1. Field
The present invention relates to a method of separating a glass substrate from a carrier plate, and more particularly to a method of removing a thin glass sheet from a carrier plate using laser ablation.
2. Technical Background
Typically, electronic devices produced using glass substrates, such as liquid crystal displays or organic light emitting displays employ glass substrates have employed glass substrates having a thickness in a range from about 0.5 to about 0.7 mm. However, recent advances in glass manufacturing have enabled the production of glass substrates having thicknesses less than about 0.3 mm, and in some cases less than 0.1 mm. The manufacture of glass substrates with such extraordinarily thin profiles may have a significant impact on device design, enabling thinner devices and, in some instances, flexible displays.
Notwithstanding the advantages to device design facilitated by very thin glass substrates, the processing of such thin substrates without damaging the substrate can be difficult. Accordingly, methods have been devised to bond the glass substrates to a carrier plate to form an assembly, processing the glass substrate, and then removing the processed glass substrate from the carrier plate. Nevertheless, removing the glass substrate from the carrier plate can still present difficulties.
In accordance with the present disclosure, methods for removing a thin glass substrate from a carrier plate without significant damage to the carrier plate are described. The methods include irradiating an unbonded portion of the glass substrate with a laser beam having a pico-second time scale pulse duration and a high repetition rate to ablate glass from the glass substrate and form a channel in the glass substrate. If the channel extends through the entire thickness of the glass substrate, and the channel is formed in a portion of the glass substrate that is not bonded to the carrier plate, at least a portion of the unbonded portion bounded by the channel can be removed from the carrier plate. The width of the channel can be selected to reduce the potential for damage to the removed portion by contacting the newly-freed portion with the portion of the glass substrate that remains bonded to the carrier plate. Because the laser parameters (e.g. pulse rate, power, pulse duration) are selected such that the carrier plate is not substantially damaged by the laser beam, the carrier plate may be re-used if desired after the unbonded portion is removed by subsequent removal of the bonded portion.
Accordingly, in one aspect a method of separating a glass sheet from a carrier plate is disclosed comprising: providing an assembly comprising a glass substrate and a carrier plate, the glass substrate having a first surface, a second surface and a thickness therebetween, the glass substrate further comprising an edge portion and a central portion, the second surface of the glass substrate at the edge portion being bonded to the carrier plate and wherein the second surface of the glass substrate at the central portion is not bonded to the carrier plate; irradiating the first surface of the glass substrate along an irradiation path over the unbonded central portion with a pulsed laser beam, the irradiating producing an ablation of the glass substrate along the irradiation path that forms a channel extending through the thickness of the glass substrate that separates the central portion from the edge portion, the channel having a first width at the first surface greater than a second width at the second surface; removing at least a portion of the central portion of the glass substrate from the assembly to produce a glass sheet; and wherein the edge portion of the glass substrate remains bonded to the carrier plate during the removing the at least a portion of the central portion. The laser beam may be moved in a raster pattern during the irradiating, the raster pattern defining a raster envelope. A thickness of the glass substrate the may be equal to or less than 0.7 mm, equal to or less than 0.5 mm, equal to or less than 0.3 mm, equal to or less than 0.1 mm or equal to or less than 0.05 mm The second width of the channel is preferably equal to or greater than 10 μm, such as equal to or greater than 20 μm, equal to or greater than 30 μm, equal to or greater than 50 μm. The width of the channel should be sufficient to provide clearance for removal of the at least a portion of the central portion without incurring contact between the edge portion. In most cases, the second width of the channel can be equal to or less than 100 μm, for example, in a range from about 40 μm to about 80 μm.
The laser beam may have, for example, a pulse duration equal to or less than 100 picoseconds, and an intensity distribution of the laser beam perpendicular to a longitudinal axis of the laser beam is preferably Gaussian. The carrier plate is not separated by the laser beam during the irradiating.
