The present disclosure relates generally to methods and systems for producing an anhydrous metal chloride, MIClx. More specifically, the present disclosure relates to methods and systems for producing an anhydrous metal chloride, MIClx, directly from a metal, MI, in a molten chloride bath without the use of HCl and/or Cl2 gases. Further, means are provided to control the valence state, MI x+, of the product salt.
The production of an anhydrous metal chloride, MIClx., typically requires the use of HCl and/or Cl2 gases, both of which are highly reactive and toxic. The hazardous nature of these gases often demands significant capital investments in processing equipment and controls. Metal chlorides can sometimes be produced using safer aqueous techniques, but it is sometimes problematic to obtain anhydrous salts using such techniques.
Thus, what is still needed in the art is a novel approach to produce an anhydrous metal chloride, MIClx, particularly when the desired application for the metal chloride, MIClx, involves a molten salt process, such as electrorefining, electrodeposition, electrowinning, and/or electropolishing. Preferably, pure anhydrous halide salts can also be obtained by adding a sublimation step to the approach. Further, it is desirable that the valence state of the metal, MI x+, forming the metal chloride, MIClx, can be controlled by electrochemical means.
In various exemplary embodiments, the present disclosure provides a novel approach to produce an anhydrous metal chloride, MIClx, particularly when the desired application for the metal chloride, MIClx, involves a molten salt process, such as electrorefining, electrodeposition, electrowinning, and/or electropolishing. Pure anhydrous halide salts can also be obtained by adding a sublimation step to the approach. Further, the valence state of the metal, MI x+, forming the metal chloride, MIClx, can be controlled by electrochemical means.
In one exemplary embodiment, the present disclosure provides a system for producing a metal chloride MIClx from a metal MI without the use of HCl and/or Cl2 gases, the system including: a bath vessel holding a conductive fluid; an anode disposed in the conductive fluid, wherein the anode includes metal MI; a cathode assembly disposed in the conductive fluid, wherein the cathode assembly includes a cathode vessel including a porous portion and a non-porous portion, the non-porous portion holding a sacrificial metal chloride MIICly substantially separate from the metal chloride MIClx, and wherein the cathode assembly includes a center lead disposed within the cathode vessel operable for delivering charge to the sacrificial metal chloride MIICly; and a power supply coupling the anode and the cathode assembly, wherein the power supply is polarized to produce current flow in a direction that causes anodic dissolution of metal MI into the conductive fluid and deposition of a metal MII within the cathode vessel. The conductive fluid includes one or more of LiCl, NaCl, KCl, RbCl, CsCl, MgCl2, CaCl2, SrCl2, BaCl2, ZnCl2, SnCl4, AlCl3, GaCl3, and InCl3. The metal MI includes one or more of an alkali metal, an alkaline earth metal, a transition metal (e.g., Ti, Mn, Fe, Ni, Zr), a metalloid (e.g., Al, Ga, In, Sn), a lanthanide, and an actinide, and the derived metal chloride MIClx includes a corresponding metal chloride. The sacrificial metal chloride MIICly includes one or more of a precious metal chloride (e.g., AgCl, PtCl2, AuCl, PdCl2), a transition metal chloride (e.g., ZnCl2, FeCl2, CuCl2, MnCl2), a lanthanide chloride (e.g., CeCl4, PrCl4), and an actinide chloride, and the metal MII includes a corresponding metal. Preferably, the reduction potential of the sacrificial metal chloride MIICly is more noble than the reduction potential of the metal chloride MIClx. Optionally, the cathode vessel includes a porous upper portion and a non-porous lower portion. The non-porous lower portion of the cathode vessel includes a conductive crucible. The system also includes an inert anode that selectively replaces the anode to adjust a valence state of the metal chloride MIClx to a higher value. As used herein, the “conductive fluid” may be a molten salt (e.g., LiCl, KCl), an ionic liquid (e.g., 1-butyl-3-methylimidazolium chloride), a deep eutectic solvent (e.g., two parts malonic acid to one part urea), an organic solvent with a charge carrier (e.g., ethylene carbonate with lithium hexafluorophosphate), etc.
