Number | Date | Country | Kind |
---|---|---|---|
2-261102 | Sep 1990 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
2946708 | Berghaus et al. | Jul 1960 | |
4212687 | Tanaka et al. | Jul 1980 | |
4309227 | Kajikawa et al. | Jan 1982 | |
4394234 | Asahi et al. | Jul 1983 | |
4969378 | Lu et al. | Nov 1990 |
Number | Date | Country |
---|---|---|
55-11107 | Jan 1980 | JPX |
55-38967 | Mar 1980 | JPX |
55-41941 | Mar 1980 | JPX |
60-17065 | Jan 1985 | JPX |
61-31184 | Jul 1986 | JPX |
61-142074 | Jun 1989 | JPX |
Entry |
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Metals Handbook, 9th Ed., vol. 5 pp. 138-149, 417-421; 1982. |
Chapman, Brian Glow Discharge Processes; Sputtering and Plasma Etching; 1980 pp. 77-82 115-124 QC 702.7P6; C48. |
Metals Handbook 9th Edition, vol. 1, 1978 pp. 540-542, TA472A3. |