electrode 50. In one embodiment, fill region 60 depicted in FIG. 7 is also outside the edge of the perimeter of depression 44. In alternative embodiments fill region 60 overlaps the perimeter of depression 44, and in other embodiments, fill region 60 lies entirely inside the perimeter of depression 44.


In one embodiment, the performance of FBAR 40 as illustrated in FIG. 7 is essentially the same as that described above for FBAR 40 as depicted in FIG. 3. Fill region 60 on the “bottom” surface of second electrode 50 can be achieved in a variety of ways known by those skilled in the art. For example, the structure illustrated in FIG. 7 could be constructed by using a lift-off process (i.e., mask, material deposition, and lift-off) after piezoelectric deposition, followed by deposition of the top electrode material.



FIGS. 8 and 9 illustrate cross-sectional views of FBAR 70 in accordance with alternative embodiments of the present invention. FBAR 70 includes substrate 72, depression 74, first electrode 76, piezoelectric (PZ) layer 78, second electrode 80, and fill material 90. Typically, contacts (not illustrated in the Figures) are coupled to first and second electrodes 76 and 80. Also, an optional passivation layer (not illustrated in the Figures) may be used to cover second electrode 80. The contacts facilitate connecting first and second electrodes 76 and 80 to a voltage source. First electrode 76, PZ layer 78, and second electrode 80 collectively form an FBAR membrane, which may be placed over a depression 74 or over an acoustic mirror as discussed above. The FBAR membrane is illustrated adjacent substrate 72 and suspended over depression 74 to provide an electrode-air interface. As with previous embodiments, an electrode-acoustic mirror interface is also obtainable using an SMR design in accordance with the present invention.


FBAR 70 is similar to FBAR 30 illustrated in FIG. 3; however, FBAR 70 has fill region 90 inserted in first electrode 76, rather than in the second electrode as above. Fill region 90 inserted in first electrode 76 also improves the performance of FBAR 70, resulting in improved insertion loss and improved resonator quality factor Q of FBAR 70. In FIG. 8, fill region 90 is illustrated adjacent the “top surface” of first electrode 76 and in FIG. 9, fill region 90 is illustrated adjacent the “bottom surface” of first electrode 76. In each case, fill region 90 is illustrated just outside the perimeter of depression 74. In this way, when the perimeter or outside diameter of depression 44 is extended in the vertical direction (as oriented in the illustration of FIGS. 8 and 9), fill region 90 is just “outside” the perimeter of depression 74. In alternative embodiments, fill region 90 overlaps the perimeter of depression 74, and in other embodiments, fill region 90 lies entirely inside the perimeter of depression 74. Like fill region 60 described previously with respect to FBAR 40, fill region 90 improves the performance of FBAR 70, resulting in improved noise reduction and improved resonator quality factor Q of FBAR 70.


As with embodiments above, fill region 90 is filled with a material that is different than that used for second electrode 80. In that case, the material in fill region 90 will have different dispersion characteristics than will the remaining material of second electrode 80, which in one case is Mo. Adding this material with differing dispersion characteristics can improve insertion loss and improve the resonator quality factor Q of FBAR 70. In one embodiment, the material in fill region 90 increases the FBAR membrane's stiffness at its edge. In one case, the material in fill region 90 is such that it increases the acoustic impedance of the fill region 90 relative to that at the center of the FBAR membrane. Such material may be denser than the electrode material. For example, the material in fill region 90 can be W, while second electrode 80 is made of Mo. In other embodiments first and second electrodes 76 and 80 may be metal such as Pt, W, Cu, Al, Au, or Ag. In alternative embodiments, material in fill region 90 could also be made of materials such as polyimide, BCB, SiO2, Si3N4, or other dielectrics, AlN, ZnO, LiNbO3, PZT, LiTaO3, Al2O3, or other piezoelectric materials, Pt, W, Cu, Al, Au, Ag, or other metals or alloys of metals.


