Claims
- 1. A method of producing a wear resistant coating over a substrate having a characteristic surface microstructure comprising depositing over the substrate a plurality of superimposed multilayer units, each unit comprising at least three compositionally different thin deposited layers and each layer having a deposited thickness sufficient to obtain its bulk coating properties and less than the characteristic microstructure of the substrate, the wear properties of said coating being a combination of the individual properties of said layers, the three compositionally different layers being: (a) oxidation resistant material selected from the group consisting of silicon, titanium, carbon, stainless steel, aluminum, stoichiometric and nonstoichiometric compositions of aluminum and oxygen, titanium and oxygen, silicon and oxygen and zirconium and oxygen; (b) nitride material selected from the group consisting of titanium nitride and hafnium nitride; and (c) disordered boron and carbon material.
- 2. The method of claim 1 wherein said depositing comprises sputtering.
- 3. The method of claim 1 wherein said depositing comprises dc magnetron sputtering.
- 4. The method of claim 1 wherein said depositing comprises chemical vapor deposition.
- 5. The method of claim 1 wherein said oxidation resistant material and said nitride material are deposited by chemical vapor deposition and said boron and carbon material is deposited by sputtering.
- 6. The method of claim 5 wherein said sputtering is dc magnetron sputtering.
- 7. The method of claim 1 wherein said oxidation resistant material is selected from the group consisting of aluminum oxide, zirconium oxide and silicon oxide.
- 8. The method of claim 1 wherein said nitride material is titanium nitride.
- 9. The method of claim 1 wherein said disordered boron and carbon material has a composition on an atomic basis of B.sub.x C.sub.1-x where x is from about 0.60 to about 0.90.
- 10. The method of claim 1 wherein said disordered boron and carbon material is boron carbide.
- 11. The method of claim 1 wherein said disordered boron and carbon is substantially amorphous.
- 12. The method of claim 1 further comprising depositing at least one adherence layer between the substrate and said multilayer units.
- 13. The coating of claim 12 wherein said at least one adherence layer comprises a layer of titanium carbide.
- 14. The method of claim 13 further comprising depositing an adherence layer of titanium nitride over said titanium carbide.
- 15. The method of claim 1 wherein the deposited sequence of said multilayer unit in a direction from the substrate is oxidation resistance material, nitride material and disordered boron and carbon material.
- 16. The method of claim 1 further comprising depositing coating over a carbide substrate.
- 17. The method of claim 16 wherein the substrate is a cemented carbide material.
- 18. The method of claim 14 wherein said multilayer units further comprise a fourth layer of titanium carbide.
RELATED APPLICATIONS
This is a division of U.S. application Ser. No. 658,946 filed Oct. 9, 1984, U.S. Pat. No. 4,619,865 which is a continuation-in-part of U.S. application Ser. No. 626,663, filed July 2, 1984 U.S. Pat. No. 4,643,951.
US Referenced Citations (10)
Foreign Referenced Citations (3)
Number |
Date |
Country |
2253745 |
May 1973 |
DEX |
56-156770 |
Dec 1981 |
JPX |
57-57868 |
Apr 1982 |
JPX |
Non-Patent Literature Citations (1)
Entry |
Urbanek, "Magnetron Sputtering of SiO.sub.2 An Alternative to Chemical Vapor Deposition", Solid State Technology, vol. 20, No. 4, pp. 87-90, Apr. 1977. |
Divisions (1)
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Number |
Date |
Country |
Parent |
658946 |
Oct 1984 |
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Continuation in Parts (1)
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Number |
Date |
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Parent |
626663 |
Jul 1984 |
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