Claims
- 1. A process for fabricating an electrically alterable resistive component in an integrated circuit which includes a semiconductor substrate having a major surface and an insulating layer over said surface; said process including the steps of:
- forming a bottom electrical lead on said insulating layer;
- depositing and patterning a layer of electrically alterable material such that the patterned electrically alterable material overlies and is coupled to said bottom lead;
- forming a top electrical lead which extends over and is there coupled to said electrically alterable material;
- limiting said electrically alterable material to consist essentially of silicon having less than 10.sup.17 dopant atoms per CM.sup.3 ; and,
- confining said electrically alterable material from its deposition to the end of said process to temperatures of less than 600.degree. C.
- 2. A process according to claim 1 wherein prior to said depositing step, said process employs temperatures above 600.degree. C.
- 3. A process according to claim 11 wherein said bottom electrical lead is formed by patterning a layer of silicon which has large crystalline grains and wherein said electrically alterable material has small crystalline grains.
- 4. A process according to claim 1 wherein said electrically alterable material has no dopant atoms.
Parent Case Info
This is a divisional of Ser. No. 08/009,372 filed on Jan. 26, 1993, U.S. Pat. No. 5,296,722, which is a continuation of 07/802,572 filed on Dec. 5, 1991, abandoned, which is a division of 06/237,429 filed on Feb. 23, 1981, U.S. Pat. No. 5,148,256.
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Number |
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Date |
Kind |
4146902 |
Tanimoto et al. |
Mar 1979 |
|
4404581 |
Tam et al. |
Sep 1983 |
|
4599705 |
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Non-Patent Literature Citations (1)
Entry |
S. M. Sze, VLSI Technology McGraw Hill, 1983 pp. 103-105, 127. |
Divisions (1)
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Number |
Date |
Country |
Parent |
237429 |
Feb 1981 |
|
Continuations (1)
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Number |
Date |
Country |
Parent |
802572 |
Dec 1991 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
9372 |
Jan 1993 |
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