FBARs 40 and 70 may be fabricated in a variety of ways consistent with the present invention. In one embodiment, for example, a recessed region is created in the top electrode by first depositing electrode metal to a thickness slightly less than the desired thickness. Then a photo mask is used to pattern the center region of the resonator. The remaining thickness of electrode metal is then deposited, and a lift-off process is used to remove the resist remaining in the recessed area. An additional photo mask is then used to pattern the fill region. Fill material is deposited in the fill region, and the mask and fill material outside the fill region are removed in a lift-off process. In another embodiment, the recessed region may be produced by first depositing electrode metal to the desired thickness, patterning the electrode with a photo mask, and etching the recessed region. In another embodiment, the fill material may be produced by first depositing fill material, patterning the fill region with a photo mask, and etching away the fill material outside the fill region.



FIGS. 10A-10F are cross-sectional views illustrating various intermediate stages of fabrication of FBAR 100 according to one embodiment of the present invention. FBAR 100 is similar to those illustrated in FIGS. 3-9, and includes substrate 102, depression 104, first electrode 106, piezoelectric (PZ) layer 108, and second electrode 110, which collectively form an FBAR membrane. FIG. 10A illustrates FBAR 100 prior to formation of a fill region 120 (illustrated in FIG. 10F and analogous to above-described fill regions 60 and 90).



FIG. 10B illustrates FBAR 100 with a photo mask 109 deposited over the FBAR membrane. Photo mask 109 is used to pattern a recessed region using a lift-off process. FIG. 10C illustrates FBAR 100 of FIG. 10B after additional electrode material metal 110 is deposited, but before the lift-off process. FIG. 10D illustrates FBAR 100 after the lift-off process. The lift off process removes photo mask 109 and all metal 10 that is on photo mask 109. In this way, the lift-off process defines a recessed region 111.


Next, FIG. 10E illustrates FBAR 100 with a photo mask 113 deposited over the FBAR membrane to pattern the fill. FIG. 10F illustrates FBAR 100 of FIG. 10E after fill material 120 deposition, but before the lift-off process. After the lift off process, FBAR 40 of FIG. 3 illustrates the resulting structure. In some embodiments, the FBAR may additionally utilize at least one passivation layer.


A filled recessed region on the bottom electrode may be constructed similarly. Furthermore, the top of the fill region does not necessarily need to align with the surface of the electrode, whether the fill region resides in the top electrode or bottom electrode. The recess in the FBAR can be generated by a lift-off process, but can also be made with an etch step. The fill material may be patterned in the recessed region by first masking with a photo mask, depositing metallization, and then using a lift-off to leave fill material in the recessed region. Fill material can also be added by first using a metal deposition, followed by a photo mask and an etch.


Although specific embodiments have been illustrated and described herein, it will be appreciated by those of ordinary skill in the art that a variety of alternate and/or equivalent implementations may be substituted for the specific embodiments shown and described without departing from the scope of the present invention. This application is intended to cover any adaptations or variations of the specific embodiments discussed herein. Therefore, it is intended that this invention be limited only by the claims and the equivalents thereof.

Claims
  • 1. A method for fabricating an acoustic resonator comprising: providing a substrate;fabricating a first electrode adjacent the substrate;fabricating a piezoelectric layer adjacent the first electrode;depositing electrode material to form a second electrode up to a first thickness adjacent the piezoelectric layer;depositing a first photo mask over the second electrode;depositing additional electrode material over at least a portion of the first photo mask to form the second electrode up to a second thickness;removing the photo mask thereby forming a recessed region in the second electrode; andfilling the recessed region with a fill material.
  • 2. The method of claim 1, further including depositing a second photo mask over the second electrode before filling the recessed region.
  • 3. The method of claim 1 further including forming a depression in the substrate.
  • 4. The method of claim 1 further including filling the recessed region with a different material than the electrode material.
  • 5. The method of claim 1, wherein filling the recessed region includes filling with a material selected from the group consisting of: dielectrics, metals, metal alloys, piezoelectrics, Mo, Pt, Al, Cu, W, Au, Ag, polyimide, BCB, SiO2, Si3N4, AN, ZnO, LiNbO3, PZT, LiTaO3, and Al2O3.
CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a division of U.S. patent Ser. No. 11/100,311, now U.S. Pat. No. 7,369,013, entitled “ACOUSTIC RESONATOR PERFORMANCE ENHANCEMENT USING RECESSED REGION” filed on Apr. 6, 2005 and claims benefit of priority under 35 U.S.C. §121 therefrom. The entire disclosure of the parent application is specifically incorporated herein by reference.

US Referenced Citations (364)
Number Name Date Kind
3174122 Fowler et al. Mar 1965 A
3189851 Fowler Jun 1965 A
3321648 Kolm May 1967 A
3422371 Poirier et al. Jan 1969 A
3568108 Poirier et al. Mar 1971 A
3582839 Pim et al. Jun 1971 A
3590287 Berlincourt et al. Jun 1971 A
3610969 Clawson et al. Oct 1971 A
3826931 Hammond Jul 1974 A
3845402 Nupp Oct 1974 A
4084217 Brandis et al. Apr 1978 A
4172277 Pinson Oct 1979 A
4272742 Lewis Jun 1981 A
4281299 Newbold Jul 1981 A
4320365 Black et al. Mar 1982 A
4344004 Okubo Aug 1982 A
4355408 Scarrott Oct 1982 A
4456850 Inoue et al. Jun 1984 A
4529904 Hattersley Jul 1985 A
4608541 Moriwaki et al. Aug 1986 A
4625138 Ballato Nov 1986 A
4640756 Wang et al. Feb 1987 A
4719383 Wang et al. Jan 1988 A
4769272 Byrne et al. Sep 1988 A
4798990 Henoch Jan 1989 A
4819215 Yokoyama et al. Apr 1989 A
4836882 Ballato Jun 1989 A
4841429 McClanahan et al. Jun 1989 A
4906840 Zdeblick et al. Mar 1990 A
5048036 Scifres et al. Sep 1991 A
5048038 Brennan et al. Sep 1991 A
5066925 Freitag Nov 1991 A
5075641 Weber et al. Dec 1991 A
5111157 Komiak May 1992 A
5118982 Inoue et al. Jun 1992 A
5129132 Zdeblick et al. Jul 1992 A
5162691 Mariani et al. Nov 1992 A
5185589 Krishnaswamy et al. Feb 1993 A
5214392 Kobayashi et al. May 1993 A
5233259 Krishnaswamy et al. Aug 1993 A
5241209 Sasaki Aug 1993 A
5241456 Marcinkiewicz et al. Aug 1993 A
5262347 Sands Nov 1993 A
5270492 Fukui Dec 1993 A
5294898 Dworsky et al. Mar 1994 A
5361077 Weber Nov 1994 A
5382930 Stokes et al. Jan 1995 A
5384808 Van Brunt et al. Jan 1995 A
5448014 Kong et al. Sep 1995 A
5465725 Seyed-Boloforosh Nov 1995 A
5475351 Uematsu et al. Dec 1995 A
5548189 Williams Aug 1996 A
5567334 Baker et al. Oct 1996 A
5587620 Ruby et al. Dec 1996 A
5589858 Kadowaki et al. Dec 1996 A
5594705 Connor et al. Jan 1997 A
5603324 Oppelt et al. Feb 1997 A
5633574 Sage May 1997 A
5671242 Takiguchi et al. Sep 1997 A
5692279 Mang et al. Dec 1997 A
5704037 Chen Dec 1997 A
5705877 Shimada Jan 1998 A
5714917 Ella Feb 1998 A
5729008 Blalock et al. Mar 1998 A
5789845 Wadaka et al. Aug 1998 A
5835142 Nakamura et al. Nov 1998 A
5853601 Krishaswamy et al. Dec 1998 A
5864261 Weber Jan 1999 A
5866969 Shimada et al. Feb 1999 A
5872493 Ella Feb 1999 A
5873153 Ruby et al. Feb 1999 A
5873154 Ylilammi et al. Feb 1999 A
5894184 Furuhashi et al. Apr 1999 A
5894647 Lakin Apr 1999 A
