Claims
- 1. In a method for producing a reticle having a sapphire substrate underlying a titanium reticle pattern, the improvement which comprises:
- depositing a layer of aluminum onto said sapphire substrate;
- forming said aluminum to define a reticle pattern;
- oxidizing said aluminum reticle pattern;
- placing a film of titanium upon said sapphire substrate and said aluminum oxide to form an opague reticle pattern; and
- removing said titanium film from other portions of said sapphire substrate than the oxidized reticle pattern portion.
- 2. The method of claim 1 wherein the oxidizing step comprises:
- placing said aluminum reticle pattern in an oxidizing atmoshpere at an elevated temperature for a predetermined length of time.
- 3. The method of claim 2 wherein said oxidizing step is performed at about 820.degree. C for about 1 hour.
CROSS REFERENCE TO RELATED APPLICATION
This application pertains to an invention disclosed in applicants' copending parent application Ser. No. 598,896 filed July 24, 1975, now U.S. Pat. No. 3,999,301, issued Dec. 28, 1976 and is a divisional application.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
3370948 |
Rosenbauer |
Feb 1968 |
|
3666642 |
Alwan et al. |
May 1972 |
|
3808069 |
Caffrey et al. |
Apr 1974 |
|
3857689 |
Koizumi et al. |
Dec 1974 |
|
Divisions (1)
|
Number |
Date |
Country |
Parent |
598896 |
Jul 1975 |
|