The present disclosure relates to a method of manufacturing a protein semiconductor, a protein semiconductor, a method of manufacturing a pn junction, a pn junction, a method of manufacturing a semiconductor apparatus, a semiconductor apparatus, an electronic apparatus, and a method of controlling a conductivity type of a protein semiconductor.
Protein is expected to be used as a next-generation function element or the material thereof instead of an existing semiconductor element using a semiconductor such as silicon. The minimum size of the existing semiconductor element is several ten nm. On the other hand, the protein fulfills an advanced and complicated function even with a very small size of 2 to 10 nm.
The protein is well known to have the properties of a semiconductor (see, for example, Non-Patent Document 1). However, it is considered that the protein has the properties as long as the protein itself has a band gap of 2 to 3 electron volt (eV). On the other hand, in order to manufacture a semiconductor element using a protein semiconductor, it is necessary to control a conductivity type of the protein semiconductor, i.e., to be able to control the protein semiconductor to be p-type or n-type.
However, there have been no means for controlling a conductivity type of a protein semiconductor as far as the present inventors know.
In view of the above, a problem to be solved by the present disclosure is to provide a method of controlling a conductivity type of a protein semiconductor, which is capable of easily controlling a conductivity type of a protein semiconductor, a method of manufacturing a protein semiconductor, and a protein semiconductor.
Another problem to be solved by the present disclosure is to provide a method of manufacturing a pn junction with a protein semiconductor, a pn junction, a method of manufacturing a semiconductor apparatus using the pn junction, a semiconductor apparatus, and an electronic apparatus including the semiconductor apparatus.
The above and other problems will be clear from the description of the present specification with reference to the accompanying drawings.
In order to solve the above-mentioned problems, the present disclosure provides
a method of controlling a conductivity type of a protein semiconductor, including controlling the conductivity type of the protein semiconductor by controlling total amount of charge in amino acid residues.
Here, the conductivity type of the protein semiconductor is p-type, n-type, or i-type.
Moreover, the present disclosure provides
a method of manufacturing a protein semiconductor, including controlling a conductivity type of the protein semiconductor by controlling total amount of charge in amino acid residues.
Moreover, the present disclosure provides
a protein semiconductor whose conductivity type is controlled by controlling total amount of charge in amino acid residues.
Moreover, the present disclosure provides
a method of manufacturing a pn junction, including manufacturing a p-type protein semiconductor and an n-type protein semiconductor by controlling total amount of charge in amino acid residues, and manufacturing a pn junction by joining the p-type protein semiconductor and the n-type protein semiconductor together.
Moreover, the present disclosure provides
a pn junction manufactured by manufacturing a p-type protein semiconductor and an n-type protein semiconductor by controlling total amount of charge in amino acid residues, and joining the p-type protein semiconductor and the n-type protein semiconductor together.
Moreover, the present disclosure provides
a method of manufacturing a semiconductor apparatus, including the steps of manufacturing a p-type protein semiconductor and an n-type protein semiconductor by controlling total amount of charge in amino acid residues, and manufacturing a pn junction by joining the p-type protein semiconductor and the n-type protein semiconductor together.
Moreover, the present disclosure provides
a semiconductor apparatus, including a pn junction manufactured by manufacturing a p-type protein semiconductor and an n-type protein semiconductor by controlling total amount of charge in amino acid residues, and joining the p-type protein semiconductor and the n-type protein semiconductor together.
Moreover, the present disclosure provides
an electronic apparatus, including a semiconductor apparatus including a pn junction manufactured by manufacturing a p-type protein semiconductor and an n-type protein semiconductor by controlling total amount of charge in amino acid residues, and joining the p-type protein semiconductor and the n-type protein semiconductor together.