In another exemplary embodiment, the present disclosure provides a method for producing a metal chloride MIClx from a metal MI without the use of HCl and/or Cl2 gases, the method including: providing a bath vessel holding a conductive fluid; disposing an anode in the conductive fluid, wherein the anode includes metal MI; disposing a cathode assembly in the conductive fluid, wherein the cathode assembly includes a cathode vessel including a porous portion and a non-porous portion, the non-porous portion holding a sacrificial metal chloride MIICly substantially separate from the metal chloride MIClx, and wherein the cathode assembly includes a center lead disposed within the cathode vessel operable for delivering charge to the sacrificial metal chloride MIICly; and providing a power supply coupling the anode and the cathode assembly, wherein the power supply is polarized to produce current flow in a direction that causes anodic dissolution of metal MI into the conductive fluid and deposition of a metal MII within the cathode vessel. The conductive fluid includes one or more of LiCl, NaCl, KCl, RbCl, CsCl, MgCl2, CaCl2, SrCl2, BaCl2, ZnCl2, SnCl4, AlCl3, GaCl3, and InCl3. The metal MI includes one or more of an alkali metal, an alkaline earth metal, a transition metal (e.g., Ti, Mn, Fe, Ni, Zr), a metalloid (e.g., Al, Ga, In, Sn), a lanthanide, and an actinide, and the derived metal chloride MIClx includes a corresponding metal chloride. The sacrificial metal chloride MIICly includes one or more of a precious metal chloride (e.g., AgCl, PtCl2, AuCl, PdCl2), a transition metal chloride (e.g., ZnCl2, FeCl2, CuCl2, MnCl2), a lanthanide chloride (e.g., CeCl4, PrCl4), and an actinide chloride, and the metal MII includes a corresponding metal. Preferably, the reduction potential of the sacrificial metal chloride MIICly is more noble than the reduction potential of the metal chloride MIClx. Optionally, the cathode vessel includes a porous upper portion and a non-porous lower portion. The non-porous lower portion of the cathode vessel includes a conductive crucible. The method also includes selectively replacing the anode with an inert anode to adjust a valence state of the metal chloride MIClx to a higher value. Optionally, the method further includes using the metal chloride MIClx and the conductive fluid to transport metal from an anode to a cathode in an electrorefiner. Alternatively, the method further includes separating the metal chloride MIClx from the conductive fluid by sublimation. Finally, if the sacrificial metal chloride MIICly is AgCl, the method still further includes recycling the cathode assembly for subsequent use. Recycling the cathode assembly for subsequent use includes performing aqueous dissolution of silver in nitric acid, precipitation and drying of silver chloride by thermal purification, and reusing the silver chloride in the cathode assembly to produce additional metal chloride MIClx. Again, as used herein, the “conductive fluid” may be a molten salt (e.g., LiCl, KCl), an ionic liquid (e.g., 1-butyl-3-methylimidazolium chloride), a deep eutectic solvent (e.g., two parts malonic acid to one part urea), an organic solvent with a charge carrier (e.g., ethylene carbonate with lithium hexafluorophosphate), etc.
In a further exemplary embodiment, the present disclosure provides a system for producing a metal halide MIXx from a metal MI, the system including: a bath vessel holding a conductive fluid; an anode disposed in the conductive fluid, wherein the anode includes metal MI; a cathode assembly disposed in the conductive fluid, wherein the cathode assembly includes a cathode vessel including a porous portion and a non-porous portion, the non-porous portion holding a sacrificial metal halide MIIXy substantially separate from the metal halide MIXx, and wherein the cathode assembly includes a center lead disposed within the cathode vessel operable for delivering charge to the sacrificial metal halide MIIXy; and a power supply coupling the anode and the cathode assembly, wherein the power supply is polarized to produce current flow in a direction that causes anodic dissolution of metal MI into the conductive fluid and deposition of a metal MII within the cathode vessel. Preferably, the reduction potential of the sacrificial metal halide MIIXy is more noble than the reduction potential of the metal halide MIXx. The cathode vessel includes a porous upper portion and a non-porous lower portion. The non-porous lower portion of the cathode vessel includes a conductive crucible. The system also includes an inert anode that selectively replaces the anode to adjust a valence state of the metal halide MIXx to a higher value.
