Method of manufacturing patterned magnetic recording medium

Abstract

A method of manufacturing a patterned magnetic recording medium includes coating a magnetic film with a resist which is decomposed by exposure to electromagnetic radiation or an electron beam to have a low molecular weight, forming a pattern on the resist by an imprinting method, transferring the pattern to the magnetic film by using the resist having the pattern formed thereon as a mask, and removing the resist by exposing the resist to the electromagnetic radiation or the electron beam.

Description

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING

FIGS. 1A, 1B, 1C, 1D, 1E and 1F are cross-sectional views showing a method of manufacturing a patterned magnetic recording medium according to an embodiment;

FIG. 2 is a graph showing a magnetization curve of a magnetic film of a patterned magnetic recording medium according to Example 1;

FIG. 3 is a graph showing a magnetization curve of a magnetic film of a patterned magnetic recording medium according to Example 2;

FIG. 4 is a graph showing a magnetization curve of a magnetic film of a patterned magnetic recording medium according to Comparative Example 1; and

FIG. 5 is a graph showing a magnetization curve of a magnetic film of a patterned magnetic recording medium according to Comparative Example 2.

Claims

1. A method of manufacturing a patterned magnetic recording medium comprising: coating a magnetic film with a resist which is decomposed by exposure to electromagnetic radiation or an electron beam to have a low molecular weight;forming a pattern on the resist by an imprinting method;transferring the pattern to the magnetic film by using the resist having the pattern formed thereon as a mask; andremoving the resist by exposing the resist to the electromagnetic radiation or the electron beam.

2. The method according to claim 1, wherein a protective film is formed on the magnetic film and the protective film is coated with the resist.

3. The method according to claim 1, wherein the pattern is transferred to the magnetic film by ion-milling the magnetic film.

4. The method according to claim 1, wherein the electromagnetic radiation is ultraviolet light.

5. The method according to claim 1, wherein the resist is heated to 20 to 250° C. in the removing step.

6. The method according to claim 5, wherein the resist is heated under a reduced pressure in the removing step.

7. The method according to claim 1, wherein the resist comprises a polyphthalaldehyde derivative or a copolymer of a styrene derivative and an acrylate derivative.

8. The method according to claim 1, wherein the polyphthalaldehyde derivative is poly(4-chlorophthalaldehyde).