In order to control the total amount of charge in amino acid residues in the protein, in more detail, in a polypeptide portion of the protein, for example, one or more of an acidic amino acid residue, a basic amino acid residue, and a neutral amino acid residue, which are contained in protein, is substituted with an amino acid residue having different properties. Alternatively, one or more of an acidic amino acid residue, a basic amino acid residue, and a neutral amino acid residue are added to the protein. Alternatively, one or more of an acidic amino acid residue, a basic amino acid residue, and a neutral amino acid residue, which are contained in the protein, are deleted. Alternatively, one or more of an acidic amino acid residue, a basic amino acid residue, and a neutral amino acid residue, which are contained in the protein, are chemically modified. Alternatively, polarity of a medium surrounding the protein is controlled. These methods may be combined as necessary. Moreover, in some cases, the total amount of charge in amino acid residues can be controlled by photodoping, i.e., applying light to the protein to generate an electron-hole pair.
In the present disclosure, the protein is favorably electron transfer protein. The electron transfer protein is generally electron transfer protein containing metal. The metal is, favorably, transition metal having an electron in an orbital having higher energy than d orbital. Examples of the electron transfer protein include, but not limited to, iron-sulfur proteins (e.g., rubredoxin, iron (ii) ferredoxin, iron (iii) ferredoxin, and iron (iv) ferredoxin), blue copper proteins (e.g., plastocyanin, azurin, pseudoazurin, plantacyanin, stellacyanin, and amicyanin), and cytochromes (e.g., cytochrome c, metal-substituted cytochrome c, metal-substituted cytochrome c552 obtained by substituting iron being central metal of heme of cytochrome c552 with another metal, modified zinc porphyrin cytochrome c552, cytochrome b, cytochrome b5, cytochrome c1, cytochrome a, cytochrome a3 cytochrome f, cytochrome b6, cytochrome b562, metal-substituted cytochrome b562, and zinc chlorine cytochrome b562). For example, derivatives of the electron transfer protein (obtained by chemically modifying amino acid residues in the skeleton) or variants thereof (obtained by substituting a part of amino acid residues in the skeleton with another amino acid residue) may be used. Metals in metal-substituted cytochrome c, metal-substituted cytochrome c552, and metal-substituted cytochrome b562 are selected as necessary. Examples of the metals include zinc (Zn), beryllium (Be), strontium (Sr), niobium (Nb), barium (Ba), lutetium (Lu), hafnium (Hf), tantalum (Ta), cadmium (Cd), antimony (Sb), thorium (Th), and lead (Pb).
The semiconductor apparatus may be basically anything as long as it uses a pn junction (including a pin junction in which an intrinsic (i-type) protein semiconductor is sandwiched between a p-type protein semiconductor and an n-type protein semiconductor). The semiconductor apparatus is, specifically, a light-receiving element, a light emission element, an electric field detection element, a carrier transit element (e.g., transistor), or the like. Here, the electric field detection element can be configured by using not only the pn junction but also the p-type protein semiconductor alone or n-type protein semiconductor alone.
In the present disclosure, the total amount of charge in amino acid residues in the protein used as a starting material is controlled by various methods, i.e., substituting one or more of an acidic amino acid residue, a basic amino acid residue, and a neutral amino acid residue, which are contained in the protein, with an amino acid residue having different properties, thereby controlling a conductivity type of the obtained protein semiconductor.
According to the present disclosure, it is possible to easily control a conductivity type of a protein semiconductor. It is also possible to easily manufacture a pn junction with a protein semiconductor using the control method, and to easily attain a novel semiconductor apparatus by using the pn junction. Then, it is possible to attain a sophisticated electronic apparatus by using the semiconductor apparatus.
Hereinafter, a mode for carrying out the invention (hereinafter, referred to as “embodiment”) will be described. It should be noted that a description will be given in the following order.
