Claims
- 1. A process for fabricating homogeneous ductile foil having a composition consisting essentially of 17 to 20 atom percent chromium, 4 to 10 atom percent boron and 10 to 16 atom percent silicon, the balance being nickel and incidental impurities and the total of nickel and chromium ranging from about 74 to 84 atom percent, which process comprises forming a melt of the compositon and quenching the melt on a moving chill surface at a rate of at least about 10.sup.5 .degree.C./sec.
- 2. The process of claim 1 in which the foil has a composition consisting essentially of 17.5 to 18.5 atom percent chromium, 12.5 to 13.5 atom percent silicon and 5 to 6 atom percent boron, the balance being nickel and incidental impurities.
- 3. The process of claim 1 in which said foil has a thickness ranging from 0.0010 to 0.0025 inch.
Parent Case Info
This application is a division of application Ser. No. 710,343, filed Mar. 11, 1985, now U.S. Pat. No. 4,658,531, issued Apr. 21, 1987, which, in turn, is a divisional of Ser. No. 441,465, filed Nov. 15, 1982.
US Referenced Citations (3)
| Number |
Name |
Date |
Kind |
|
4190095 |
Bedell |
Feb 1980 |
|
|
4588015 |
Liebermann |
May 1986 |
|
|
4607683 |
Hamashima et al. |
Aug 1986 |
|
Divisions (2)
|
Number |
Date |
Country |
| Parent |
710343 |
Mar 1985 |
|
| Parent |
441465 |
Nov 1982 |
|