Claims
- 1. A method of imparting improved coffee stain resistance to a polyamide textile substrate comprising treating the substrate with an effective amount of a half ester of an aromatic-containing vinyl ether maleic anhydride copolymer.
- 2. The method of claim 1 wherein the copolymer has the formula ##STR7## wherein m is 4 to 100, p is 0.5 m to 0.7 m, X is a moiety of an aromatic compound effective to improve stain resistance, R is alkyl and Z is either --O-- or --O--CH.sub.2 --CH.sub.2 --O--.
- 3. The method of claim 2 wherein m is 2 to 20, X is selected from the group consisting of phenyl, naphthyl, and a partially saturated naphthyl-like ring, and R is C.sub.1 -C.sub.5.
- 4. The method of claim 3 wherein X is selected from the group consisting of 5,6,7,8-tetrahydro-1-naphthyl and 5,6,7,8-tetrahydro-2-naphthyl, wherein Z is --O--CH.sub.2 --CH.sub.2 --O--, and wherein R is C.sub.1 -C.sub.3.
- 5. The method of claim 2 wherein X is selected from the group consisting of 1-naphthyl and 2-naphthyl, and wherein Z is --O--CH.sub.2 --CH.sub.2 --O--.
- 6. The method of claim 2 wherein X is phenyl and Z is --O--CH.sub.2 --CH.sub.2 --O--, and wherein the treated substrate does not yellow on exposure to light.
- 7. The method of claim 2 wherein X is phenyl and Z is --O--, and wherein the treated substrate does not yellow on exposure to light and is resistant to stains from FD & C Red Dye 40.
- 8. The method of claim 1 wherein the amount of the copolymer added to the substrate ranges from about 0.2 to 3.0 percent based on the weight of the substrate.
- 9. The method of claim 8 wherein the amount of the copolymer added to the substrate ranges from about 1.5 to 3.0 percent based on the weight of the substrate.
- 10. The method of claim 7 wherein the substrate is treated with the copolymer in an aqueous solution at a temperature ranging from about 20.degree. to 90.degree. C. and having a pH ranging from about 4 to 9.
- 11. A method of imparting improved coffee stain resistance to a polyamide textile substrate comprising treating the substrate with an effective amount of an aromatic-containing acrylate copolymerized with an acid selected from the group consisting of acrylic acid and maleic acid.
- 12. The method of claim 11 wherein the copolymer has the formula ##STR8## wherein s is 2 to 50 and t is 2 to 50, X is a moiety of an aromatic compound effective to improve stain resistance, and Z is either --O-- or --O--CH.sub.2 --CH.sub.2 --O--.
- 13. The method of claim 12 wherein X is selected from the group consisting of phenyl, naphthyl, and a partially saturated naphthyl-like ring.
- 14. The method of claim 13 wherein X is selected from the group consisting of 5,6,7,8-tetrahydro-1-naphthyl and 5,6,7,8-tetrahydro-2-naphthyl, and wherein Z is --O--CH.sub.2 --CH.sub.2 --O--.
- 15. The method of claim 13 wherein X is selected from the group consisting of 1-naphthyl and 2-naphthyl, and wherein Z is --O--CH.sub.2 --CH.sub.2 --O--.
- 16. The method of claim 13 wherein X is phenyl and Z is --O--CH.sub.2 --CH.sub.2 --O--, and wherein the treated substrate does not yellow on exposure to light.
- 17. The method of claim 13 wherein X is phenyl and Z is --O--, and wherein the treated substrate does not yellow on exposure to light.
- 18. The method of claim 12 wherein the amount of the copolymer added to the substrate ranges from about 0.2 to 0.3 percent based on the weight of the substrate.
- 19. The method of claim 18 wherein the amount of the copolymer added to the substrate ranges from about 1.5 to 3.0 percent based on the weight of the substrate.