1. First Embodiment (method of controlling conductivity type of protein semiconductor)
2. Second Embodiment (method of manufacturing protein semiconductor and protein semiconductor)
3. Third Embodiment (method of manufacturing pn junction and pn junction)
4. Fourth Embodiment (light emission element)
5. Fifth Embodiment (quantum cascade laser)
6. Sixth Embodiment (bulk-heterojunction type photoelectric conversion element)
7. Seventh Embodiment (electric field detection element)
8. Eighth Embodiment (bipolar transistor)
9. Ninth Embodiment (thyristor)
10. Tenth Embodiment (photo sensor)
11. Eleventh Embodiment (inverter circuit)
As shown in
A method of controlling properties of the protein semiconductor shown in
1. One or More of Basic Residue B in Protein Semiconductor Shown in
An example thereof is shown in
2. One or More of Basic Residue B in Protein Semiconductor Shown in
An example thereof is shown in
3. One or More of Acidic Residue A in Protein Semiconductor Shown in
An example thereof is shown in
4. One or More of Acidic Residue A in Protein Semiconductor Shown in
An example thereof is shown in
5. One or More of Neutral Residue N in Protein Semiconductor Shown in
An example thereof is shown in
6. One or More of Neutral Residue N in Protein Semiconductor Shown in
An example thereof is shown in
7. One or More of Basic Residue B in Protein Semiconductor Shown in
For example, the fifth basic residue B from the left in the protein semiconductor shown in
Alternatively, for example, the fourth acidic residue A from the left in the protein semiconductor shown in
Alternatively, for example, the third neutral residue N from the left in the protein semiconductor shown in
Chemical modification methods are exemplified as follows.
Acetylation of lysine residue (Lys)
Succinylation of serine residue (Ser)
Succinylation of threonine residue (Thr)
Disulfidation of cysteine residue (Cys)
Esterification of aspartic acid residue (Asp)
Amidation of aspartic acid residue (Asp)
Esterification of glutamine residue (Glu)
Amidation of glutamine residue (Gln)
Phosphorylation of tyrosine residue (Tyr)
Phosphorylation of serine residue (Ser)
8. Polarity of Medium Surrounding Protein Semiconductor Shown
The medium surrounding the protein semiconductor may be any one of liquid, gel, and solid materials.
For example, the protein semiconductor shown
Zinc-substituted cytochrome c shows a p-type photocurrent response.
By substituting one or more of basic residues in the zinc-substituted cytochrome c with an acidic residue or a neutral residue, the p-type photocurrent response is converted into an n-type photocurrent response.
The amino acid sequence (one-character code) of the zinc-substituted cytochrome c is as follows. The number of amino acid residues in the zinc-substituted cytochrome c is 104.
Lysine 5, 7, 8, 13, 22, 25, 27, 39, 53, 55, 60, 72, 73, 79, 86, 87, 88, 99, 100
Arginine 38, 91
The zinc-substituted cytochrome b562 shows a p-type photocurrent response.
By substituting one or more of acidic residues in the zinc-substituted cytochrome b562 with a basic residue or a neutral residue, the p-type photocurrent response is converted into the n-type photocurrent response.
The amino acid sequence (one-character code) of the zinc-substituted cytochrome b562 is as follows. The number of amino acid residues in the zinc-substituted cytochrome b562 is 106.
Glutamic acid 4, 8, 18, 49, 57, 81, 86, 92
Aspartic acid 2, 5, 12, 21, 28, 39, 50, 54, 60, 66, 73, 74
By neutralizing or acidifying one or more of basic residues in the zinc-substituted cytochrome c by chemical modification, the p-type photocurrent response is converted into the n-type photocurrent response.
The positions of the basic residues in the zinc-substituted cytochrome c are shown in
For example, by introducing a neutral residue as R with acetylation of a lysine residue being a basic residue, the basic residues are converted into neutral residues. Specifically, for example, by introducing an uncharged substitution group such as a methyl group and an ethyl group as R, the basic residues are converted into neutral residues. Moreover, in the case where the basic residues are acidified, an acidic group such as a sulfonyl methylene group and a carbonyl methylene group is introduced as R.
The zinc-substituted cytochrome b562 shows the n-type photocurrent response.
By neutralizing or basifying one or more of acidic residues in the zinc-substituted cytochrome b562 by chemical modification, the n-type photocurrent response is converted into the p-type photocurrent response.
The positions of the acidic residues in the zinc-substituted cytochrome b562 are shown in
For example, by introducing a neutral residue as R with esterification or amidation of glutamic acid or aspartic acid, which is an acidic residue, the acidic residues are converted into neutral residues. Specifically, for example, an uncharged substitution group such as a methyl group and an ethyl group is introduced as R. Alternatively, in the case where the acidic residues are converted into basic residues, a basic group is introduced as R.