In another aspect, a method of separating a glass sheet from a carrier plate is described comprising: providing an assembly comprising a glass substrate and a carrier plate, the glass substrate having a first surface, a second surface and a thickness therebetween, the glass substrate further comprising an edge portion and a central portion, the second surface of the glass substrate at the edge portion being bonded to the carrier plate and wherein the second surface of the glass substrate at the central portion is not bonded to the carrier plate; irradiating the first surface of the glass substrate with a pulsed laser beam, the laser beam moving along a plurality of parallel scan paths within a raster envelope; producing relative motion between the raster envelope and the glass substrate so that the raster envelope is moved along an irradiation path on the unbonded central portion, the irradiating producing an ablation of the glass substrate along the irradiation path that forms a channel extending through the thickness of the glass substrate and separates at least a portion of the central portion from the edge portion, the channel having a width W1 at the first surface greater than a width W2 at the second surface; removing the at least a portion of the unbonded central portion of the glass substrate from the assembly to produce a glass sheet; and wherein the carrier plate is not separated by the laser beam during the irradiating. The plurality of scan paths are preferably parallel with the irradiation path, and the laser beam preferably forms a spot on the first surface of the glass substrate, wherein a full width half max diameter of the spot is equal to or greater than a perpendicular distance between adjacent scan paths. In accordance with the present embodiment, the edge portion of the glass substrate remains bonded to the carrier plate during the removing the at least a portion of the central portion, although the edge portion may be unbonded from the carrier plate after the at least a portion of the unbonded central portion is removed from the assembly.
In still another aspect, a method of separating a glass sheet from a carrier plate is disclosed comprising providing an assembly comprising a glass substrate and a carrier plate, the glass substrate having a first surface, a second surface and a thickness therebetween, the glass substrate further comprising an edge portion and a central portion, the second surface of the glass substrate at the edge portion being bonded to the carrier plate and wherein the second surface of the glass substrate at the central portion is not bonded to the carrier plate; irradiating the first surface of the glass substrate with a pulsed laser beam, the laser beam moving along a plurality of parallel scan paths within a raster envelope; producing relative motion between the raster envelope and the glass substrate so that the raster envelope is moved along an irradiation path on the unbonded central portion that is parallel with the plurality of parallel scan paths, the irradiating producing an ablation of the glass substrate along the irradiation path that forms a channel having a width W1 at the first surface greater than a width W2 at the second surface and extending through the thickness of the glass substrate; removing the at least a portion of the unbonded central portion of the glass substrate from the assembly; and wherein the carrier plate is not separated by the laser beam during the irradiating. Preferably, the plurality of scan paths are parallel with the irradiation path, and the laser beam forms a spot on the first surface of the glass substrate wherein a full width half max diameter of the spot is equal to or greater than a perpendicular distance between adjacent scan paths. In accordance with embodiment disclosed herein, the edge portion of the glass substrate remains bonded to the carrier plate during the removing the at least a portion of the central portion.
Additional features and advantages of the embodiments disclosed herein will be set forth in the detailed description which follows, and in part will be readily apparent to those skilled in the art from that description or recognized by practicing the embodiments as described herein, including the detailed description which follows, the claims, as well as the appended drawings.
It is to be understood that both the foregoing general description and the following detailed description are intended to provide an overview or framework for understanding the nature and character of the embodiments claimed. The accompanying drawings are included to provide a further understanding of the embodiments, and are incorporated into and constitute a part of this specification. The drawings, together with the description, serve to explain the principles and operations of the disclosed embodiments.
Reference will now be made in detail to the embodiment(s) of the present disclosure, examples of which are illustrated in the accompanying drawings. Whenever possible, the same reference numerals will be used throughout the drawings to refer to the same or like parts.
In conventional laser glass cutting processes the separation of glass into individual pieces relies on laser scribing and separation through crack propagation by mechanically or thermally induced stress. Nearly all current laser cutting techniques exhibit one or more shortcomings (1) they are limited in their ability to perform a free form shape cut from thin glass on a carrier plate due to a large heat-affected zone (HAZ) associated with a long (nanosecond scale) laser pulse, (2) they produce a thermal stress that often results in cracking of the surface near the laser irradiated region due to a shock wave and uncontrolled material removal, and/or (3) they can easily damage the carrier plate.
