Method of producing magnetic head and magnetic head

Abstract

The a method of producing a magnetic head is capable of stabilizing deposition rate of a plated magnetic film forming a magnetic pole of a write-head. The method of producing a magnetic head, in which a magnetic pole of a write-head is constituted by a magnetic film, comprises the steps of: forming a seed layer made of Ru on a surface of a work piece; forming a cap layer on a surface of the seed layer so as to stabilize deposition rate of the magnetic film; and forming the magnetic film by electrolytic plating, and the seed layer and the cap layer are used as power feeding layers for the electrolytic plating.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the present invention will now be described by way of examples and with reference to the accompanying drawings, in which:

FIGS. 1A-1E are explanation views showing a process of forming a magnetic film of the magnetic head of the present invention;

FIG. 2 is a graph of compositions (compositions of Fe) of plated magnetic films;

FIG. 3 is a graph of deposition rates of plating the magnetic films with respect to time of plasma processing;

FIG. 4 is a graph of inclinations (Hk) of hysteresis curves in directions of difficult axes of the magnetic films with respect to time of the plasma processing;

FIG. 5 is a graph of coercive forces (Hc) in directions of the difficult axes of the magnetic films with respect to time of the plasma processing;

FIG. 5 is a graph of coercive forces (Hc) in directions of easy axes of the magnetic films with respect to time of the plasma processing;

FIG. 7 is a sectional view of the conventional perpendicular magnetic head; and

FIGS. 8A-8D are explanation views showing the process of forming the conventional magnetic head.

Claims

1. A method of producing a magnetic head, in which a magnetic pole of a write-head is constituted by a magnetic film, comprising the steps of:forming a seed layer made of Ru on a surface of a work piece;forming a cap layer on a surface of said seed layer so as to stabilize deposition rate of said magnetic film; andforming said magnetic film by electrolytic plating,wherein said seed layer and said cap layer are used as power feeding layers for the electrolytic plating.

2. The method according to claim 1, further comprising the steps of:forming a resist pattern on a surface of said cap layer;removing said resist pattern after forming said magnetic film; andremoving parts of said seed layer and said cap layer, which are exposed in the surface of the work piece, by etching.

3. The method according to claim 1, wherein said cap layer is made of one electrically conductive substance selected from the group consisting of: NiP; NiMo; NiFe; CoNiFe; FeCo; Cu; FeN; FeCoAlO; PdPtMn; PdMn; PtMn; NiMn; Pd; Pt; Au; and Rh.

4. The method according to claim 3, wherein a thickness of said cap layer is 1-10 nm.

5. The method according to claim 1, wherein the magnetic pole is made of a magnetic material of FeCo (60≦Fe≦80 at %).

6. The method according to claim 1, wherein the magnetic pole is made of a magnetic material of CoNiFe (55≦Fe≦80 at %, Ni≦20 at %).

7. The method according to claim 1, wherein the magnetic pole is made of a magnetic material of FeNi (75≦Fe wt %).

8. A magnetic head, comprising:a write-head whose magnetic pole is made of a plated magnetic film,wherein a base of the magnetic pole comprises:a seed layer made of Ru; anda cap layer being formed on a surface of said seed layer so as to stabilize deposition rate of the plated magnetic film.

9. The magnetic head according to claim 8, wherein said cap layer is made of one electrically conductive substance selected from the group consisting of: NiP; NiMo; NiFe; CoNiFe; FeCo; Cu; FeN; FeCoAlO; PdPtMn; PdMn; PtMn; NiMn; Pd; Pt; Au; and Rh.