Claims
- 1. An oxygen-iodine laser system having a laser resonator with a laser-active gas mixture of at least excited oxygen and dissociated iodine flowing therethrough, comprising:
a first electrical generator in which a primary flow comprising of at least said excited oxygen is electrically generated from a first gas comprising of at least ground state oxygen; a second electrical generator in which a secondary flow comprising of at least dissociated iodine atoms is electrically generated from a second gas comprising of at least diatomic iodine; and an injector which injects the secondary flow into the primary flow to generate the laser-active gas mixture.
- 2. The oxygen-iodine laser system of claim 1, wherein the first electrical generator employs at least a pulsed discharge and a continuous wave discharge to maintain a ratio of electric field-to-gas density in order to excite the first gas to form at least the excited oxygen.
- 3. The oxygen-iodine laser system of claim 2, wherein the first electrical generator includes:
a flow tube having an entrance for receiving the first gas and an exit for expelling the primary flow; a pair of electrodes oppositely positioned about the entrance and the exit; a high voltage pulser in communication with the pair of electrodes to provide the pulsed discharge; a helical resonator positioned between the two electrodes; and an RF signal generator and amplifier coupled to a helical resonator to provide the continuous wave discharge.
- 4. The oxygen-iodine laser system of claim 2, wherein the first gas further includes a buffer gas of helium.
- 5. The oxygen-iodine laser system of claim 1, wherein the second electrical generator may include but is not limited to an RF discharge, a electric-chemical discharge, a microwave discharge, a photolytic discharge or dissociation by providing a high temperature environment.
- 6. The oxygen-iodine laser system of claim 5, wherein the second gas further includes ground state oxygen gas.
- 7. An electrically assisted chemical oxygen-iodine laser comprising:
a first gas including at least ground state oxygen; a first electrical generator to electrically excite the first gas to produce a primary flow of at least singlet-delta oxygen; a flow channel connected to the first electrical generator such that the primary flow may travel therethrough; a second electrical generator to electrically dissociate a second gas to produce a secondary flow, wherein the second gas includes at least diatomic iodine and the secondary flow includes at least dissociated iodine atoms; an injector connected to the second electrical generator such that the injector may inject the secondary flow into the primary flow; a mixing nozzle positioned downstream of the flow channel, wherein when the primary and secondary flows mix in said mixing nozzle the primary flow may excite the secondary flow to form an excited iodine specie; a pair of high reflectivity laser mirrors, coated at 1.315 μm and positioned downstream of the injector such that the mirrors form a laser resonator to extract energy from the excited iodine specie to produce a laser beam; and an exhaust positioned downstream of the high reflective laser mirrors.
- 8. The oxygen-iodine laser of claim 7, wherein the first gas further includes a buffer gas.
- 9. The oxygen-iodine laser of claim 8, wherein the first electrical generator employs at least two electric discharge schemes to maintain a ratio of electric field-to-gas density in order to excite the first gas to form at least the excited oxygen.
- 10. The oxygen-iodine laser of claim 9, wherein one of the electric discharge schemes includes a pulsed discharge.
- 11. The oxygen-iodine laser of claim 10, wherein the pulsed discharge is a high-voltage pulser.
- 12. The oxygen-iodine laser of claim 10, wherein the pulsed discharge is a pre-ionization AC discharge.
- 13. The oxygen-iodine laser of claim 9, wherein one of the electric discharge schemes is a continuous wave discharge.
- 14. The oxygen-iodine laser of claim 13, wherein the continuous wave discharge is a helical RF resonator.
- 15. The oxygen-iodine laser of claim 7, wherein the second electrical generator may include but is not limited to an RF discharge, a electric-chemical discharge, a microwave discharge, a photolytic discharge or a thermal dissociation discharge.
- 16. The oxygen-iodine laser of claim 15, wherein the second gas further includes ground state oxygen.
- 17. A method of producing an oxygen iodine laser comprising the steps of:
providing a first gas; electrically generating at least singlet delta oxygen from the first gas, forming a primary flow; providing a second gas; electrically generating at least dissociated iodine atoms from the second gas forming a secondary flow; injecting the secondary flow into the primary flow; mixing the secondary flow and the primary flow to generate a mixture of a laser-active gas; extracting energy from the mixture to produce a laser beam; and exhausting the mixture.
- 18. The method of claim 17 wherein the step of providing a first gas includes the step of providing at least ground state oxygen gas.
- 19. The method of claim 17 wherein the step of providing a second gas includes the step of providing at least diatomic iodine.
- 20. The method of claim 17, wherein the step of mixing the secondary flow and the primary flow generates a laser-active gas including at least an excited iodine specie.
- 21. The method of claim 17, further including the step of exhausting the mixture through a scrubber and recycler such that a portion of the mixture is recycled to the second gas.
- 22. The method of claim 17, wherein the step of electrically generating the primary flow further includes combining a pulsed discharge and a continuous wave discharge to generate said primary flow.
- 23. The method of claim 22, wherein the step of providing a first gas further includes providing a buffer gas.
- 24. The method of claim 20, wherein the step of providing a second gas further includes providing oxygen gas.
- 25. An all gas-phase oxygen-iodine laser system comprising:
a means for electrically generating a flow of singlet delta oxygen from a first gas; a means for electrically generating dissociated iodine atoms from a second gas; a means for injecting the dissociated iodine atoms into the flow of singlet delta oxygen; a means for mixing the dissociated iodine atoms and the singlet delta oxygen to generate a laser-active gas mixture; a means for extracting the energy from the laser-active gas mixture to produce a laser beam; and a means for exhausting the laser-active gas mixture subsequent to producing said laser beam.
- 26. The system of claim 25, wherein the first gas includes at least ground state oxygen gas.
- 27. The system of claim 26, wherein the second gas includes at least diatomic iodine gas.
- 28. The system of claim 27, wherein the laser-active gas mixture includes at least excited iodine atoms.
- 29. The system of claim 28, wherein the ground state oxygen gas is initially mixed with a buffer gas.
- 30. The system of claim 29, wherein the means for electrically generating the flow of singlet delta oxygen includes at least two electrical discharge schemes.
- 31. The system of claim 30, wherein the two electrical discharge schemes maintain a ratio of electric field-to-gas density in order to excite the ground state oxygen gas to form at least the singlet delta oxygen.
- 32. The system of claim 31, wherein the two electrical discharge schemes include a pulsed excitation source coupled to a continuous wave excitation source.
- 33. The system of claim 32, wherein the pulsed excitation source is a high-voltage pulser.
- 34. The system of claim 32, wherein the continuous wave excitation source is a helical RF discharger.
- 35. The system of claim 32, wherein the second gas further includes ground state oxygen gas.
- 36. The system of claim 35, wherein the exhausting means recycles at least a portion of the laser-active gas mixture to the second gas.
- 37. The system of claim 36, wherein the means for electrically generating the dissociated iodine atoms includes but is not limited to one of the following electrical discharge schemes: an RF discharger, a electric-chemical discharger, a microwave discharger, a photolytic discharger or dissociation by providing a high temperature environment.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] The present application claims priority of provision application serial No. 60/1196,901, filed on Apr. 13, 2000 and provision application serial No. 60/1242,195, filed on Oct. 23, 2000.
Provisional Applications (2)
|
Number |
Date |
Country |
|
60196901 |
Apr 2000 |
US |
|
60242195 |
Oct 2000 |
US |