By acidifying one or more of neutral residues in the zinc-substituted cytochrome c by chemical modification, the p-type photocurrent response is converted into the n-type photocurrent response. For example, threonine and tyrosine having OH groups, which are neutral residues, are acidified by phosphorylation.
Threonine 19, 28, 40, 47, 49, 58, 63, 78, 89, 102
Tyrosine 48, 67, 74, 97
The zinc-substituted cytochrome b562 shows the n-type photocurrent response.
By basifying one or more of neutral residues in the zinc-substituted cytochrome b562 by chemical modification, the n-type photocurrent response is converted into the p-type photocurrent response. For example, serine, threonine, and tyrosine having OH groups, which are neutral residues, are acidified byphosphorylation.
Threonine 9, 31, 44, 96, 97
Tyrosine 101, 105
Serine 52, 55
By surrounding the zinc-substituted cytochrome c with a buffer solution having a high degree of basicity, a basic solution, or a basic polymer, the p-type photocurrent response is converted into the n-type photocurrent response.
By surrounding the zinc-substituted cytochrome b562 with a buffer solution having a high degree of acidity, an acidic solution, or an acidic polymer, the n-type photocurrent response is converted into the p-type photocurrent response.
[Method of Preparing Zinc-Substituted Cytochrome b562]
Here, a method of preparing zinc-substituted cytochrome b562 and the properties thereof will be described.
a. Method of Expressing/Purifying Cytochrome b562 Derived from Escherichia Coli
A plasmid (Cyt-b562/pKK223-3) to which a structural gene of cytochrome b562 derived from Escherichia coli is introduced is prepared, and is transformed into Escherichia Coli strain JM109. The expressing/purifying method was performed according to Non-Patent Document 2.
A preculture solution overnight cultured in 100 mL of LB-Amp medium at 37° C. was transferred to 4 L (2 L×2) of Terrific broth and was cultured at 37° C. for to 6 hours. Zero point two mM of IPTG is added thereto, and the mixture thus obtained was cultured for 18 hours at 25° C. Thus, 70 g of red bacterial cells was obtained. The frozen bacterial cells are suspended in 200 mL of 10 mM of Tris-HCl (pH 8.0) containing 1 mM of EDTA, 1 mM of PMSF, 0.2 mg/mL of Lysozyme, DTT (as appropriate), and DNase (as appropriate), and the cells were destroyed by ultrasonic waves.
Two M of phosphate was added to the centrifugal supernatant and the pH was adjusted to 4.55. Then, centrifugal precipitation of unnecessary protein was performed. The sample thus obtained was purified with CM52 negative ion exchange column chromatography (80 mL of column volume, 50 to 150 mM of KCl, linear gradient/50 mM of potassium phosphate (pH 4.55)), and Sephadex G50 Fine gel-filtration chromatography (480 mL of column volume, 50 mM of Tris-HCl, 0.1 mM of EDTA, pH 8.0), and thus about 80 mg of cytochrome b562 was obtained.
The amino acid sequence of the cytochrome b562 thus obtained is as follows. In the amino acid sequence, as will be described later, an underlined methionine 7, an underlined histidine 102, and an underlined isoleucine 17 of ligands of heme play an important role.
b. Immobilization of Cytochrome b562 to Gold Drop Electrode
A crystal structure of the cytochrome b562 determined by X-ray crystal structure analysis in 1979 (see Non-Patent Document 3) is shown in
As the gold electrode, a gold drop electrode having a diameter of 2 mm was formed.
The gold drop electrode was washed with hot concentrated sulfuric acid (120° C.), and the roughness of the surface of the gold drop electrode was increased in redox processes in sulfuric acid. The gold drop electrode was immersed in 0.1 mM of 11-aminoundecanethiol (H2 N—C11—SH)/ethanol solution at room temperature for 16 hours or more, and an H2 N—C11—SH film was formed on the surface of the gold drop electrode as the self-assembled monolayer 13. Thus, compressed air is applied to the gold drop electrode on which the H2 N—C11-SH film was formed, and the gold drop electrode was dried. After that, the gold drop electrode was soaked in 60 μL of 50 μM of cytochrome b562/4.4 mM of potassium phosphate (pH 7.2) solution, and is incubated at 4° C. all day long.
c. Preparation of Zinc-Substituted Cytochrome b562
Because a method of preparing the zinc-substituted cytochrome b562 has been reported by Hamachi et al. (Non-Patent Document 4), the zinc-substituted cytochrome b562 was prepared according thereto.