5910756 Ella Jun 1999 A
5932953 Drees et al. Aug 1999 A
5936150 Kobrin et al. Aug 1999 A
5953479 Zhou et al. Sep 1999 A
5955926 Uda et al. Sep 1999 A
5962787 Okada et al. Oct 1999 A
5969463 Tomita Oct 1999 A
5982297 Welle Nov 1999 A
6001664 Swirhun et al. Dec 1999 A
6016052 Vaughn Jan 2000 A
6040962 Kanazawa Mar 2000 A
6051907 Ylilammi Apr 2000 A
6060818 Ruby et al. May 2000 A
6087198 Panasik Jul 2000 A
6090687 Merchant et al. Jul 2000 A
6107721 Lakin Aug 2000 A
6111341 Hirama Aug 2000 A
6111480 Iyama et al. Aug 2000 A
6118181 Merchant et al. Sep 2000 A
6124678 Bishop et al. Sep 2000 A
6124756 Yaklin et al. Sep 2000 A
6131256 Dydyk Oct 2000 A
6150703 Cushman et al. Nov 2000 A
6166646 Park et al. Dec 2000 A
6187513 Katakura Feb 2001 B1
6198208 Yano et al. Mar 2001 B1
6215375 Larson, III et al. Apr 2001 B1
6219032 Rosenberg et al. Apr 2001 B1
6219263 Wuidart Apr 2001 B1
6228675 Ruby et al. May 2001 B1
6229247 Bishop May 2001 B1
6252229 Hays et al. Jun 2001 B1
6262600 Haigh et al. Jul 2001 B1
6262637 Bradley et al. Jul 2001 B1
6263735 Nakatani et al. Jul 2001 B1
6265246 Ruby et al. Jul 2001 B1
6278342 Ella Aug 2001 B1
6292336 Horng et al. Sep 2001 B1
6307447 Barber et al. Oct 2001 B1
6307761 Nakagawa Oct 2001 B1
6335548 Roberts et al. Jan 2002 B1
6355498 Chan et al. Mar 2002 B1
6366006 Boyd Apr 2002 B1
6376280 Ruby et al. Apr 2002 B1
6377137 Ruby Apr 2002 B1
6384697 Ruby May 2002 B1
6396200 Misu et al. May 2002 B2
6407649 Tikka et al. Jun 2002 B1
6414569 Nakafuku Jul 2002 B1
6420820 Larson, III Jul 2002 B1
6424237 Ruby et al. Jul 2002 B1
6429511 Ruby et al. Aug 2002 B2
6434030 Rehm et al. Aug 2002 B1
6437482 Shibata Aug 2002 B1
6441539 Kitamura et al. Aug 2002 B1
6441702 Ella et al. Aug 2002 B1
6462631 Bradley et al. Oct 2002 B2
6466105 Lobl et al. Oct 2002 B1
6466418 Horng et al. Oct 2002 B1
6469597 Ruby et al. Oct 2002 B2
6469909 Simmons Oct 2002 B2
6472954 Ruby et al. Oct 2002 B1
6476536 Pensala Nov 2002 B1
6479320 Gooch Nov 2002 B1
6483229 Larson, III et al. Nov 2002 B2
6486751 Barber et al. Nov 2002 B1
6489688 Baumann et al. Dec 2002 B1
6492883 Liang et al. Dec 2002 B2
6496085 Ella Dec 2002 B2
6498604 Jensen Dec 2002 B1
6507983 Ruby et al. Jan 2003 B1
6515558 Ylilammi Feb 2003 B1
6518860 Ella et al. Feb 2003 B2
6525996 Miyazawa Feb 2003 B1
6528344 Kang Mar 2003 B2
6530515 Glenn et al. Mar 2003 B1
6534900 Aigner et al. Mar 2003 B2
6542055 Frank et al. Apr 2003 B1
6548942 Panasik Apr 2003 B1
6548943 Kaitila et al. Apr 2003 B2
6549394 Williams Apr 2003 B1
6550664 Bradley et al. Apr 2003 B2
6559487 Kang et al. May 2003 B1
6559530 Hinzel et al. May 2003 B2
6564448 Oura et al. May 2003 B1
6566956 Ohnishi et al. May 2003 B2
6566979 Larson et al. May 2003 B2
6580159 Fusaro et al. Jun 2003 B1