A laser cutting process based on thermal crack propagation is applicable for thin glass on a carrier plate. However, this approach can include another shortcoming. When extracting the thin glass substrate from the carrier plate, contact between the edges of the newly formed pieces can damage the thin glass in the form of chipping or micro-cracking if a sufficient gap between the adjacent edges does not exist. Such chipping or micro-cracking can decrease the edge strength of the glass and compromise the integrity of the separated substrate. Moreover, cracking in unwanted directions can occur, thereby potentially destroying the glass substrate.
While laser ablation cutting of thin glass exhibits a relatively slow processing speed due to low output power and pulse energy, it can also result in little to no crack formation near the ablation region, the ability to free-form shape the cut and controllable cutting thickness by adjusting a focal length of the laser beam, thereby avoiding damage to the underlying carrier plate surface. It is desirable that edge cracking and residual edge stress are avoided in certain glass substrates, such as glass substrates for electronic devices like flat panel displays, as damage typically originates at the edges of the glass, even when stress is applied to the center because originating flaws in the glass are more likely to occur at the edges. The high peak power of ultrafast pulsed lasers can be used to avoid these problems by employing cold ablation cutting without a measurable heat effect on the glass. Laser cutting using ultrafast pulsed lasers produces essentially no residual stress in the glass resulting in higher edge strength.
In the thermal regime, melting and ablation occur after the excited electrons redistribute energy to the glass lattice and the electrons and the lattice remain in equilibrium within the duration of the laser pulse. The time scale for the material to reach a common temperature is determined by the electron-phonon coupling constant. Heat diffusion from the electrons to the lattice (electron-phonon-relaxation-time) is a material property that has a typical value on the order of 1 to 10 picoseconds. Depending on the laser fluence, the resulting temperature of the material may exceed the melting temperature, at which time melting begins at the surface and moves inward within approximately the same timescale. At a higher fluence, e.g. energy densities around 1 J/cm2 with pico- and femtosecond pulses, the boiling point of the material is exceeded and the gas phase will nucleate homogeneously in the superheated liquid. If the rate of gas bubble formation is high in comparison to the cooling rate of the liquid, material will be explosively ejected from the surface resulting in a phase explosion, i.e., ablation. With pulsed lasers having a pulse duration on the nanosecond time scale, material is removed by thermal ablation where the material is locally heated to near the boiling temperature.
However, with ultrafast pulses on the picosecond time scale, the pulse is of sufficiently short duration that very little energy from the laser beam couples into the material as heat. The short period pulse energy goes into exciting electrons, which then causes a small section of the material to ablate, and leaves behind a very limited heat-affected zone (HAZ), typically much less than a micron, i.e., low thermal penetration depth. The material disorders non-thermally before the lattice has equilibrated with the carriers for pulses of sub-picosecond duration, even below the damage threshold. The energy from the laser pulses can be deposited in a localized region through non-linear absorption such as multiple-photon processes, examples of which are multi-photon ionization and avalanche ionization that lead to the formation of a plasma, a quasi-free charge carrier in the material consisting of a mixture of electrons and ions. Therefore, material will be removed in a manner that results in extremely fine control of the location of material removal throughout the laser beam profile. Since the plasma formation rate above a threshold that depends on the material and laser parameters increases, extremely strong, optical breakdown occurs within this parameter range. A high degree of precision during machining by non-linear absorption requires that spatially localized, reproducible, small amounts of energy are introduced into the glass material. This cold ablation avoids unwanted heat transfer almost completely, thus making the ultrafast laser an extremely promising tool, especially for high-precision procedures that require machining accuracy down to a few micro- and nanometer regimes.
