Claims
- 1. A monomer useful for forming polyquinoline polymers, the monomer having the structure: ##STR23##
- 2. A monomer useful for reacting with a diol monomer for forming polyquinoline polymer, the monomer having the general structure: ##STR24## wherein R.sup.2, R.sup.4, R.sup.5, and R.sup.7 are selected from the group consisting of alkyl, aryl, aryloxy, alkoxy, ketone, formyl (--COH), ester (--CO.sub.2 R' or OCOR'), amide (--NR'COR" or CONR'R"), heteroaryl, cyano, and F or ZF, wherein exactly two of R.sup.2, R.sup.4, R.sup.5, R.sup.7 are F or ZF, wherein Z is selected from the group consisting of nil, ortho-arylene containing 6-12 carbon atoms, and para-arylene containing 6-12 carbon atoms, and (R).sub.n are any independently selected R groups, and may be at any position on the quinoline nucleus not occupied by ZF or F, and R' and R" are selected from the group consisting of alkyl and aryl.
- 3. A monomer useful for reacting with a diol monomer for forming polyquinoline polymer, the monomer having the general structure: ##STR25## wherein R.sup.2, R.sup.4, R'.sup.2, and R'.sup.4 may be chosen independently from F and Z-F, where Z is selected from nil, ortho-arylene containing 6-12 carbon atoms, and para-arylene containing 6-12 carbon atoms, R.sup.5, R.sup.7, R'.sup.5, and R'.sup.7 may be F, and exactly one of R.sup.2, R.sup.4, R.sup.5, and R.sup.7 is F or Z-F and exactly one of R'.sup.2, R'.sup.4, R'.sup.5, and R'.sup.7 is F or Z-F, and the remaining positions are occupied by H or R, n is 0 to 5, and (R).sub.n are independently selected from the group consisting of alkyl, aryl, aryloxy, ketone, formyl (--COH), ester (--CO.sub.2 R' or OCOR'), amide (--NR'COR" or CONR'R"), heteroaryl, cyano, and where two adjacent R groups may be bridging groups, wherein the (R).sub.n groups may be at any position of the quinoline nucleus, including either ring; the divalent bridging group X links the two quinoline nuclei and may be attached at any position on either ring; and the X group is selected from:
- nil,
- --O--,
- --S--,
- --C(O)--,
- --S(O)--,
- --S(O.sub.2)--,
- --W--,
- --(--O--W--).sub.m --O--, m=1-3, and
- --Q--;
- wherein W is a divalent group having 6-20 carbon atoms and being selected from the group consisting of:
- --Ar'--,
- --Het--,
- --Ar'--O--Ar'--,
- --Ar'--C(O)--Ar'--,
- --Ar'--S--Ar'--,
- --Ar'--S(O)--Ar'--,
- --Ar'--S(O).sub.2 --Ar'--, and
- --Ar'--Q--Ar'--,
- wherein Ar' is an arylene group containing 6-12 carbon atoms and Het is a heteroarylene containing 5-9 carbon atoms; and
- wherein Q is a divalent group containing a quaternary carbon as shown below: ##STR26## where if U and U' are bridging, they are selected from the group consisting of alkyl, aryl, alkaryl, ether, ester, amide, alkyl ketone, aryl ketone; optionally, partially or fully substituted with fluorine.
- 4. An AB type monomer useful forming polyquinoline polymer, the monomer being selected from the group of structures consisting of: ##STR27## where Z is selected from the group consisting of nil, ortho-arylene, and para-arylene, the V--OH group may be at any position of the quinoline nucleus including either ring, the group V is selected from the group consisting of nil, alkyl, arylene, mixed alkyl/arylene, alkyl/aryl ethers, alkyl/aryl ketones, alkyl/aryl sulfones, alkyl/aryl thioethers, and heteroarylenes, and n is 0 to 5, and wherein (R).sub.n is selected from the group consisting of alkyl, aryl, aryloxy, ketone, formyl, ester, amide, heteroaryl, cyano and bridging groups.
- 5. A multi-chip module comprising one or more layers of dielectric and one or more layers of metal lines, wherein said dielectric is a polymer including repeat units having at least one quinoline nucleus and at least one ether linkage and having as end groups either fluoro groups or hydroxy groups or a combination of fluoro and hydroxy groups.
- 6. A capacitor comprising a polymer including repeat units having at least one quinoline nucleus and at least one ether linkage and having as end groups either fluoro groups or hydroxy groups or a combination of fluoro and hydroxy groups.
- 7. A fiber comprising a polymer including repeat units having at least one quinoline nucleus and at least one ether linkage and having as end groups either fluoro groups or hydroxy groups or a combination of fluoro and hydroxy groups.
- 8. An integrated circuit comprising insulating dielectric layers comprising a polymer including repeat units having at least one quinoline nucleus and at least one ether linkage and having as end groups either fluoro groups or hydroxy groups or a combination of fluoro and hydroxy groups.
- 9. A film comprising a polymer including repeat units having at least one quinoline nucleus and at least one ether linkage and having as end groups either fluoro groups or hydroxy groups or a combination of fluoro and hydroxy groups.
Parent Case Info
This application is a divisional application of application Ser. No. 08/469,993, filed Jun. 6, 1995, now U.S. Pat. No. 5,648,448.
US Referenced Citations (8)
Divisions (1)
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Number |
Date |
Country |
Parent |
469993 |
Jun 1995 |
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