First, 1 M of hydrochloric acid is added to 3 mL of cytochrome b562 aqueous solution (33 μM), and the pH is adjusted to 2 to 3. To the cytochrome b562 aqueous solution thus obtained, 3 mL of 2-butanone, which has been water-cooled, is added, the mixture was gently agitated, heme was extracted from the cytochrome b562, and the butanone layer was removed by pipetting (see Non-Patent Document 5). The extraction operation was repeated until the butanone layer shows no color. A slight amount of 1 M of Tris-HCl (pH 8.0) is added to the aqueous solution in which the extraction operation of heme has been repeated, and the pH is adjusted to 7 to 8. After that, dialysis (2 L×5 times) is performed against ultrapure water, and thus apocytochrome b562 was obtained.
Zinc protoporphyrin IX (ZnPP) was dissolved in dimethyl sulfoxide, and 2 equal amount of the mixture thus obtained was added to the above-mentioned apocytochrome b562. A protein fraction is collected from the mixture by using a Bio-gel P10 desalting column equilibrated in advance with 50 mM of Tris-HCl (pH 8.0) and 0.1 mM of EDTA, and the purified zinc-substituted cytochrome b562 (Zn-Cyt b562) was obtained.
d. Immobilization of Zinc-Substituted Cytochrome b562 to Gold Drop Electrode and Photocurrent Measurement
As the gold electrode 11, a gold drop electrode having a diameter of 2 mm was formed.
The gold drop electrode was washed with hot concentrated sulfuric acid (120° C.), and the roughness of the surface of the gold drop electrode was increased in redox processes in sulfuric acid. The gold drop electrode was immersed in 0.1 mM of 11-aminoundecanethiol (H2 N—C11—SH)/ethanol solution at room temperature for 16 hours or more, and an H2 N—C11—SH film was formed on the surface of the gold drop electrode as the self-assembled monolayer 13. Thus, compressed air is applied to the gold drop electrode on which the H2 N—C11-SH film was formed, and the gold drop electrode was dried. After that, the gold drop electrode was soaked in 60 μL of 50 μM of zinc-substituted cytochrome b562/4.4 mM of potassium phosphate (pH 7.2) solution, and is incubated at 4° C. all day long.
The photocurrent measurement was performed in 10 mM of nitrogen purged sodium phosphate (pH 7.0) by using Ag/AgCl as a reference electrode and a Pt mesh electrode as a counter electrode.
The results of the photocurrent measurement (photocurrent real-time waveforms) with the bias voltage of 300 mV, 0 mV, and −300 mV are shown in
As described above, according to the first embodiment, by controlling total amount of charge in amino acid residues in a protein semiconductor by various methods, it is possible to easily control a conductivity type of the protein semiconductor.
In a second embodiment, a protein semiconductor having a desired conductivity type, specifically, p-type protein semiconductor, n-type protein semiconductor, or i-type protein semiconductor, is manufactured by using the method of controlling a conductivity type of a protein semiconductor according to the first embodiment
According to the second embodiment, it is possible to easily manufacture the p-type protein semiconductor, n-type protein semiconductor, and i-type protein semiconductor. Therefore, at least a part of an element constituting an electronic circuit can be formed by using the p-type protein semiconductor, n-type protein semiconductor, i-type protein semiconductor, or a pn junction obtained by joining the p-type protein semiconductor and the n-type protein semiconductor.
In a third embodiment, a pn junction is manufactured by joining the p-type protein semiconductor and the n-type protein semiconductor, which are manufactured in the second embodiment.
Accordingly, it can be seen that the pn junction acts similarly to the existing pn junction using silicon or the like.