6583374 Knieser et al. Jun 2003 B2
6583688 Klee et al. Jun 2003 B2
6593870 Dummermuth et al. Jul 2003 B2
6594165 Duerbaum et al. Jul 2003 B2
6600390 Frank Jul 2003 B2
6601276 Barber Aug 2003 B2
6603182 Low et al. Aug 2003 B1
6617249 Ruby et al. Sep 2003 B2
6617750 Dummermuth et al. Sep 2003 B2
6617751 Sunwoo et al. Sep 2003 B2
6621137 Ma et al. Sep 2003 B1
6630753 Malik et al. Oct 2003 B2
6635509 Ouellet Oct 2003 B1
6639872 Rein Oct 2003 B1
6651488 Larson et al. Nov 2003 B2
6657363 Aigner Dec 2003 B1
6668618 Larson et al. Dec 2003 B2
6670866 Ella et al. Dec 2003 B2
6693500 Yang et al. Feb 2004 B2
6710508 Ruby et al. Mar 2004 B2
6710681 Figueredo et al. Mar 2004 B2
6713314 Wong et al. Mar 2004 B2
6714102 Ruby et al. Mar 2004 B2
6720844 Lakin Apr 2004 B1
6720846 Iwashita et al. Apr 2004 B2
6724266 Piazza et al. Apr 2004 B2
6738267 Navas Sabater et al. May 2004 B1
6774746 Whatmore et al. Aug 2004 B2
6777263 Gan et al. Aug 2004 B1
6787048 Bradley et al. Sep 2004 B2
6788170 Kaitila et al. Sep 2004 B1
6803835 Frank Oct 2004 B2
6812619 Kaitila et al. Nov 2004 B1
6828713 Bradley et al. Dec 2004 B2
6842088 Yamada et al. Jan 2005 B2
6842089 Lee Jan 2005 B2
6853534 Williams Feb 2005 B2
6873065 Haigh et al. Mar 2005 B2
6873529 Ikuta Mar 2005 B2
6874211 Bradley et al. Apr 2005 B2
6874212 Larson, III Apr 2005 B2
6888424 Takeuchi et al. May 2005 B2
6900705 Nakamura et al. May 2005 B2
6903452 Ma et al. Jun 2005 B2
6906451 Yamada et al. Jun 2005 B2
6911708 Park Jun 2005 B2
6917261 Unterberger Jul 2005 B2
6924583 Lin et al. Aug 2005 B2
6924717 Ginsburg et al. Aug 2005 B2
6927651 Larson, III et al. Aug 2005 B2
6936928 Hedler et al. Aug 2005 B2
6936954 Peczalski Aug 2005 B2
6943648 Maiz et al. Sep 2005 B2
6946928 Larson et al. Sep 2005 B2
6954121 Bradley et al. Oct 2005 B2
1670365 Turchi Nov 2005 A1
6963257 Ella et al. Nov 2005 B2
6970365 Turchi Nov 2005 B2
6975183 Aigner et al. Dec 2005 B2
6977563 Komuro et al. Dec 2005 B2
6985052 Tikka Jan 2006 B2
6987433 Larson et al. Jan 2006 B2
6989723 Komuro et al. Jan 2006 B2
6998940 Metzger Feb 2006 B2
7002437 Takeuchi et al. Feb 2006 B2
7019604 Gotoh et al. Mar 2006 B2
7019605 Larson Mar 2006 B2
7026876 Esfandiari et al. Apr 2006 B1
7053456 Matsuo May 2006 B2
7057476 Hwu Jun 2006 B2
7057478 Korden et al. Jun 2006 B2
7064606 Louis Jun 2006 B2
7084553 Ludwiczak Aug 2006 B2
7091649 Larson Aug 2006 B2
7098758 Wang et al. Aug 2006 B2
7102460 Schmidhammer et al. Sep 2006 B2
7128941 Lee Oct 2006 B2
7138889 Lakin Nov 2006 B2
7161448 Feng et al. Jan 2007 B2
7170215 Namba et al. Jan 2007 B2
7173504 Larson Feb 2007 B2
7187254 Su et al. Mar 2007 B2
7209374 Noro Apr 2007 B2
7212083 Inoue et al. May 2007 B2
7212085 Wu May 2007 B2
7230509 Stoemmer Jun 2007 B2
7230511 Onishi et al. Jun 2007 B2