As embodied herein and depicted in the exploded cross sectional view of
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Laser beam source 32 is configured to provide a pulsed laser beam at a pulse repetition rate equal to or greater than 100,000 (100 k) pulses per second, equal to or greater than 200 k pulses per second or equal to or greater than 300 k pulses per second. The pulse duration may be in a range from about 10 picoseconds to about 15 picoseconds. An optical energy of the laser beam can be equal to or greater than 40 microjoules (μJ), equal to or greater than 45 μJ or equal to or greater than 50 μJ, depending on the pulse rate. The laser beam may have a Gaussian intensity distribution in a plane perpendicular to the direction of propagation of the beam. A suitable laser source may be, for example, a Super Rapid picosecond laser manufactured by Coherent®. It should be noted, however, that since the ablation described herein relies on non-linear absorption characteristics of the glass, the operating wavelength of the laser may vary according to the glass substrate composition, and may not correlate to a high degree of absorption in the glass of the glass substrate at the operating wavelength. In some embodiments, the laser wavelength can be in a range from about 355 nm to about 1064 nm, such as, for example, 532 nm. It has been shown that in some instances a shorter wavelength laser, e.g. 355 nm, can result in improved edge strength of the cut glass substrate than a longer wavelength, e.g. 1064 nm.
Laser beam steering apparatus 36 comprises a first steering mirror 40 configured to direct laser beam 34 received from laser beam source 32 to first surface 16 of glass substrate 12, and a lens 42 that can be used to focus the laser beam onto glass substrate 12. Lens 42 may be, for example, a flat field lens (e.g. F-theta lens). Alternatively, laser beam steering apparatus 36 may further comprise a second steering mirror 44, wherein first sterring mirror 40 is configured to direct laser beam 34 to second steering mirror nd second steering mirror 44 is configured to direct laser beam 34 received from first steering mirror 40 to first surface 16 of glass substrate 12. First and second steering mirrors 40 and 44 may be driven by galvanometers 46 and 48, respectively, and used separately or in conjunction with each other to produce raster scanning (“rastering”) of laser beam 34 incident on first surface 16 of glass substrate 12. Referring to
Support device 38 is configured to support assembly 10 and to move assembly 10 in any one, two or three orthogonal directions. Support device 38 comprises a vacuum platen 54 in fluid communication with vacuum pump 56 through vacuum line 58 and may, for example, include an x-y translational stage 60. Support device 38 may be further configured to translate in a z-direction, so as to accommodate different thicknesses of the assembly 10 (e.g. various thicknesses δ1) and facilitate focus of the laser beam on the glass substrate, for example. Separating apparatus 30 may further include a vacuum nozzle 62 in fluid communication with a second vacuum pump 64 wherein glass material ablated from glass substrate 12 by laser beam 34 is captured by the nozzle and removed from the region of glass substrate 12. Support device 38 is preferably configured to provide relative motion between raster envelope 52 and glass substrate 12 along irradiation path 66 in a range from about 5 mm/second to about 7 mm/second.
Referring to
Preferably, a spot size of the laser beam, defined herein as the full width half max (FWHM) diameter of the spot on glass substrate 12 irradiated by laser beam 34, should be smaller than the width of channel 68, but larger than the distance between adjacent parallel scans 50a of the laser beam within the raster envelope while the laser is in an “on” state so that successive passes of the irradiating laser spot overlap.
Referring now to
It should be apparent from the preceding description that although presented in the context of a rectangular irradiation path, the irradiation path could be other shapes, such as circular, oval, elliptical or even free-form.
It will be apparent to those skilled in the art that various modifications and variations can be made to embodiments disclosed herein without departing from the spirit and scope of the disclosed embodiments. Thus, it is intended that the present disclosure cover the modifications and variations of these embodiments provided they come within the scope of the appended claims and their equivalents.
This application claims the benefit of priority under 35 U.S.C. §119 of U.S. Provisional Application Ser. No. 61/871543 filed on Aug. 29, 2013, the content of which is relied upon and incorporated herein by reference in its entirety.
Number | Date | Country | |
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61871543 | Aug 2013 | US |