It should be noted that the mechanism of the movement of charges (electrons or electron holes) in a molecule of the protein semiconductor is described in Non-Patent Document 6 and Patent Document 2. According to this, electrons transit between the molecular orbitals when the protein semiconductor is light-excited. As a result, electrons or electron holes are moved from a site of the protein semiconductor to another site.
A specific example of the pn junction will be described.
As the p-type protein semiconductor 21, for example, the p-type zinc-substituted cytochrome c is used, and as the n-type protein semiconductor 22, for example, the n-type zinc-substituted cytochrome b562 is used.
A gateway of a p-channel in the p-type zinc-substituted cytochrome c is a porphyrin ring (Porπ+Zn—Sπ) and Lys7 (
A gateway of an n-channel in the p-type zinc-substituted cytochrome b562 is a porphyrin ring (Porπ+Zn—Sπ) and Gly70 (
According to the third embodiment, it is possible to attain the pn junction in which the p-type protein semiconductor 21 and the n-type protein semiconductor 22 are joined together. The pn junction has not only similar advantages to those of the existing pn junction but also the following advantages. Specifically, the pn junction can be configured to have an extremely fine structure, i.e., have a size of 4 to 20 nm, because the sizes of the p-type protein semiconductor 21 and the n-type protein semiconductor 22 are 2 to 10 nm. Therefore, in the case where the pn junction is integrated, it is possible to significantly increase the integration density. In the pn junction, because the joining portion has no space charge region unlike the well-known existing pn junction using silicon or the like, the time period when electrons and electron holes go across the joining portion is very short. Therefore, the response rate is extremely high. Moreover, because the sizes of the p-type protein semiconductor 21 and the n-type protein semiconductor 22 are significantly small, i.e., 2 to 10 nm, no problem of being affected by an impurity is caused unlike the well-known existing pn junction using silicon or the like. Therefore, it is possible to increase the quantum efficiency at the time when the pn junction is operated in a forward direction bias mode.
In a fourth embodiment, a light emission element using the pn junction according to the third embodiment will be described.
As shown in
When the light emission element is operated, current is flown through the pn junction in the forward direction by applying a forward bias to the pn junction, specifically, applying voltage between the p-type protein semiconductor 21 and the n-type protein semiconductor 22 so that the potential of the p-type protein semiconductor 21 is higher than that of the n-type protein semiconductor 22. At this time, as shown in
In the light emission element, the energy difference between the p-channel 21a and the channel 22a is determined by the voltage applied to the pn junction. Therefore, by controlling the voltage applied to the pn junction, it is possible to control the energy difference between the p-channel 21a and the channel 22a and therefore the wavelength of the light taken out from the light emission element. In other words, the light emission wavelength of the light emission element varies depending on the voltage applied to the pn junction. Moreover, in the light emission element, because the electron (e−) injected from the p-type protein semiconductor 21 and the electron hole (h+) injected from the n-type protein semiconductor 22 are efficiently recombined in the joining portion of the pn junction, it is possible to obtain a light emission element with high efficiency.
According to the fourth embodiment, it is possible to achieve not only the similar advantages to those of the third embodiment but also advantages of obtaining a light emission element with high efficiency and a variable wavelength.
In a fifth embodiment, a quantum cascade laser using the n-type protein semiconductor or the p-type protein semiconductor will be described.
As described above, by controlling the surface charge of the p-type protein semiconductor 21 and the n-type protein semiconductor 22, it is possible to control the energy of the p-channel 21a and the re-channel 22a.
In view of the above, for example, a plurality of types of n-type protein semiconductors 22 are manufactured so that the energy of the n-channel 22a of the n-type protein semiconductor 22 is gradually decreased, and the plurality of types of n-type protein semiconductors 22 are sequentially joined together so that the energy of the n-channel 22a is gradually decreased.
As shown in
Similarly, as shown in
According to the fifth embodiment, it is possible to achieve not only the similar advantages to those of the third embodiment but also advantages of obtaining the n-type or p-type quantum cascade laser with high efficiency and a variable wavelength.
In a sixth embodiment, a bulk-heterojunction type photoelectric conversion element will be described.