7242270 Larson et al. Jul 2007 B2
7259498 Nakatsuka et al. Aug 2007 B2
7275292 Ruby et al. Oct 2007 B2
7276994 Takeuchi et al. Oct 2007 B2
7280007 Feng et al. Oct 2007 B2
7281304 Kim et al. Oct 2007 B2
7294919 Bai Nov 2007 B2
7301258 Tanaka Nov 2007 B2
7310861 Aigner et al. Dec 2007 B2
7332985 Larson et al. Feb 2008 B2
7367095 Larson, III et al. May 2008 B2
7368857 Tanaka May 2008 B2
7369013 Fazzio et al. May 2008 B2
7388318 Yamada et al. Jun 2008 B2
7388454 Ruby et al. Jun 2008 B2
7388455 Larson, III Jun 2008 B2
7408428 Larson, III Aug 2008 B2
7414349 Sasaki Aug 2008 B2
7414495 Iwasaki et al. Aug 2008 B2
7423503 Larson, III Sep 2008 B2
7425787 Larson, III Sep 2008 B2
7439824 Aigner Oct 2008 B2
7545532 Muramoto Jun 2009 B2
20020000646 Gooch et al. Jan 2002 A1
20020030424 Iwata Mar 2002 A1
20020063497 Panasik May 2002 A1
20020070463 Chang et al. Jun 2002 A1
20020121944 Larson, III et al. Sep 2002 A1
20020121945 Ruby et al. Sep 2002 A1
20020126517 Matsukawa et al. Sep 2002 A1
20020140520 Hikita et al. Oct 2002 A1
20020152803 Larson, III et al. Oct 2002 A1
20020190814 Yamada et al. Dec 2002 A1
20030001251 Cheever et al. Jan 2003 A1
20030006502 Karpman Jan 2003 A1
20030011285 Ossmann Jan 2003 A1
20030011446 Bradley Jan 2003 A1
20030051550 Nguyen et al. Mar 2003 A1
20030087469 Ma May 2003 A1
20030102776 Takeda et al. Jun 2003 A1
20030111439 Fetter et al. Jun 2003 A1
20030128081 Ella et al. Jul 2003 A1
20030132493 Kang et al. Jul 2003 A1
20030132809 Senthilkumar et al. Jul 2003 A1
20030141946 Ruby et al. Jul 2003 A1
20030179053 Aigner et al. Sep 2003 A1
20030205948 Lin et al. Nov 2003 A1
20040016995 Kuo et al. Jan 2004 A1
20040017130 Wang et al. Jan 2004 A1
20040056735 Nomura et al. Mar 2004 A1
20040092234 Pohjonen May 2004 A1
20040124952 Tikka Jul 2004 A1
20040129079 Kato et al. Jul 2004 A1
20040150293 Unterberger Aug 2004 A1
20040150296 Park et al. Aug 2004 A1
20040166603 Carley Aug 2004 A1
20040195937 Matsubara et al. Oct 2004 A1
20040212458 Lee Oct 2004 A1
20040257171 Park et al. Dec 2004 A1
20040257172 Schmidhammer et al. Dec 2004 A1
20040263287 Ginsburg et al. Dec 2004 A1
20050012570 Korden et al. Jan 2005 A1
20050012716 Mikulin et al. Jan 2005 A1
20050023931 Bouche et al. Feb 2005 A1
20050030126 Inoue et al. Feb 2005 A1
20050036604 Scott et al. Feb 2005 A1
20050057117 Nakatsuka et al. Mar 2005 A1
20050057324 Onishi et al. Mar 2005 A1
20050068124 Stoemmer Mar 2005 A1
20050093396 Larson et al. May 2005 A1
20050093653 Larson, III May 2005 A1
20050093654 Larson et al. May 2005 A1
20050093655 Larson et al. May 2005 A1
20050093657 Larson et al. May 2005 A1
20050093658 Larson et al. May 2005 A1
20050093659 Larson et al. May 2005 A1
20050104690 Larson May 2005 A1
20050110598 Larson, III May 2005 A1