The present disclosure is illustrated and described herein with reference to the various drawings, in which like reference numbers are used to denote like system components/method steps, as appropriate, and in which:
Referring now specifically to
To produce the desired metal chloride, MIClx, a DC power supply 46 is connected between the anode 12 and the cathode assembly 18 and polarized to produce current flow in a direction that causes anodic dissolution of MI into the supporting molten salt medium 14 and the deposition of MII at the inner wall of the conductive crucible 22 and the center lead 38 of the cathode assembly 18. The secondary cathode of the porous cylinder 28 is coupled to the power supply 46 via the lid 30, for example. The cathode assembly 18 is constructed such that the migration of MIICly into the supporting molten salt medium 14 is minimized, thereby avoiding cross-contamination concerns and process inefficiency. After the metal anode 12 has been dissolved to a desired extent, the valence state of the MIClx may be adjusted to higher values by removing the MI anode 12 and replacing it with an inert anode 48 (e.g., Pt, graphite). So long as the reduction potential of the targeted valence state of MIClx does not exceed that of MIICly in the cathode assembly 18, or the potential at which Cl2 gas is produced, the DC power supply 46 can be used to oxidize MI to the desired valence state. Once the cell current begins to decay to zero at a constant anode potential, the conversion of MI to a higher valence state can be considered to be complete.
Referring now specifically to
The product chloride salt, MIClx, 50, as shown in
In general, by way of example, anhydrous aluminum chloride is finding increasing use as a low temperature molten salt bath when mixed with other metal chlorides. The process for producing anhydrous AlCl3, described by Sinha in U.S. Pat. No. 4,264,569, relies on a complicated dehydration process involving high temperatures and a gas mixture containing carbon monoxide and chlorine. The present disclosure, however, provides an alternative path to obtaining anhydrous AlCl3 that does not rely on these hazardous gases.
Similarly, in U.S. Pat. No. 8,475,756, Westphal describes a method for preparing pure anhydrous UCl3 for use in a molten salt electrorefiner. This method relies on the direct reaction of uranium metal with a metal chloride, such as CuCl2, followed by high temperature distillation to recover the UCl3. Although this method avoids the use of hazardous gases, it is not an in situ method. In contrast, the method of the present disclosure provides a means of preparing the metal chloride in situ, eliminating the need for separate processing. Although U.S. Pat. No. 6,800,262 describes an in situ process for producing UCl3 in an electrorefiner, it requires a pool of liquid cadmium metal and gaseous chlorine, both of which are highly toxic and hazardous. Another in situ method is described by Holland and Cecala in U.S. Pat. No. 9,039,885, but this method relies on the use of hazardous HCl gas. Again, the present method does not rely on these hazardous substances.
Likewise, anhydrous ferric chloride is used as a drying agent and oxidant in various reactions. Knuuttila describes a method for its preparation in U.S. Pat. No. 5,250,276 that utilizes hydrogen peroxide to oxidize iron to the 3+ valence state in aqueous solution, followed by a number of drying steps conducted in an HCl atmosphere. In contrast, the present disclosure provides a means for producing a Fe2+ molten salt solution that could be further oxidized to Fe3+ without requiring HCl gas. The anhydrous FeCl3 could then be recovered by distillation.
The proposed implementation of the present disclosure is for the production of anhydrous metal chlorides, but it is readily extendable to other halide salts (e.g., fluoride, bromide, and iodide). To produce other halides, it is important to match the halide in the main salt bath (e.g., LiI for production of metal iodides), as well as the halide in the cathode compartment. The salts chosen for producing halides other than chlorides may impose different operating conditions on the process (e.g., lower temperatures for iodides). Anions other than halides may also be used to produce a metal salt including, but not limited to, trifluoromethanesulfone, bis(trifluoromethane sulfonyl) imide, tetrafluorob orate, hexafluorophosphate, nitrate, perchlorate, sulfate, carbonate, hydroxide, or hexafluoroantinate.
In general, the present disclosure is beneficial to the molten salt electrorefining industry, as it provides a convenient in situ method for producing the metal chloride species used in electrorefiners. Further, any industries involved in the production of pure anhydrous metal chlorides may find this method useful.
Although the present disclosure is illustrated and described herein with reference to preferred embodiments and specific examples thereof, it will be readily apparent to those of ordinary skill in the art that other embodiments and examples may perform similar functions and/or achieve like results. All such equivalent embodiments and examples are within the spirit and scope of the present disclosure, are contemplated thereby, and are intended to be covered by the following non-limiting claims for all purposes.
The U.S. Government has certain rights to the present disclosure pursuant to Contract No. DE-NA0001942 between the U.S. Department of Energy and Consolidated Nuclear Security, LLC.
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Number | Date | Country | |
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20190211460 A1 | Jul 2019 | US |