Claims
- 1. A method for fabricating a donor member having a surface capable of supporting a layer of particulate latent image developing electroscopic powder, said surface having permanently disposed thereon a plurality of raised, discrete micro-pin self-spacing elements, which comprises:
- (a) exposing a layer of photo-softenable material having a thickness of about 1.7 mils to about 3.5 mils coated on a substrate, through a transparency having a relatively uniform pattern of small clear dots of about 1.8 mils in diameter;
- (b) removing the softened areas to leave depressions in said material;
- (c) electroplating said material with a second material to form from said second material a member having disposed on one surface a pattern of said raised, discrete micro-pin elements, and
- (d) separating said member formed with said second material from the material formed in step (b).
- 2. A method for fabricating a donor member having a surface capable of supporting a layer of particulate latent image developing electroscopic powder, said surface having permanently disposed thereon a plurality of raised, discrete micro-pin self-spacing elements, which comprise;
- (a) exposing a layer of photo-hardenable material having a thickness of about 2.9 mils, coated on a substrate, through a transparency having a relatively uniform pattern of small clear dots of about 1.5 mils in diameter;
- (b) removing the non-hardened portions of the layer to leave the hardened, micro-pin elements permanently adhered to the substrate;
- (c) electroplating a layer of a suitable material including nickel upon the micro-pin composite to form a mold;
- (d) removing the micro-pin composite from the nickel mold;
- (e) passivating the nickel mold;
- (f) electroplating the nickel mold with a suitable material including nickel to form a donor member; and
- (g) separating the donor member from said mold.
Parent Case Info
This is a division, of application Ser. No. 574,836, filed May 5, 1975.
US Referenced Citations (5)
Non-Patent Literature Citations (1)
Entry |
DEForest, W. S., Photoresist Materials and Processes, 1975, pp. 47, 48-62; McGraw-Hill, N. Y. |
Divisions (1)
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Number |
Date |
Country |
Parent |
574836 |
May 1975 |
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