Claims
- 1. A method of producing a durable electrochemical cell, comprising:
(a) preparing a first electrode-equipped section by the method comprising:
(i) depositing a first ion insertion material on a first conducting material; and (ii) depositing a first solid ion conducting material on said first ion insertion material; (b) preparing a second electrode-equipped section by the method comprising
(i) depositing a second ion insertion material on a second conducting material; and (ii) depositing a second solid ion conducting material on said second ion insertion material; (c) disposing said first electrode-equipped section on said second electrode-equipped section, wherein said first solid ion conducting material is parallel to and spaced apart from said second solid ion conducting material by a plurality of spacers, wherein said first solid ion conducting material, said second ion conducting material, and said plurality of spacers define a void; and (d) inserting a liquid or gel-type ion conducting material into said void.
- 2. The method of claim 1, wherein said first and second solid ion conducting layers are lithium aluminum fluoride.
- 3. The method of claim 1, wherein said first and second solid ion conducting layers are lithium phosphorous oxinitride.
- 4. The method of claim 1, wherein said first ion insertion layer is a cathodic electrochromic material
- 5. The method of claim 1, wherein said second ion insertion layer is an anodic electrochromic material.
- 6. The method of claim 1, wherein said first ion insertion layer is selected from the group consisting of transition metal oxides, transition metal sulfides, transition metal oxysulfides, transition metal halides, selenides, tellurides, chromates, molybdates, tungstates, vanadates, niobates, tantalates, titanates, stannates.
- 7. The method of claim 6, wherein said first ion insertion layer is tungsten oxide.
- 8. The method of claim 1, wherein said second ion insertion layer is selected from the group consisting of V2O5, IrO2, and NiO2.
- 9. The method of claim 8, wherein said second ion insertion layer is V2O5.
- 10. The method of claim 1, wherein said first and second solid electrolyte layers have a thickness of about 1000 to 5000 Angstroms.
- 11. The method of claim 1, further comprising, prior to step (a)(i), depositing said first conducting material on a first substrate, and prior to step (b)(i), depositing said second conducting material on a second substrate.
CROSS REFERENCE TO RELATED PATENT APPLICATIONS
[0001] This is a 35 U.S.C. 121 divisional application of the co-pending 35 U.S.C. 111(a) application, Ser. No. 09/532,168, filed Mar. 21, 2000.
CONTRACTUAL ORIGIN OF THE INVENTION
[0002] The United States Government has rights in this invention pursuant to Contract No. DE-AC36-99G010337 between the United States Department of Energy and the Midwest Research Institute.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09532168 |
Mar 2000 |
US |
Child |
10060704 |
Jan 2002 |
US |