As shown in
The conductive polymer and/or polymer semiconductor 31 may be p-type or n-type. There are two main types of the conductive polymer: a hydrocarbon-based conductive polymer and a hetero atom-containing conductive polymer. Examples of the hydrocarbon-based conductive polymer include polyacetylene, polyphenylene, polyphenylene vinylene, polyacene, polyphenyl acetylene, polydiacetylene, and polynaphthalene. Examples of the hetero atom-containing conductive polymer include polypyrrole, polyaniline, polythiophene, polythienylene vinylene, polyazulene, and polyisothianaphthene.
The bulk-heterojunction type photoelectric conversion element is formed on a substrate as necessary, in order to mechanically support the bulk-heterojunction type photoelectric conversion element, for example. As the substrate, a well-known existing substrate can be used, is selected as necessary, and may be a transparent substrate or a non-transparent substrate. The material of the transparent substrate is selected as necessary. Examples of the material include transparent inorganic materials such as quartz and glass, and transparent plastic. As a flexible transparent substrate, a transparent plastic substrate is used. Examples of the transparent plastic include polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polystyrene, polyethylene, polypropylene, polyphenylene sulphide, polyvinylidene difluoride, acetylcellulose, brominated phenoxy, aramids, polyimides, polystyrenes, polyarylates, polysulfones, and polyolefins. As the transparent substrate, a silicon substrate is used, for example.
As the linker 33, a well-known existing linker can be used, and is selected depending on the conductive polymer and/or polymer semiconductor 31 and the protein semiconductor 32 as appropriate.
Examples of the p-type conductive polymer and/or polymer semiconductor 31 include p-type polyaniline sulfonic acid (PASA)
As the n-type conductive polymer and/or polymer semiconductor 31, Poly(p-pyridyl vinylene)Poly(isothianaphthene) can be used, for example.
A specific example of the bulk-heterojunction type photoelectric conversion element will be described.
As the p-type conductive polymer and/or polymer semiconductor 31, the p-type polyaniline sulfonic acid (PASA) is used. As the protein semiconductor 32, the zinc-substituted cytochrome c is used.
A protein semiconductor solution is prepared by dissolving the zinc-substituted cytochrome c in water. Moreover, a polyaniline sulfonic acid (PASA) solution is prepared by dissolving PASA in water. A protein semiconductor polymer aqueous solution is prepared by adding the PASA solution thus prepared to the above-mentioned protein semiconductor solution.
By neutralizing the sulfonic acid group of the PASA in the protein semiconductor polymer aqueous solution with alkali, e.g., sodium hydroxide (NaOH), it is possible to control the pH of the protein semiconductor polymer aqueous solution. By selecting the optimal ratio of the alkali and the sulfonic acid group, it is possible to control the band position (energy of LUMO and HOMO) of the zinc-substituted cytochrome c so that the quantum efficiency of the bulk-heterojunction type photoelectric conversion element is maximized.
According to the sixth embodiment, it is possible to achieve not only the similar advantages to those of the third embodiment but also advantages of obtaining a bulk-heterojunction type photoelectric conversion element with high efficiency. The bulk-heterojunction type photoelectric conversion element can be used as a light-receiving element (photo sensor), a solar cell, or the like.
In a seventh embodiment, an electric field detection element will be described.
The electric field detection element includes the p-type protein semiconductor, the n-type protein semiconductor, or the pn junction obtained by joining the p-type protein semiconductor and the n-type protein semiconductor.
The operation of the electric field detection element will be described.
If the Hamiltonian of the electric field detection element in the electric field is represented by H, the relationship, H═H0+H1, is established. Here, H0 represents the zero-order Hamiltonian, and H1 represents the first-order Hamiltonian (first-order perturbation). H1 is a value obtained by multiplying the dipole moment in a z direction by the electric field ε, and the relationship, H1=ezε, is established. Here, e represents an electron charge.
