Claims
- 1. A method of manufacturing a microbalance, comprising the steps of:providing a form onto which an oscillating element of a microbalance can be electroformed; electroforming the oscillating element of a microbalance onto the form; and removing the oscillating element of a microbalance from the form.
- 2. The method of claim 1 further comprising the step of:forming an insulating layer on the oscillating element.
- 3. The method of claim 2 further comprising the step of:providing a resistive element on the insulating layer.
- 4. A method of manufacturing a microbalance, comprising the steps of:depositing a spacer layer on a piece of silicon; layering a microstucture layer on top of the spacer etching the microstucture layer to define a resonant microstructure of a microbalance; and etching the spacer layer thereby to make the resonant microstructure of a microbalance freestanding.
- 5. The method of claim 4 further comprising the step of:forming a motion sensing layer that uses proximity detection by capacitance or reluctance.
- 6. The method of claim 5 further comprising the step of:providing an excitation structure comprising an electrostatic comb drive to drive the resonant microstructure.
- 7. The method of claim 5 wherein the resonant microstructure includes an impaction plate or a filter holder.
REFERENCE TO RELATED APPLICATIONS
Division of application No. 09/682,281, filed on Aug. 13, 2001, now U.S. pat. No. 6,444,927.
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