Claims
- 1. A method of making a photocathode including the steps of:
- (a) forming a base layer comprising antimony and oxygen on a substrate,
- (b) evaporating potassium, cesium and rubidium from at least one container onto the base layer, said base layer being maintained at room temperature during said evaporation, and
- (c) sensitizing said photocathode by baking said substrate at a temperature between 150.degree. to 162.degree. C. until the photocathode sensitivity reaches a maximum value.
- 2. The method defined in claim 1 wherein said step of forming the base layer includes:
- i. cleaning and degassing a transparent substrate surface by heating said substrate for about 3 hours to a temperature of about 300.degree. C. in a vacuum,
- ii. cooling said substrate to room temperature and depositing a first antimony layer on said surface with a light transmission therethrough of 90 percent,
- iii. oxidizing said antimony layer to form an antimony oxide film, and
- iv. depositing a second antimony layer on said antimony oxide film with a total light transmission through said substrate, said antimony oxide film and said second antimony layer of about 63 percent.
- 3. The method defined in claim 1 wherein said sensitizing step includes:
- i. placing said substrate in an oven which has been preheated to a temperature between 100.degree. C. and 130.degree. C.,
- ii. increasing the temperature of said oven to said substrate baking temperature, and
- iii. cooling said substrate from the baking temperature at which the above step ii is carried out, said cooling being at a rate of about 5.degree. C. per minute to a temperature of approximately 100.degree. C.
- 4. The method defined in claim 1 said potassium, cesium and rubidium are evaporated simultaneously from a single container.
- 5. A method of forming a photosensitive cathode in an enclosure, comprising the steps of:
- (a) evacuating said enclosure;
- (b) depositing a first film of antimony on a transparent substrate in said enclosure with a light transmission through said antimony film and said substrate of 90 percent, said substrate being maintained at room temperature;
- (c) oxidizing said first film of antimony to form an antimony oxide film;
- (d) depositing a second film of antimony on said antimony oxide film with a total light transmission through said substrate, said antimony oxide film and said second film of antimony of 63 percent;
- (e) simultaneously evaporating rubidium, potassium and cesium from a single container to react with said total amount of antimony;
- (f) heating said substrate at a temperature between 150.degree. to 162.degree. C. for about 30-40 minutes;
- (g) slowly cooling said substrate at a rate of about 5.degree. C. per minute to a temperature of approximately 100.degree. C.; and
- (h) freely cooling said substrate to room temperature.
Parent Case Info
This is a division, of application Ser. No. 098,698, filed Nov. 29, 1979, now abandoned.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
3434876 |
Stoudenheimer et al. |
Nov 1965 |
|
3498834 |
Rome et al. |
Feb 1967 |
|
Non-Patent Literature Citations (1)
Entry |
"Technique for Producing High-Sensitivity Rubidium-Cesium-Antimony Photocathodes" by Carl W. Morrison, Journal of Applied Physics, vol. 37, No. 2, Feb. 1966, pp. 713-715. |
Divisions (1)
|
Number |
Date |
Country |
Parent |
98698 |
Nov 1979 |
|