- 20. A method of imparting improved FD & C Red Dye 40 stain resistance to a polyamide textile substrate comprising treating the substrate with an effective amount of copolymer of the formula ##STR9## wherein m is 4 to 100, p is 0.5 m to 0.7 m and X is phenyl; and wherein the treated substrate does not yellow on exposure to light or fade in the presence of ozone or NOx.
- 21. A coffee stain-resistant polyamide textile substrate having deposited thereon an effective amount of a composition which imparts coffee stain resistance to the substrate, said composition comprising a half ester of an aromatic-containing vinyl ether maleic anhydride copolymer.
- 22. The substrate of claim 20 wherein the copolymer has the formula ##STR10## wherein m is 4 to 100, p is 0.5 m to 0.7 m, X is a moiety of an aromatic compound effective to improve stain resistance, R is alkyl and Z is either --O-- or --O--CH.sub.2 --CH.sub.2 --O--.
- 23. The substrate of claim 22 wherein m is 2 to 20, X is selected from the group consisting of phenyl, naphthyl, and a partially saturated naphthyl-like ring, and R is C.sub.1 --C.sub.5.
- 24. The substrate of claim 23 wherein X is selected from the group consisting of 5,6,7,8 -tetrahydro-1-naphthyl and 5,6,7,8-tetrahydro-2-naphthyl, wherein Z is --O--CH.sub.2 --CH.sub.2 --O--, and wherein R is C.sub.1 --C.sub.3.
- 25. The substrate of claim 23 wherein X is selected from the group consisting of 1-naphthyl and 2-naphthyl, and wherein Z is --O--CH.sub.2 --CH.sub.2 --O--.
- 26. The substrate of claim 23 wherein X is phenyl and Z is --O--CH.sub.2 --CH.sub.2 --O--, and wherein the substrate has ozone lightfastness and does not yellow on exposure to UV light and oxides of nitrogen.
- 27. The substrate of claim 23 wherein X is phenyl and Z is --O--, and wherein the substrate has ozone lightfastness, does not yellow on exposure to UV light and oxides of nitrogen.
- 28. A coffee stain-resistant polyamide textile substrate having deposited thereon an effective amount of a composition which imparts coffee stain resistance to the substrate, said composition comprising an aromatic-containing acrylate copolymerized with an acid selected from the group consisting of acrylic acid and maleic acid.
- 29. The substrate of claim 28 wherein the copolymer has the formula ##STR11## wherein s is 2 to 50 and t is 2 to 50, X is a moiety of an aromatic compound effective to improve stain resistance, and Z is either --O-- or --O--CH.sub.2 --CH.sub.2 --O--.
- 30. The substrate of claim 28 wherein X is selected from the group consisting of phenyl, naphthyl, and a partially saturated naphthyl-like ring.
- 31. The substrate of claim 30 wherein X is selected from the group consisting of 5,6,7,8-tetrahydro-1-naphthyl and 5,6,7,8-tetrahydro-2-naphthyl and wherein Z is --O--CH.sub.2 --CH.sub.2 --O--.
- 32. The substrate of claim 30 wherein X is selected from the group consisting of 1-naphthyl and 2-naphthyl, and wherein Z is --O--CH.sub.2 --CH.sub.2 --O--.
- 33. The substrate of claim 30 wherein X is phenyl and Z is --O--CH.sub.2 --CH.sub.2 --O--, and wherein the substrate does not yellow on exposure to light.
- 34. The substrate of claim 30 wherein X is phenyl and Z is --O--, and wherein the substrate does not yellow on exposure to light.
Parent Case Info
This application is a division of application Ser. No. 500,813, filed Mar. 27, 1990, now pending.
US Referenced Citations (4)
Foreign Referenced Citations (3)
Number |
Date |
Country |
0329899 |
Mar 1989 |
EPX |
0328822 |
Aug 1989 |
EPX |
8902949 |
Apr 1989 |
WOX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
500813 |
Mar 1990 |
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