“An Algorithm for Optimization of Experimental Parameters for Maximum Uniformity of Film Thickness,” Ramprasad, B.S., Radha, T.S., and Ramakriskna Rao, M., J., Vac. Sci. Technol. 9 (3) 1104-05 (1972). (No month). |
“The Deposit of Films of Uniform Thickness for Interferometer Mirrors,” Fisher, R.A., Platt, J.R. Rev. Sci. Instrum 8 505-7 (1937). (No month). |
“On Uniformity of Film Thickness on Rotating Substrates,” Ramprasad, B.S., Radha, T.S., and Ramakriskna Rao, M., Vac. Sci. Technol. 9 (4) 1227-28 (1972). (No month). |
“Thickness Distribution and Step Coverage in a New Planetary Substrate Holder Geometry,” Behrndt, K.H. J. Vac. Sci. Technol. 9 (2) 995-1007 (1972). (No month). |
“Optimum Geometry for Uniform Deposits on a Rotating Substrate from a Point source,” Ramprasad, B.S., Radha, T.S., Vacuum 24 (4) 165-66 (1974). (No month). |
“The distribution of Thin Films Condensed on Surfaces by the Vacuum Evaporation Method,” Holland, L. and Steckelmacher. W., Vacuum 11 (4) 346-64 (1952) (No months). |
“Optical Applications of Dielectric Thin Films,” Lissberger, P.H., Rept. Prog. Phys. 33, 197-268 (1970). (No month). |
“Distributing and Apparent Source Geometry of Electron-Beam-Heated Evaporation Sources,” E.B. Graber, J. Vac. Sci. Technol. 10 (1) 103-03 (1973). (No month). |
“A Spatial Distribution Study of A Beam Vapour Emitted by Electron-Beam-Heated Evaporation Sources,” D. Chaleix, P. Choquet, A Bessaudou, L. Frugler, and J Machet, J. Phys. D.: Appl. Phys. 29 218-24 (1996). (No month). |
“Thickness Distribution of a Metal-Alloy from a High-Rate Electron-Beam Source,” E.D. Erickson, J. Vac. Sci. Technol. 11 (1) 366-70 (1974). (No month). |