Method of producing magnetic head and magnetic head

Abstract

The method of the present invention is capable of highly precisely producing a magnetic head. The method comprises the steps of: forming a pole end part of a magnetic layer, which becomes a magnetic pole and which is formed on a surface of a work piece on which the magnetic head will be formed, into a prescribed shape; coating at least a top part of the magnetic layer with a stopper layer; coating a surface of the work piece, on which the stopper layer has been formed, with an insulating layer, whose polishing rate is higher than that of the stopper layer; polishing the surface of the work piece until the stopper layer, which coats the top part of the magnetic layer, is exposed from the insulating layer; and removing the stopper layer, which has been exposed in a surface of the magnetic layer.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the present invention will now be described by way of examples and with reference to the accompanying drawings, in which:

FIGS. 1A-1E are explanation views showing steps of producing a main magnetic pole of a first embodiment;

FIGS. 2A-2F are explanation views showing further steps of producing the main magnetic pole of the first embodiment;

FIGS. 3A-3F are explanation views showing steps of producing a main magnetic pole of a second embodiment;

FIG. 4 is a sectional view of the typical vertical magnetic head; and

FIGS. 5A-5F are explanation views showing the conventional method of producing the main magnetic pole.

Claims

1. A method of producing a magnetic head, comprising the steps of:forming a pole end part of a magnetic layer, which becomes a magnetic pole and which is formed on a surface of a work piece on which said magnetic head will be formed, into a prescribed shape;coating at least a top part of said magnetic layer with a stopper layer;coating a surface of said work piece, on which said stopper layer has been formed, with an insulating layer, whose polishing rate is higher than that of said stopper layer;polishing the surface of said work piece until said stopper layer, which coats the top part of said magnetic layer, is exposed from said insulating layer; andremoving said stopper layer, which has been exposed in a surface of said magnetic layer.

2. The method according to claim 1, further comprising the step of final-polishing the surface of said work piece after said removing step.

3. The method according to claim 1, wherein said magnetic layer is formed by the steps of:forming a seed layer for plating on the surface of said work piece;forming a resist pattern having a concave section, whose shape is corresponded to a shape of said magnetic pole and in which said seed layer is exposed as an inner bottom face, on a surface of said seed layer; andperforming electrolytic plating, in which said seed layer is used as an electric power feeding layer, so as to form said magnetic layer in the concave section.

4. The method according to claim 1, wherein said magnetic pole is formed by the steps of:forming said magnetic layer and said stopper layer; andetching said magnetic layer and said stopper layer so as to form said magnetic pole.

5. The method according to claim 1, wherein said stopper layer is made of tantalum.

6. The method according to claim 5, wherein said insulating layer is made of alumina.

7. A magnetic head comprising a write-head, which includes a magnetic pole constituted by a plated magnetic layer, wherein said magnetic layer formed on a seed layer for plating,both side faces of a pole end part of said magnetic pole are coated with a nonmagnetic material, anda surface of said magnetic pole in a thickness direction is formed in an exposed face of said magnetic layer.

8. The magnetic head according to claim 7, wherein a periphery of said magnetic pole is filled with an insulating layer, andthe surface of said magnetic pole in the thickness direction and a surface of said insulating layer are on the same level.

9. The magnetic head according to claim 8, wherein said nonmagnetic material is tantalum, andsaid insulating layer is made of alumina.