Claims
- 1. A method of producing a transparent and conductive ultrathin metal carbide or nitride layer deposited on a substrate selected from the group consisting of glass, ceramics and organic polymers, each having a light permeability of 50% to 100%, which comprises the steps of:
- exciting a surface of said substrate by irradiating said surface with an excitation source under a vacuum, said excitation source being a carbon ion beam or a nitrogen ion beam;
- vapor-depositing a transition metal on said surface of said substrate simultaneously with the excitation of said surface to thereby form a thin layer of said transition metal on said substrate;
- converting said transition metal to a carbide or a nitride with the excitation during the vapor-deposition; and
- terminating the excitation and the vapor-deposition when the thickness of the metal carbide or nitride layer is in the range of 1 nm to 50 nm, and the light permeability of the metal carbide or nitride layer is in the range of 30% to 90%, wherein the conductivity of the metal carbide or nitride layer is in the range of 1 k.OMEGA./.quadrature. to 100 k.OMEGA./.quadrature..
Priority Claims (1)
Number |
Date |
Country |
Kind |
5-210929 |
Aug 1993 |
JPX |
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RELATED APPLICATION
This application is divisional of U.S. application Ser. No. 08/284,189, filed Aug. 2, 1994, now abandoned.
US Referenced Citations (8)
Foreign Referenced Citations (3)
Number |
Date |
Country |
61-220417 |
Sep 1986 |
JPX |
6-102401 |
Apr 1994 |
JPX |
1307642 |
Apr 1970 |
GBX |
Non-Patent Literature Citations (2)
Entry |
Pierson, "Handbook of Chemical Vapor Deposition (CVD) Principles, Technology and Applications", Noyes Publications 1992, pp. 330-332. |
Thin Solid Film, vol. 100 (1983) Feb.,No. 3, Lausanne, Switerland, B. Goranchev, et al. pp. 257-269. |
Divisions (1)
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Number |
Date |
Country |
Parent |
284189 |
Aug 1994 |
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