Claims
- 1. A method for manufacturing a magnetoresistive read transducer having end regions separated by a central active region comprising the steps of:
- depositing a first layer of ferromagnetic material on a substrate;
- forming a stencil which covers at least a portion of said first layer of ferromagnetic material which defines a central active region of said transducer;
- etching away portions of said first layer of magnetoresistive material not covered by said stencil to form a magnetoresistive element extending over said central active region of said transducer;
- depositing a second layer of ferromagnetic material over end regions of said transducer not covered by said stencil; and
- depositing a layer of antiferromagnetic material over said end regions of said transducer not covered by said stencil, said layer of antiferromagnetic material overlaying and in contact with said second layer of ferromagnetic material, said layers of antiferromagnetic and ferromagnetic material forming an exchange-coupled bias layer extending over said end regions of said transducer, said exchange-coupled bias layer in each of said end regions forming an abutting junction with one end of said magnetoresistive element, said exchange-coupled bias layers producing a longitudinal magnetic bias field in said transducer.
- 2. The method as in claim 1 wherein said abutting junction comprises overlapping tapered portions of said magnetoresistive element and said bias layer.
- 3. The method as in claim 2 wherein the length of said overlapping junction is about five time the thickness of said magnetoresistive element.
- 4. The method as in claim 2 wherein the length of said overlapping junction is within the range of about three to five times the thickness of said magnetoresistive element.
- 5. The method as in claim 1 wherein said etch step comprises the use of a directional etching method.
- 6. The method as in claim 5 wherein said directional etching method comprises ion beam milling.
- 7. The method as in claim 5 wherein said directional etching method is carried out at an angle to said transducer.
- 8. The method as in claim 7 wherein said angle is within the range of about seventy to eighty degrees.
- 9. The method as in claim 7 wherein said transducer is rotated in a plane normal to said angle during said etching step.
- 10. The method as in claim 1 wherein said stencil comprises a photoresist material.
- 11. The method as in claim 10 wherein said photoresist material comprises a thin underlayer and a thick imaging layer overlaying said thin underlayer.
- 12. The method as in claim 11 wherein said underlayer is undercut.
- 13. The method as in claim 1 further comprising the step of depositing means for producing a transverse magnetic bias field in at least a portion of said central active region.
- 14. The method as in claim 13 wherein said means for producing a transverse magnetic bias field comprises a layer of soft magnetic material spaced from said magnetoresistive element.
Parent Case Info
This is a divisional of application Ser. No. 08/375,045, filed on Jan. 17, 1995 which is now abandoned, entitled "Magnetoresistive Read Transducer Having A Contiguous Longitudinal Bias Layer", in the name of M. M. Chen, R. E. Fontana, M. T. Krounbi, K. T. Kung, J. H. Lee, J. Lo, C. H. Tsang and P. K. Wang.
US Referenced Citations (16)
Foreign Referenced Citations (6)
Number |
Date |
Country |
0279536A3 |
Aug 1988 |
EPX |
0298417A1 |
Jan 1989 |
EPX |
0422806A3 |
Apr 1991 |
EPX |
0441581A3 |
Aug 1991 |
EPX |
0558237A2 |
Sep 1993 |
EPX |
64001112 |
May 1989 |
JPX |
Divisions (1)
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Number |
Date |
Country |
Parent |
375045 |
Jan 1995 |
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