Claims
- 1. A semiconductor processing method, comprising:contacting a semiconductor wafer with a solution comprising a component to be monitored; controlling the concentration of the component by a method comprising: performing an absorption spectroscopy measurement on a sample of the solution; and controlling the concentration of the component in the solution based on the absorption spectroscopy measurement using a feedback control loop.
- 2. The method according to claim 1, wherein the component to be monitored is a corrosion inhibitor.
- 3. The method according to claim 2, wherein the corrosion inhibitor is benzotriazole, tolyltriazole, imidazole, triazole, benzothiazole, mercaptobenzotriazole, hydroquinone, gallic acid, pyragallol, catechol, recorsinol, or a combination thereof.
- 4. The method according to claim 1, wherein the concentration of the component in the solution is controlled by adjustment of the amount of the component introduced into the solution.
- 5. The method according to claim 1, wherein the concentration of the component in the solution is controlled by adjustment of the amount of a diluent introduced into the solution.
- 6. The method according to claim 1, wherein the absorption spectroscopy measurement is a UV/visible light spectroscopy measurement.
- 7. The method according to claim 1, further comprising transporting the sample of the solution using a pump.
- 8. A semiconductor processing system, comprising:a chemical bath tank containing a solution for treating a semiconductor substrate; one or more conduits for introducing process materials into the chemical bath, the process materials comprising a component to be monitored; an absorption spectroscopy measurement apparatus for measuring the concentration of the component in a sample of the solution; and feedback control means for controlling the concentration of the component in the solution based on the absorption spectroscopy measurement.
- 9. The system of claim 8, wherein the absorption spectroscopy system comprises a plurality of measurement cells.
- 10. The system of claim 8, further comprising means for directing the sample to an appropriate measurement cell depending on the concentration of the component to be monitored in the sample.
- 11. The system according to claim 8, wherein the component to be monitored is a corrosion inhibitor.
- 12. The system according to claim 11, wherein the corrosion inhibitor is benzotriazole, tolyltriazole, imidazole, triazole, benzothiazole, mercaptobenzotriazole, hydroquinone, gallic acid, pyragallol, catechol, recorsinol, or a combination thereof.
- 13. The system according to claim 8, wherein the absorption spectroscopy measurement system is a UV/visible light spectroscopy measurement system.
- 14. The system according to claim 8, further comprising a pump disposed between the chemical bath tank and the absorption spectroscopy measurement apparatus.
CROSS REFERENCE TO RELATED APPLICATIONS
This application claims the benefit under 35 U.S.C. § 119(e) of provisional Application No. 60/305,858, filed Jul. 18, 2001, the entire contents of which are herein incorporated by reference.
US Referenced Citations (2)
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3987808 |
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Provisional Applications (1)
|
Number |
Date |
Country |
|
60/305858 |
Jul 2001 |
US |