As described above, the relationship between the band of the amino acid residues shown in
As described above, according to the seventh embodiment, it is possible to attain a novel electric field detection element. According to the electric field detection element, by arranging the electric field detection element at the site for detecting the electric field to be measured, it is possible to detect the electric field by using the above phenomenon. Because the electric field detection element can be configured to have an extremely fine structure, i.e., have a size of several nm to several ten nm, it is possible to measure the electric field in the extremely small area having a size of nm order, which is difficult to measure in the past, or to measure the distribution of the electric field with high accuracy. The electric field detection element is suitable for use to measure the strong electric field particularly.
In an eighth embodiment, a bipolar transistor will be described.
By sequentially joining the p-type protein semiconductor, the n-type protein semiconductor, and the p-type protein semiconductor together, it is possible to configure a pnp-type bipolar transistor. Alternatively, by sequentially joining the n-type protein semiconductor, the p-type protein semiconductor, and the n-type protein semiconductor together, it is possible to configure an npn-type bipolar transistor.
According to the eights embodiment, it is possible to attain a novel bipolar transistor. The bipolar transistor can be used for various usages, and can be used as, for example, a photo transistor.
In a ninth embodiment, a thyristor will be described.
The thyristor is a pnpn-type thyristor configured by sequentially joining the p-type protein semiconductor, the n-type protein semiconductor, the p-type protein semiconductor, and the n-type protein semiconductor together.
According to the ninth embodiment, it is possible to attain a novel thyristor. The thyristor can be used for various usages.
As shown in
In the photo sensor configured as described above, the capacity Cg is charged by voltage generated at both ends of the load resistance RL when light is applied to the photodiode 71 and photocurrent is flown. A gate voltage Vg is applied to the gate of the single electron transistor 72 via the capacity Cg. Then, by measuring a change ΔQ=Cg ΔVg in the amount of charge accumulated in the capacity Cg, a change ΔVg in the gate voltage Vg is measured. Here, the single electron transistor 72 used for amplifying the output of the photodiode 71 can measure a change ΔQ=Cg ΔVg in the amount of charge accumulated in the capacity Cg with the sensitivity 1 million higher than that of the existing transistor, for example. Specifically, because the single electron transistor 72 can measure a change ΔVg in the minute gate voltage Vg, it is possible to reduce the value of the load resistance RL. Accordingly, it is possible to significantly increase the sensitivity and speed of the photo sensor. Moreover, because thermal noise is suppressed by the charging effect on the side of the single electron transistor 72, it is possible to suppress the noise generated on the side of the amplifying circuit. Furthermore, because the single electron transistor 72 uses a tunneling effect of one electron in its basic operation, the power consumption is extremely low.
As described above, in the photo sensor, the photodiode 71 and the single electron transistor 72 are capacitively-coupled. Because the voltage gain at this time is given by Cg/C1, by sufficiently reduce the capacity C1 of the micro tunnel junction J1, it is possible to easily obtain the output voltage Vout large enough to drive the element connected to the next stage of the photo sensor.
As described above, according to the tenth embodiment, it is possible to attain a novel photo sensor using a protein semiconductor, which can be reliably used for a long time. Moreover, the photo sensor is configured so that the single electron transistor 72 amplifies the output of the photodiode 71. Therefore, it is possible to significantly increase the speed and sensitivity of the photo sensor, and to reduce the power consumption, as compared to the existing general photo sensor that amplifies the output of the photodiode by the existing general transistor.
Next, an inverter circuit according to an eleventh embodiment will be described.
According to the ninth embodiment, it is possible to configure a novel inverter circuit using a protein semiconductor, which can be reliably used for a long time, and to configure various circuits such as logical circuits by using the inverter circuit.
Although embodiments and examples have been specifically described, the present disclosure is not limited to the above-mentioned embodiments and examples, and various modifications can be made based on technical ideas of the present technology.
For example, the numerical value, structure, configuration, shape, material, and the like described in the above-mentioned embodiments and examples are only examples, and different numerical value, structure, configuration, shape, material, and the like may be used as necessary.
Number | Date | Country | Kind |
---|---|---|---|
2011-119329 | May 2011 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
---|---|---|---|---|
PCT/JP2012/003200 | 5/16/2012 | WO | 00 | 11/20/2013 |