20050128030 Larson et al. Jun 2005 A1
20050140466 Larson, III et al. Jun 2005 A1
20050167795 Higashi Aug 2005 A1
20050193507 Ludwiczak Sep 2005 A1
20050206271 Higuchi et al. Sep 2005 A1
20050206483 Pashby et al. Sep 2005 A1
20050218488 Matsuo Oct 2005 A1
20060071736 Ruby et al. Apr 2006 A1
20060081048 Mikado et al. Apr 2006 A1
20060087199 Larson et al. Apr 2006 A1
20060103492 Feng et al. May 2006 A1
20060119453 Fattinger et al. Jun 2006 A1
20060125489 Feucht et al. Jun 2006 A1
20060132262 Fazzio et al. Jun 2006 A1
20060164183 Tikka et al. Jul 2006 A1
20060185139 Larson, III et al. Aug 2006 A1
20060197411 Hoen et al. Sep 2006 A1
20060238070 Costa et al. Oct 2006 A1
20060284707 Larson et al. Dec 2006 A1
20060290446 Aigner et al. Dec 2006 A1
20070037311 Izumi et al. Feb 2007 A1
20070080759 Jamneala et al. Apr 2007 A1
20070084964 John et al. Apr 2007 A1
20070085447 Larson Apr 2007 A1
20070085631 Larson et al. Apr 2007 A1
20070085632 Larson et al. Apr 2007 A1
20070086080 Larson et al. Apr 2007 A1
20070086274 Nishimura et al. Apr 2007 A1
20070090892 Larson Apr 2007 A1
20070170815 Unkrich Jul 2007 A1
20070171002 Unkrich Jul 2007 A1
20070176710 Jamneala et al. Aug 2007 A1
20070205850 Jamneala et al. Sep 2007 A1
20070279153 Ruby Dec 2007 A1
20080055020 Handtmann et al. Mar 2008 A1
20080297279 Thalhammer et al. Dec 2008 A1
20080297280 Thalhammer et al. Dec 2008 A1
Foreign Referenced Citations (52)
Number Date Country
10160617 Jun 2003 DE
0231892 Aug 1987 EP
0637875 Feb 1995 EP
0689254 Jun 1995 EP
0865157 Sep 1998 EP
0880227 Nov 1998 EP
0973256 Jan 2000 EP
1047189 Oct 2000 EP
1100196 Nov 2000 EP
1 096 259 May 2001 EP
1 180 494 Feb 2002 EP
1100196 Feb 2002 EP
1249932 Oct 2002 EP
1 258 990 Nov 2002 EP
1258989 Nov 2002 EP
1542362 Jun 2003 EP
1 517 443 Mar 2005 EP
1517444 Mar 2005 EP
1528674 May 2005 EP
1528675 May 2005 EP
1528676 May 2005 EP
1528677 May 2005 EP
1557945 Jul 2005 EP
1 575 165 Sep 2005 EP
1207974 Oct 1970 GB
2013343 Aug 1979 GB
2411239 Aug 2005 GB
2418791 Apr 2006 GB
2427773 Jan 2007 GB
59023612 Feb 1984 JP
61054686 Mar 1986 JP
1-157108 Jun 1989 JP
06005944 Jan 1994 JP
2001-257560 Sep 2001 JP
2002-515667 May 2002 JP
2002217676 Aug 2002 JP
2003124779 Apr 2003 JP
WO-9816957 Apr 1998 WO
WO 0106647 Jan 2001 WO
WO-0199276 Dec 2001 WO
WO 02103900 Dec 2002 WO
WO-03030358 Apr 2003 WO
WO 03043188 May 2003 WO
WO-03050950 Jun 2003 WO
WO-03058809 Jul 2003 WO
WO-2004034579 Apr 2004 WO
WO 2004051744 Jun 2004 WO
WO 2004102688 Nov 2004 WO
WO-2005043752 May 2005 WO
WO-2005043753 May 2005 WO
WO-2005043756 May 2005 WO
WO-2006018788 Feb 2006 WO
Related Publications (1)
Number Date Country
20080060181 A1 Mar 2008 US
Divisions (1)
Number Date Country
Parent 11100311 Apr 2005 US
Child 11938078 US