Claims
- 1. A method of fabricating an electrode of a color picture tube electron gun, said electrode having an aperture for passing an electron beam and a single focusing recess associated with the aperture and having a predetermined width a depth formed in a surface of a single metal plate, said single focusing recess having a predetermined length extending in a predetermined direction substantially symmetrically with respect to an axis of said electron beam pass aperture comprising the steps of:
- forming in said metal plate a laterally elongated through hole of substantially ellipitical configuration being substantially symmetrical with the axis of said electron beam pass aperture and having a major diameter in a longitudinal direction of said recess, before said recess is formed;
- forming said single focusing recess at a peripheral wall area of said laterally elongated through hole through a coining process; and
- forming said electron beam pass aperture by removing a wall portion of said through hole existing after completion of the coining process to form a through hole of a predetermined shape.
- 2. A fabrication method according to claim 1 wherein said electron is one of first and second grid electrodes.
- 3. A fabrication method according to claim 1 wherein said color picture tube electron gun is of an in-line type.
- 4. A fabrication method according to claim 1 wherein the ratio between major and minor diameters of said laterally elongated through hole is 1.2 to 1.8:1.0.
- 5. A fabrication method according to claim 1 wherein the depth of said recess is constant.
- 6. A fabrication method according to claim 1 wherein said laterally elongated through hole existing before completion of the coining process has a major diameter which is smaller than a longitudinal length of said recess and a minor diameter which is smaller than a width of said recess.
- 7. A method of fabricating an electrode of a color picture tube electron gun, said electrode having a plurality of electron beam pass apertures in alignment, and a plurality of focusing recesses, with a single one of the focusing recesses being associated with a single one of the apertures and each having a predetermined width and depth formed in a surface of a single metal plate, each of said focusing recesses having a predetermined length extending in a predetermined direction substantially symmetrically with respect to an axis of said electron beam pass apertures, comprising the steps of:
- forming in said metal plate a plurality of laterally elongated through holes having substantially elliptical configurations each being substantially symmetrical with the axis of each of said electron beam pass apertures and each having a major diameter in a longitudinal direction of each of said focusing recesses, before said focusing recesses are formed;
- forming each of said focusing recesses at a peripheral wall area of each said laterally elongated through holes through a coining process; and
- forming each of said electron beam pass apertures by removing a wall portion of each of said through hole existing after completion of the coining process to form a plurality of through holes of a predetermined shape.
- 8. A fabrication method according to claim 1, wherein said recess has a major axis L and a minor axis W dimensioned with respect to a diameter D of said electron beam pass aperture such that W.apprxeq.D and 2D.ltoreq.L.ltoreq.3D.
- 9. A fabrication method according to claim 1, wherein said through hole has a major diameter l.sub.1 and a minor diameter l.sub.2 dimensioned with respect to a major axis L of said recess and a minor axis W of said recess such that l.sub.1 <L and l.sub.2 <W.
- 10. A fabrication method according to claim 9, wherein l.sub.2 .apprxeq.0.75W.
- 11. A fabrication method according to claim 7, wherein said recess has a major axis L and a minor axis W dimensioned with respect to a diameter D of said electron beam pass aperture such that W.apprxeq.D and 2D.ltoreq.L.ltoreq.3D.
- 12. A fabrication method according to claim 7, wherein said through hole has a major diameter l.sub.1 and a minor diameter l.sub.2 dimensioned with respect to a major axis L of said recess and a minor axis W of said recess such that l.sub.1 <L and l.sub.2 <W.
- 13. A fabrication method according to claim 12, wherein l.sub.2 .apprxeq.0.75W.
- 14. A fabrication method according to claim 7, wherein said electrode is one of first and second grid electrodes.
- 15. A fabrication method according to claim 7, wherein said color picture tube electron gun is of an in-line type.
- 16. A fabrication method according to claim 7, wherein the ratio between major and minor diameters of said laterally elongated through hole is 1.2 to 1.8:1.0.
- 17. A fabrication method according to claim 7, wherein the depth of said recess is constant.
- 18. A fabrication method according to claim 7, wherein said laterally elongated through hole existing before completion of the coining process has a major diameter which is smaller than a longitudinal length of said recess and a minor diameter which is smaller than a width of said recess.
- 19. A fabrication method according to claim 1, wherein said predetermined shape of said through hole is substantially circular.
- 20. A fabrication method according to claim 7, wherein said predetermined shape of each of said through holes is substantially circular.
Priority Claims (1)
Number |
Date |
Country |
Kind |
61-213838 |
Sep 1986 |
JPX |
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Parent Case Info
This application is a continuation of application Ser. No. 094,698, filed on Sept. 9, 1987, now abandoned.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
4366414 |
Hatayama et al. |
Dec 1982 |
|
4645469 |
Collins et al. |
Feb 1987 |
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Foreign Referenced Citations (4)
Number |
Date |
Country |
4550 |
Mar 1965 |
JPX |
21832 |
Feb 1980 |
JPX |
48301 |
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157936 |
Sep 1984 |
JPX |
Continuations (1)
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Number |
Date |
Country |
Parent |
94698 |
Sep 1987 |
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